Process chamber process kit with protective coating

Patent metadata

Field	Value
Publication number	US-2025385080-A1
Application number	US-202519316924-A
Country	US
Kind code	A1
Filing date	Sep 2, 2025
Priority date	Jun 14, 2018
Publication date	Dec 18, 2025
Grant date	—

Abstract

Embodiments described herein generally relate to a method and apparatus for fabricating a chamber component for a plasma process chamber. In one embodiment a chamber component used within a plasma processing chamber is provided that includes a metallic base material comprising a roughened non-planar first surface, wherein the roughened non-planar surface has an Ra surface roughness of between 4 micro-inches and 80 micro-inches, a planar silica coating formed over the roughened non-planar surface, wherein the planar silica coating has a surface that has an Ra surface roughness that is less than the Ra surface roughness of the roughened non-planar surface, a thickness between about 0.2 microns and about 10 microns, less than 1% porosity by volume, and contains less than 2E12 atoms/centimeters2 of aluminum.

First claim

1 . A chamber component for use in a processing chamber, comprising:
a base material comprising a roughened surface, wherein the roughened surface has an average surface roughness (Ra) within a range of 4 micro-inches to 80 micro-inches; and a silica coating formed over the roughened surface, wherein:
the formed silica coating has a surface that has an Ra that is less than the Ra of the roughened surface,
the formed silica coating a thickness within a range of 0.2 microns to 10 microns, and
the formed silica coating blocks atoms from leaching from the base material and into the formed silica coating such that the surface of the formed silica coating contains less than 2E 12 atoms/centimeters 2 of a metal.

2 . The chamber component of claim 1 , wherein the base material comprises aluminum, and the metal is aluminum.

3 . The chamber component of claim 1 , wherein the metal is at least part of a composition of the base material.

4 . The chamber component of claim 1 , wherein the base material comprises a gas distribution showerhead, a nozzle assembly, or a baffle.

5 . The chamber component of claim 1 , wherein the base material comprises a liner.

6 . The chamber component of claim 5 , wherein the liner comprises a cathode liner.

7 . The chamber component of claim 1 , wherein the roughened surface is a metallic surface.

8 . The chamber component of claim 1 , wherein the surface of the formed silica coating contains more than 0 atoms/centimeters 2 of the metal.

9 . The chamber component of claim 1 , wherein the roughened surface comprises pits, and the silica coating fills in the pits.

10 . The chamber component of claim 1 , wherein the silica coating has less than 1% porosity by volume.

11 . A chamber component for use in a processing chamber, comprising:
a body comprising a roughened surface, wherein the roughened surface has an average surface roughness (Ra) within a range of 4 micro-inches to 80 micro-inches; and a silica coating formed over the roughened surface, wherein:
the silica coating blocks atoms from leaching from the body and into the silica coating.

12 . The chamber component of claim 11 , wherein the surface of the silica coating has an Ra that is less than the Ra of the roughened surface.

13 . The chamber component of claim 11 , wherein the body comprises a gas distribution showerhead or a nozzle assembly.

14 . The chamber component of claim 11 , wherein the body comprises a baffle.

15 . The chamber component of claim 11 , wherein the silica coating has less than 1% porosity by volume, and a surface of the silica coating contains less than 2E 12 atoms/centimeters 2 of a metal.

16 . A processing chamber, comprising:
a chamber body defining a processing volume; a substrate support disposed in the processing volume; a gas inlet opening to flow a gas to the processing volume; one or more chamber components respectively comprising:
a body comprising a roughened surface, wherein the roughened surface has an average surface roughness (Ra) within a range of 4 micro-inches to 80 micro-inches; and
a silica coating formed over the roughened surface, wherein:
the silica coating blocks atoms from leaching from the body and into the silica coating such that a surface of the silica coating contains less than 2E 12 atoms/centimeters 2 of a metal.

17 . The processing chamber of claim 16 , wherein the base material comprises aluminum, and the metal is aluminum.

18 . The processing chamber of claim 16 , wherein the metal is at least part of a composition of the base material.

19 . The processing chamber of claim 16 , wherein the surface of the silica coating has an Ra that is less than the Ra of the roughened surface.

20 . The processing chamber of claim 16 , wherein the silica coating has a thickness within a range of 0.2 microns to 10 microns, and the silica coating has less than 1% porosity by volume.

Assignees

• Applied Materials Inc

Inventors

• Wu Jian
• Liu Wei
• Guarini Theresa Kramer
• Wang Linlin
• Bevan Malcolm
• Hawrylchak Lara

Classifications

• H10W74/01

  Manufacture or treatment · CPC title

• H10P72/0421

  for drying etching · CPC title

• H10P95/00

  Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass · CPC title

• H01J37/32477

  characterised by the means for protecting vessels or internal parts, e.g. coatings · CPC title

• C23C24/085

  Coating with metallic material, i.e. metals or metal alloys, optionally comprising hard particles, e.g. oxides, carbides or nitrides · CPC title