Oxide sintered body

US2025326692A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2025326692-A1
Application numberUS-202318851848-A
CountryUS
Kind codeA1
Filing dateMar 14, 2023
Priority dateMar 30, 2022
Publication dateOct 23, 2025
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

An oxide sintered body comprising a cubic MgO into which Zn is solid-solved, a hexagonal ZnO into which Mg is solid-solved, and a ZnGa2O4 into which Mg is solid-solved.

First claim

Opening claim text (preview).

1 . An oxide sintered body comprising a cubic MgO into which Zn is solid-solved, a hexagonal ZnO into which Mg is solid-solved, and a ZnGa 2 O 4 into which Mg is solid-solved. 2 . The oxide sintered body according to claim 1 , wherein an atomic ratio of the gallium to the sum of the zinc, the magnesium, and the gallium [Ga/(Zn+Mg+Ga)] is 0.0001 or more and 0.090 or less. 3 . The oxide sintered body according to claim 2 , wherein the atomic ratio [Ga/(Zn+Mg+Ga)] is 0.007 or more and 0.070 or less. 4 . The oxide sintered body according to claim 2 , wherein the atomic ratio [Ga/(Zn+Mg+Ga)] is 0.008 or more and 0.060 or less. 5 . The oxide sintered body according to claim 2 , wherein the atomic ratio [Ga/(Zn+Mg+Ga)] is 0.010 or more and 0.050 or less. 6 . The oxide sintered body according to claim 2 , wherein an atomic ratio of the magnesium to the sum of the zinc and the magnesium [Mg/(Zn+Mg)] is 0.25 or more and 0.80 or less. 7 . The oxide sintered body according to claim 6 , wherein the atomic ratio [Mg/(Zn+Mg)] is 0.30 or more and 0.70 or less. 8 . A material for film formation, comprising the oxide sintered body according to claim 1 . 9 . The material for film formation according to claim 8 , which is a film-forming tablet. 10 . The material for film formation according to claim 8 , which is a sputtering target. 11 . A thin film obtained by using the material for film formation according to claim 8 .

Assignees

Inventors

Classifications

  • Sputtering · CPC title

  • of zinc, germanium, cadmium, indium, tin, thallium or bismuth · CPC title

  • of aluminium, magnesium or beryllium · CPC title

  • Gallium oxides, gallates, indium oxides, indates, thallium oxides, thallates or oxide forming salts thereof, e.g. zinc gallate · CPC title

  • Zinc oxides, zincates, cadmium oxides, cadmiates, mercury oxides, mercurates or oxide forming salts thereof · CPC title

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What does patent US2025326692A1 cover?
An oxide sintered body comprising a cubic MgO into which Zn is solid-solved, a hexagonal ZnO into which Mg is solid-solved, and a ZnGa2O4 into which Mg is solid-solved.
Who is the assignee on this patent?
Idemitsu Kosan Co
What technology area does this patent fall under?
Primary CPC classification C04B35/053. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu Oct 23 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).