Ceramic material and sputtering target member

Patent metadata

Field	Value
Publication number	US-9475733-B2
Application number	US-201514692922-A
Country	US
Kind code	B2
Filing date	Apr 22, 2015
Priority date	Nov 7, 2012
Publication date	Oct 25, 2016
Grant date	Oct 25, 2016

Abstract

The present invention provides a ceramic material comprising magnesium, gallium, lithium, and oxygen as main components, wherein a crystal phase of a solid solution attained by dissolving gallium oxide and lithium oxide in magnesium oxide is a main phase. An XRD peak of a (200) plane of the solid solution with CuKα rays preferably appears at 2θ=42.91° or more which is larger than an angle at which a peak of a Cubic crystal of magnesium oxide appears, more preferably appears at 2θ=42.91° to 43.28°, and further preferably appears at 2θ=42.91° to 43.02°. In the ceramic material, a molar ratio Li/Ga of Li to Ga is preferably 0.80 or more and 1.20 or less.

First claim

What is claimed is:

1. A ceramic material comprising magnesium, gallium, lithium, and oxygen as main components, wherein a crystal phase of a solid solution obtained by dissolving gallium oxide and lithium oxide in magnesium oxide is a main phase,
wherein, assuming that contents of compounds containing magnesium, gallium, and lithium, the compounds being contained in a starting material, are respectively calculated based on magnesium oxide (MgO), gallium oxide (Ga 2 O 3 ), and lithium oxide (Li 2 O) and a total content of the magnesium oxide, the gallium oxide, and the lithium oxide is 100 mol %, a content of the magnesium oxide is 90.0 mol % or more and 99.8 mol % or less, a content of the gallium oxide is 0.1 mol % or more and 5.0 mol % or less, and a content of the lithium oxide is 0.1 mol % or more and 5.0 mol % or less.

2. The ceramic material according to claim 1 , wherein an XRD peak of a (200) plane of the solid solution measured with CuKαrays appears at 2θ=42.91° or more which is larger than an angle at which a peak of a cubic crystal of magnesium oxide appears.

3. The ceramic material according to claim 1 , wherein an XRD peak of a (200) plane of the solid solution measured with CuKα rays appears at 2θ=42.91° to 43.28°.

4. The ceramic material according to claim 1 , wherein an XRD peak of a (200) plane of the solid solution measured with CuKα rays appears at 2θ=42.91° to 43.02°.

5. The ceramic material according to claim 1 , wherein the ceramic material does not contain MgGa 2 O 4 as a minor phase.

6. The ceramic material according to claim 1 , wherein a molar ratio Li/Ga of Li to Ga is 0.80 or more and 1.20 or less.

7. The ceramic material according to claim 1 , wherein in the solid solution, an XRD peak measured with CuKα rays shifts to higher angles with respect to an XRD peak of magnesium oxide measured with CuKα rays.

8. The ceramic material according to claim 1 , wherein in the solid solution, an XRD peak measured with CuKα rays shifts to higher angles by 0.01° or more and 0.10° or less with respect to an XRD peak of magnesium oxide measured with CuKα rays.

9. The ceramic material according to claim 7 , being formed in a film-like shape.

10. The ceramic material according to claim 8 being formed in a film-like shape.

11. A sputtering target member comprising the ceramic material according to claim 1 .

12. The sputtering target member according to claim 11 , being used for producing a tunnel barrier of a magnetic tunnel junction element.

13. The sputtering target member according to claim 12 , being used for producing the magnetic tunnel junction element, the magnetic tunnel junction element being at least one of a magnetic head of a hard disk and a magnetoresistive random access memory.

Assignees

• Ngk Insulators Ltd

Inventors

• Sato Yosuke
• Isoda Yoshinori
• Katsuda Yuji

Classifications

• H10P14/69397

  the material containing two or more metal elements · CPC title

• H10P14/6939

  characterised by the metal · CPC title

• H10P14/6329

  using physical ablation of a target, e.g. physical vapour deposition or pulsed laser deposition · CPC title

• C23C14/08

  Oxides (C23C14/10 takes precedence) · CPC title

• C23C14/3414

  Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy · CPC title