RuAl and MgTiO Lamination For Effective Buffer and Interlayers For Topological Material Layers

US2025246353A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2025246353-A1
Application numberUS-202519040639-A
CountryUS
Kind codeA1
Filing dateJan 29, 2025
Priority dateJan 31, 2024
Publication dateJul 31, 2025
Grant date

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

The present disclosure generally relates to topological insulator (TI) or a topological semi-metal (TSM) based spin-orbit torque (SOT) devices. The SOT device comprises a buffer layer, a TI or TSM layer, an interlayer, and a ferromagnetic layer. The buffer layer comprising a texture layer structure, where the texture layer structure comprises one or more of: (1) two or more laminated layers of RuAl and MgTiO or MgO, (2) laminations of MgO and W, (3) W-X body-centered cubic (bcc) alloys, where X is one or more of Ta, Hf, Ti, V, Nb, and Mo, or (4) combinations thereof. The texture layer structure has a (100) orientation. The TI or TSM layer comprises BiSb having a (012) orientation or YPtBi having a (100) orientation. The buffer layer may further comprise one or more body-centered cubic layers and an oxide layer.

First claim

Opening claim text (preview).

What is claimed is: 1 . A spin-orbit torque (SOT) device, comprising: a texture layer structure having a (100) orientation, the texture layer structure comprising one of more of: (1) two or more laminated layers of RuAl and MgTiO or MgO; (2) laminations of MgO and W; or (3) W-X body-centered cubic (bcc) alloys, where X is one or more of Ta, Hf, Ti, V, Nb, and Mo; and a topological insulator (TI) or a topological semi-metal (TSM) layer disposed over the texture layer structure. 2 . The SOT device of claim 1 , wherein the TI or TSM layer comprises BiSb having a (012) orientation. 3 . The SOT device of claim 1 , wherein the texture layer structure comprises the two or more laminated layers of RuAl and MgTiO or MgO. 4 . The SOT device of claim 1 , further comprising: an interlayer; and a ferromagnetic layer. 5 . The SOT device of claim 1 , wherein the texture layer structure comprises the two or more laminated layers of RuAl and MgTiO or MgO, wherein the RuAl of each laminated layer has a thickness of about 25 Å to about 35 Å, and wherein the MgTiO or MgO of each laminated layer has a thickness of about 5 Å to about 15 Å. 6 . The SOT device of claim 1 , further comprising: a barrier layer disposed between the texture layer structure and the TI or TSM layer; and an oxide layer disposed between the barrier layer and the TI or TSM layer. 7 . The SOT device of claim 1 , wherein the texture layer structure comprises the laminations of MgO and W. 8 . The SOT device of claim 1 , wherein the texture layer structure comprises the W-X body-centered cubic (bcc) alloys, where X is one or more of Ta, Hf, Ti, V, Nb, and Mo. 9 . A magnetic recording head comprising the SOT device of claim 1 . 10 . A magnetic recording device comprising the magnetic recording head of claim 9 . 11 . A magneto-resistive memory comprising the SOT device of claim 1 . 12 . A spin-orbit torque (SOT) device, comprising: a seed layer comprising an amorphous material; a texture layer structure having a (100) orientation disposed on the seed layer, the texture layer structure comprising one or more of: (1) two or more laminated layers of RuAl and MgTiO or MgO; (2) laminations of MgO and W; or (3) W-X body-centered cubic (bcc) alloys, where X is one or more of Ta, Hf, Ti, V, Nb, and Mo; a topological insulator (TI) or a topological semi-metal (TSM) layer disposed over the texture layer structure; an interlayer disposed on the TI or TSM layer; and a ferromagnetic layer disposed on the interlayer. 13 . The SOT device of claim 12 , wherein the texture layer structure has a thickness of about 10 Å to about 150 Å. 14 . The SOT device of claim 12 , wherein the two or more laminated layers of RuAl and MgTiO or MgO comprises: a first RuAl layer disposed on the seed layer; a first MgTiO or MgO layer disposed on the first RuAl layer; a second RuAl layer disposed on the first MgTiO or MgO layer; a second MgTiO or MgO layer disposed on the second RuAl layer; and a third RuAl layer disposed on the second MgTiO or MgO layer. 15 . The SOT device of claim 12 , wherein the TI or TSM layer comprises BiSb having a (012) orientation or YPtBi having a (100) orientation. 16 . The SOT device of claim 12 , wherein the texture layer structure comprises two or more laminated layers of RuAl and MgTiO or MgO, and wherein the RuAl of each laminated layer has a greater thickness than the MgTiO or MgO of each laminated layer. 17 . The SOT device of claim 12 , wherein the texture layer structure comprises the laminations of MgO and W. 18 . The SOT device of claim 12 , wherein the texture layer structure comprises the W-X body-centered cubic (bcc) alloys, where X is one or more of Ta, Hf, Ti, V, Nb, and Mo. 19 . The SOT device of claim 12 , wherein the two or more laminated layers of RuAl and MgTiO or MgO comprises: a first RuAl layer disposed on the seed layer; a first MgTiO or MgO layer disposed on the first RuAl layer; a second RuAl layer disposed on the first MgTiO or MgO layer; a second MgTiO or MgO layer disposed on the second RuAl layer; a third RuAl layer disposed on the second MgTiO or MgO layer; a third MgTiO or MgO layer disposed on the third RuAl layer; and a fourth RuAl layer disposed on the third MgTiO or MgO layer. 20 . A magnetic recording head comprising the SOT device of claim 12 . 21 . A magnetic recording device comprising the magnetic recording head of claim 20 . 22 . A magneto-resistive memory comprising the SOT device of claim 12 . 23 . A spin-orbit torque (SOT) device, comprising: a buffer layer comprising: a texture layer structure having a (100) orientation disposed on a seed layer, the texture layer structure comprising one or more of: (1) two or more laminated layers of RuAl and MgTiO or MgO; (2) laminations of MgO and W; (3) W-X body-centered cubic (bcc) alloys, where X is one or more of Ta, Hf, Ti, V, Nb, and Mo; a first barrier layer disposed on the texture layer structure; and an oxide layer disposed on the first barrier layer; a topological insulator (TI) or a topological semi-metal (TSM) layer disposed over the texture layer structure; an interlayer disposed on the TI or TSM layer; and a ferromagnetic layer disposed on the interlayer. 24 . The SOT device of claim 23 , wherein the first barrier layer comprises W, and wherein the oxide layer comprises MgTiO. 25 . The SOT device of claim 24 wherein the first barrier layer has a thickness of about 40 Å to about 60 Å, and wherein the oxide layer has a thickness of about 5 Å to about 50 Å. 26 . The SOT device of claim 23 , wherein the texture layer structure comprises two or more laminated layers of RuAl and MgTiO or MgO, and wherein the RuAl of each laminated layer has a greater thickness than the MgTiO or MgO of each laminated layer. 27 . The SOT device of claim 23 , wherein the TI or TSM layer comprises BiSb having a (012) orientation or YPtBi having a (100) orientation. 28 . The SOT device of claim 23 , further comprising a second barrier layer disposed between the oxide layer and the TI or TSM layer. 29 . The SOT device of claim 23 , wherein the texture layer structure comprises the laminations of MgO and W. 30 . The SOT device of claim 23 , wherein the texture layer structure comprises the W-X body-centered cubic (bcc) alloys, where X is one or more of Ta, Hf, Ti, V, Nb, and Mo. 31 . The SOT device of claim 23 , wherein the texture layer structure comprises the two or more laminated layers of RuAl and MgTiO or MgO. 32 . A magnetic recording head comprising the SOT device of claim 23 . 33 . A magnetic recording device comprising the magnetic recording head of claim 32 . 34 . A magneto-resistive memory comprising the SOT device of claim 23 .

Assignees

Inventors

Classifications

  • Materials of the active region · CPC title

  • Magnetoresistive devices · CPC title

  • H01F10/329Primary

    Spin-exchange coupled multilayers wherein the magnetisation of the free layer is switched by a spin-polarised current, e.g. spin torque effect · CPC title

  • using magneto-resistive devices {or effects} · CPC title

  • H10B61/20Primary

    comprising components having three or more electrodes, e.g. transistors · CPC title

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What does patent US2025246353A1 cover?
The present disclosure generally relates to topological insulator (TI) or a topological semi-metal (TSM) based spin-orbit torque (SOT) devices. The SOT device comprises a buffer layer, a TI or TSM layer, an interlayer, and a ferromagnetic layer. The buffer layer comprising a texture layer structure, where the texture layer structure comprises one or more of: (1) two or more laminated layers of …
Who is the assignee on this patent?
Western Digital Tech Inc
What technology area does this patent fall under?
Primary CPC classification H01F10/329. Mapped technology areas include Electricity.
When was this patent published?
Publication date Thu Jul 31 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).