Hydrophobization treatment apparatus, hydrophobization treatment method, and computer storage medium

Patent metadata

Field	Value
Publication number	US-2025050377-A1
Application number	US-202418789854-A
Country	US
Kind code	A1
Filing date	Jul 31, 2024
Priority date	Aug 10, 2023
Publication date	Feb 13, 2025
Grant date	—

Abstract

A hydrophobization treatment apparatus for performing a hydrophobization treatment on a substrate, includes: a treatment container configured to house the substrate and form a treatment space; a first supply port configured to supply first gas from above the substrate in the treatment container to the substrate; and a second supply port configured to supply second gas from a position facing a central region of the substrate below the substrate in the treatment container to the substrate, the hydrophobization treatment apparatus being configured to be able to supply a hydrophobizing gas as the first gas from the first supply port and the second gas from the second supply port.

First claim

What is claimed is:

1 . A hydrophobization treatment apparatus performing a hydrophobization treatment on a substrate, comprising:
a treatment container configured to house the substrate and form a treatment space; a first supply port configured to supply first gas from above the substrate in the treatment container to the substrate; and a second supply port configured to supply second gas from a position facing a central region of the substrate below the substrate in the treatment container to the substrate, the hydrophobization treatment apparatus being configured to be able to supply a hydrophobizing gas as the first gas from the first supply port and the second gas from the second supply port.

2 . The hydrophobization treatment apparatus according to claim 1 , wherein:
the first supply port has a central supply port formed at a position facing the second supply port across the substrate in the treatment container; and for the substrate whose both front surface and rear surface are hydrophobization treatment targets, the hydrophobizing gas as the first gas is supplied from the central supply port during the hydrophobization treatment on the front surface.

3 . The hydrophobization treatment apparatus according to claim 2 , wherein
for the substrate whose both the front surface and the rear surface are the hydrophobization treatment targets, the hydrophobizing gas is supplied to the front surface and the rear surface at a same time.

4 . The hydrophobization treatment apparatus according to claim 2 , wherein
for the substrate whose both the front surface and the rear surface are the hydrophobization treatment targets, the supply of the hydrophobizing gas to the front surface and the supply of the hydrophobizing gas to the rear surface are performed in order.

5 . The hydrophobization treatment apparatus according to claim 1 , wherein:
the first supply port has a central supply port formed at a position facing the second supply port across the substrate in the treatment container; and for the substrate whose only front surface is a hydrophobization treatment target, the hydrophobizing gas as the first gas is supplied from the central supply port and an inert gas is supplied as the second gas from the second supply port during the hydrophobization treatment on the front surface.

6 . The hydrophobization treatment apparatus according to claim 1 , further comprising
an upper outer peripheral exhaust port provided above and outside the substrate in the treatment container and opening to the treatment space, wherein when the hydrophobizing gas is supplied into the treatment container, an inside of the treatment container is exhausted from the upper outer peripheral exhaust port.

7 . The hydrophobization treatment apparatus according to claim 1 , wherein
the treatment container is configured such that an inside thereof is exhaustable from an exhaust position outside the substrate; the first supply port has:
a central supply port formed at a position facing the second supply port across the substrate in the treatment container; and
an outer peripheral supply port formed at a position between the central supply port and the outside exhaust position; and
when a hydrophobization treatment is performed on only an outer peripheral portion of the front surface of the substrate in the treatment container, an inert gas as the first gas is supplied from the central supply port and the hydrophobizing gas is supplied as the first gas from the outer peripheral supply port.

8 . A hydrophobization treatment method for performing a hydrophobization treatment on a substrate, comprising
selectively supplying a hydrophobizing gas from at least one of a first supply port provided above the substrate in a treatment container forming a treatment space and a second supply port provided at a position facing a central region of the substrate below the substrate in the treatment container.

9 . The hydrophobization treatment method according to claim 8 , wherein:
the first supply port has a central supply port formed at a position facing the second supply port across the substrate in the treatment container; and at the selectively supplying the hydrophobizing gas, for the substrate whose both front surface and rear surface are hydrophobization treatment targets, the hydrophobizing gas to the front surface is supplied from the central supply port.

10 . The hydrophobization treatment method according to claim 9 , wherein
at the selectively supplying the hydrophobizing gas, for the substrate whose both the front surface and the rear surface are the hydrophobization treatment targets, the hydrophobizing gas is supplied to the front surface and the rear surface at a same time.

11 . The hydrophobization treatment method according to claim 9 , wherein
at the selectively supplying the hydrophobizing gas, for the substrate whose both the front surface and the rear surface are the hydrophobization treatment targets, the supply of the hydrophobizing gas to the front surface and the supply of the hydrophobizing gas to the rear surface are performed in order.

12 . The hydrophobization treatment method according to claim 8 , wherein:
the first supply port has a central supply port formed at a position facing the second supply port across the substrate in the treatment container; and at the selectively supplying the hydrophobizing gas, for the substrate whose only front surface is a hydrophobization treatment target, the hydrophobizing gas is supplied from the central supply port and an inert gas is supplied from the second supply port.

13 . The hydrophobization treatment method according to claim 8 , wherein:
at the selectively supplying the hydrophobizing gas, an inside of the treatment container is exhausted from an upper outer peripheral exhaust port; and the upper outer peripheral exhaust port is provided above and outside the substrate in the treatment container and opens to the treatment space.

14 . The hydrophobization treatment method according to claim 8 , wherein
the treatment container is configured such that an inside thereof is exhaustable from an exhaust position outside the substrate; the first supply port has:
a central supply port formed at a position facing the second supply port across the substrate in the treatment container; and
an outer peripheral supply port formed at a position between the central supply port and the outside exhaust position; and
at the selectively supplying the hydrophobizing gas, for the substrate whose only outer peripheral portion of the front surface of the substrate is a hydrophobization treatment target, an inert gas is supplied from the central supply port and the hydrophobizing gas is supplied from the outer peripheral supply port.

15 . A computer-readable storage medium storing a program running on a computer of a control unit for controlling a hydrophobization treatment apparatus to cause the hydrophobization treatment apparatus to execute a hydrophobization treatment method for performing a hydrophobization treatment on a substrate,
the hydrophobization treatment method comprising selectively supplying a hydrophobizing gas from at least one of a first supply port provided above the substrate in a treatment container forming a treatment space and a second supply port provided at a position facing a central region of the substrate below the substrate in the treatment container.

Assignees

• Tokyo Electron Ltd

Inventors

• Kodama Teruhiko

Classifications

• H10P72/0402 Primary

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

• G03F7/16 Primary

  Coating processes; Apparatus therefor (applying coatings to base materials in general B05; applying photosensitive compositions to base for photographic purposes G03C1/74) · CPC title

• B05D1/60

  Deposition of organic layers from vapour phase (vapour phase deposition in general C23C14/00, C23C16/00) · CPC title

• B05D5/08 Primary

  to obtain an anti-friction or anti-adhesive surface (rendering particulate materials free-flowing in general, e.g. making them hydrophobic B01J2/30) · CPC title

• B05C15/00

  Enclosures for apparatus; Booths (spray booths B05B16/00) · CPC title