Ccp gas delivery nozzle

Patent metadata

Field	Value
Publication number	US-2024339301-A1
Application number	US-202318206847-A
Country	US
Kind code	A1
Filing date	Jun 7, 2023
Priority date	Apr 10, 2023
Publication date	Oct 10, 2024
Grant date	—

Abstract

Example structures, methods, and systems for additive manufacturing of components of source and gas delivery nozzle assembly are disclosed. One example structure includes a unitary gas distribution nozzle assembly that includes an upper electrode portion and a lower electrode portion joined by multiple joining structures, and one or more gas zone divider walls positioned between the upper electrode portion and the lower electrode portion. The unitary gas distribution nozzle assembly is of a single material. Each of the multiple joining structures is positioned between the upper electrode portion and the lower electrode portion. Each of the multiple joining structures is configured to transfer radio-frequency (RF) energy and thermal energy between the upper electrode portion and the lower electrode portion. The one or more gas zone divider walls are configured to separate a region between the upper electrode portion and the lower electrode portion into two or more plenum chambers.

First claim

What is claimed is:

1 . A structure embodied in a machine readable medium used in a design process, the structure comprising:
a unitary gas distribution nozzle assembly comprising:
an upper electrode portion;
a lower electrode portion;
a plurality of joining structures that join the lower electrode portion and the upper electrode portion; and
one or more gas zone divider walls; wherein:
the upper electrode portion, the lower electrode portion, the plurality of joining structures, and the one or more gas zone divider walls are of a same material;
each of the plurality of joining structures is positioned between and coupled to the upper electrode portion and the lower electrode portion;
each of the plurality of joining structures is configured to transfer radio-frequency (RF) energy and thermal energy between the upper electrode portion and the lower electrode portion;
the one or more gas zone divider walls are positioned between and coupled to the upper electrode portion and the lower electrode portion; and
the one or more gas zone divider walls are configured to separate a region between the upper electrode portion and the lower electrode portion into two or more plenum chambers.

2 . The structure of claim 1 , wherein the structure resides on storage medium as a data format used for an exchange of layout data.

3 . The structure of claim 1 , wherein the structure includes at least one of test data files, characterization data, verification data, or design specifications.

4 . The structure of claim 1 , wherein the same material is an electrical conductor formed from a metal or metal alloy.

5 . The structure of claim 1 , wherein the one or more gas zone divider walls are annular walls that demarcate at least an inner plenum chamber and an outer plenum chamber within the region between the upper electrode portion and the lower electrode portion.

6 . The structure of claim 1 , wherein the lower electrode portion comprises a plurality of gas output holes that couple a plenum chamber of the two or more plenum chambers to an outer surface of the lower electrode portion.

7 . The structure of claim 1 , wherein the unitary gas distribution nozzle assembly further comprises a cooling portion positioned above and coupled to the upper electrode portion, wherein the cooling portion is configured to provide cooling to the upper electrode portion.

8 . The structure of claim 7 , wherein the unitary gas distribution nozzle assembly further comprises an embedded sensor to measure a flow rate of a coolant fluid circulating the cooling portion, and wherein the coolant fluid circulates from a chiller and to the cooling portion to provide cooling to the upper electrode portion.

9 . The structure of claim 7 , wherein the unitary gas distribution nozzle assembly further comprises a radio-frequency block portion positioned above and coupled to the cooling portion, and wherein the radio-frequency block portion couples RF energy to gas in the two or more plenum chambers.

10 . The structure of claim 1 , wherein a cross-section shape of each of the plurality of joining structures comprises one of a cylindrical, angled, trapezoidal, hourglass, and rectangular shape.

11 . The structure of claim 1 , wherein the unitary gas distribution nozzle assembly further comprises one or more sensors embedded in one or more of the plurality of joining structures.

12 . A plasma processing system, comprising:
a unitary gas distribution nozzle assembly comprising:
an upper electrode portion;
a lower electrode portion;
a plurality of joining structures that join the lower electrode portion and the upper electrode portion; and
one or more gas zone divider walls; wherein:
the upper electrode portion, the lower electrode portion, the plurality of joining structures, and the one or more gas zone divider walls are of a same material;
each of the plurality of joining structures is positioned between and coupled to the upper electrode portion and the lower electrode portion;
each of the plurality of joining structures is configured to transfer radio-frequency (RF) energy and thermal energy between the upper electrode portion and the lower electrode portion;
the one or more gas zone divider walls are positioned between and coupled to the upper electrode portion and the lower electrode portion; and
the one or more gas zone divider walls are configured to separate a region between the upper electrode portion and the lower electrode portion into two or more plenum chambers.

13 . The plasma processing system of claim 12 , wherein the same material is an electrical conductor formed from a metal or metal alloy.

14 . The plasma processing system of claim 12 , wherein the unitary gas distribution nozzle assembly further comprises a cooling portion positioned above and coupled to the upper electrode portion, wherein the cooling portion is configured to provide cooling to the upper electrode portion.

15 . The plasma processing system of claim 14 , wherein the unitary gas distribution nozzle assembly further comprises an embedded sensor to measure a flow rate of a coolant fluid circulating the cooling portion, and wherein the coolant fluid circulates from a chiller and to the cooling portion to provide cooling to the upper electrode portion.

16 . The plasma processing system of claim 12 , wherein the unitary gas distribution nozzle assembly further comprises one or more sensors embedded in one or more of the plurality of joining structures.

17 . A method, comprising:
additively manufacturing a unitary gas distribution nozzle assembly, wherein additively manufacturing the unitary gas distribution nozzle assembly comprises:
forming multiple layers including a lower electrode portion;
forming multiple layers including multiple joining structures that are coupled to the lower electrode portion;
forming multiple layers including one or more gas zone divider walls that are coupled to the lower electrode portion; and
forming multiple layers including an upper electrode portion that is coupled to the multiple joining structures and the one or more gas zone divider walls; wherein:
the upper electrode portion, the lower electrode portion, the plurality of connecting structures, and the one or more gas zone divider walls are of a same material;
each of the plurality of connecting structures is positioned between and coupled to the upper electrode portion and the lower electrode portion;
each of the plurality of connecting structures is configured to transfer radio-frequency (RF) energy and thermal energy between the upper electrode portion and the lower electrode portion;
the one or more gas zone divider walls are positioned between and coupled to the upper electrode portion and the lower electrode portion; and
the one or more gas zone divider walls are configured to separate a region between the upper electrode portion and the lower electrode portion into two or more plenum chambers.

18 . The method of claim 17 , wherein additively manufacturing the unitary gas distribution nozzle assembly further comprises forming multiple layers including a cooling portion positioned above and coupled to the upper electrode portion, wherein the cooling portion is configured to provide cooling to the upper electrode portion.

19 . The method of claim 18 , wherein the unitary gas distribution nozzle assembly further comprises an embedded sensor to measure a flow rate of a coolant fluid circulating the cooling portion, and wherein the coolant fluid circulat

Assignees

• Applied Materials Inc

Inventors

• Sarode Vishwanath Yogananda
• Nguyen Andrew
• Cho Tom K

Classifications

• H01J2237/334

  Etching · CPC title

• H01J2237/24585

  Other variables, e.g. energy, mass, velocity, time, temperature · CPC title

• H01J2237/002

  Cooling arrangements · CPC title

• B33Y80/00

  Products made by additive manufacturing · CPC title

• B33Y10/00 Primary

  Processes of additive manufacturing · CPC title