Copper foil with carrier, method of producing same, copper foil with carrier for printed wiring board, and printed wiring board
US-9578741-B2 · Feb 21, 2017 · US
US2024178115A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2024178115-A1 |
| Application number | US-202218283519-A |
| Country | US |
| Kind code | A1 |
| Filing date | Mar 23, 2022 |
| Priority date | Mar 26, 2021 |
| Publication date | May 30, 2024 |
| Grant date | — |
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This metal sheet material is made of copper or a copper alloy, and includes a main sheet body and a roughened plating layer that is formed on an outermost surface layer of the main sheet body. An engagement protrusion that protrudes toward the opposite side to the main sheet body and has a widening portion that gradually widens in width toward a tip end side in a protrusion direction is formed in the roughened plating layer. In a cross section of the main sheet body along the thickness direction, a plurality of the engagement protrusions are formed on a surface crystal grain that is located on the outermost surface of the main sheet body.
Opening claim text (preview).
1 . A metal sheet material made of copper or a copper alloy, comprising: a main sheet body; and a roughened plating layer that is formed on an outermost surface layer of the main sheet body, wherein an engagement protrusion that protrudes toward an opposite side to the main sheet body and has a widening portion that gradually widens in width toward a tip end side in a protrusion direction is formed in the roughened plating layer, in a cross section of the main sheet body along a thickness direction, a plurality of the engagement protrusions are formed on a surface crystal grain that is located on the outermost surface of the main sheet body, and when a maximum width of the surface crystal grain is denoted by W (unit: μm), a number of the engagement protrusions in the maximum width of the surface crystal grain is denoted by N, and a protrusion height of the engagement protrusions is denoted by H (unit: μm), N×H/W is 0.5 or greater. 2 . The metal sheet material according to claim 1 , wherein the maximum width of the surface crystal grain is 3 μm or greater. 3 . The metal sheet material according to claim 1 , wherein the protrusion height of the engagement protrusions is 0.1 μm or greater. 4 . A layered body comprising: the metal sheet material according to claim 1 ; and a resin member laminated on a sheet surface of the metal sheet material, wherein the resin member engages with the engagement protrusions of the metal sheet material at a bonded interface between the resin member and the metal sheet material. 5 . An insulated circuit board, comprising: an insulating resin layer; and a circuit layer formed on one surface of the insulating resin layer, wherein the circuit layer is formed with the metal sheet material according to claim 1 bonded to the one surface of the insulating resin layer, and the insulating resin layer engages with the engagement protrusions of the metal sheet material at a bonded interface between the insulating resin layer and the circuit layer. 6 . A metal sheet material manufacturing method for manufacturing the metal sheet material according to claim 1 , the method comprising: performing direct current electrolytic plating and then PR pulse electrolytic plating on the main sheet body to form the roughened plating layer on the outermost surface layer of the main sheet body.
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