Automatic abrasion compensation system of lower plate and wafer lapping apparatus having the same

US2023211457A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2023211457-A1
Application numberUS-202217984537-A
CountryUS
Kind codeA1
Filing dateNov 10, 2022
Priority dateJan 6, 2022
Publication dateJul 6, 2023
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Disclosed are an automatic abrasion compensation system of a lower plate and a wafer lapping apparatus having the same. The automatic abrasion compensation system reduces wafer misloading and errors in wafer loading inspection occurring when the distance between the lower plate and a transfer robot is gradually increased due to abrasion of the lower plate during a lapping process. The automatic abrasion compensation system includes an ultrasonic sensor provided on the transfer robot, a jig located directly under the ultrasonic sensor and mounted on the lower plate, a controller configured to acquire measurement distance information by measuring a distance from the jig through the ultrasonic sensor, to compare the measurement distance information with set reference distance information and to generate an adjustment control signal, and a driver configured to automatically adjust a Z-axis position of the transfer robot depending on the adjustment control signal transmitted by the controller.

First claim

Opening claim text (preview).

What is claimed is: 1 . An automatic abrasion compensation system of a lower plate, configured to uniformly adjust a distance between the lower plate and a transfer robot configured to load and unload wafers on and from the lower plate, the automatic abrasion compensation system comprising: an ultrasonic sensor provided on the transfer robot; a jig located directly under the ultrasonic sensor, and mounted on the lower plate; a controller configured to acquire measurement distance information by measuring a distance from the jig through the ultrasonic sensor, to compare the measurement distance information with set reference distance information, and to generate an adjustment control signal; and a driver configured to automatically adjust a Z-axis position of the transfer robot depending on the adjustment control signal transmitted by the controller. 2 . The automatic abrasion compensation system according to claim 1 , further comprising a jig transfer unit configured to load and unload the jig on and from the lower plate. 3 . The automatic abrasion compensation system according to claim 1 , wherein the reference distance information is distance information between the ultrasonic sensor and the jig mounted on the lower plate, initially measured after replacement with the lower plate. 4 . The automatic abrasion compensation system according to claim 1 , wherein the measurement distance information comprises the reference distance information and a wear thickness of the lower plate, and the Z-axis position of the transfer robot is adjusted to be moved downwards by the wear thickness of the lower plate. 5 . The automatic abrasion compensation system according to claim 1 , wherein the jig is mounted in a hole formed in a carrier coupled to the lower plate. 6 . A wafer lapping apparatus having the automatic abrasion compensation system according to claim 1 .

Assignees

Inventors

Classifications

  • the wafers being placed on a robot blade or gripped by a gripper for conveyance · CPC title

  • Mechanical parts of transfer devices · CPC title

  • Process monitoring, e.g. flow or thickness monitoring · CPC title

  • Apparatus for mechanical treatment or grinding or cutting · CPC title

  • for single side lapping of plane surfaces · CPC title

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What does patent US2023211457A1 cover?
Disclosed are an automatic abrasion compensation system of a lower plate and a wafer lapping apparatus having the same. The automatic abrasion compensation system reduces wafer misloading and errors in wafer loading inspection occurring when the distance between the lower plate and a transfer robot is gradually increased due to abrasion of the lower plate during a lapping process. The automatic…
Who is the assignee on this patent?
Sk Siltron Co Ltd
What technology area does this patent fall under?
Primary CPC classification B24B37/005. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Thu Jul 06 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).