Compact high density plasma source
US-2021183619-A1 · Jun 17, 2021 · US
Substrate processing apparatus
US2023005712A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2023005712-A1 |
| Application number | US-202017778757-A |
| Country | US |
| Kind code | A1 |
| Filing date | Nov 19, 2020 |
| Priority date | Nov 21, 2019 |
| Publication date | Jan 5, 2023 |
| Grant date | — |
How to read this patent
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
- Title
What the patent document calls the invention.
- Abstract
A short plain-language summary of the technical disclosure.
- Assignees and inventors
Who owns or filed the patent and who is credited as inventor.
- Key dates
Filing, priority, publication, and grant dates set the timeline.
- First independent claim
The legal scope of protection — read this for what is actually claimed.
- CPC / IPC classifications
Technology tags used to group this patent with similar filings.
- Citations and related patents
Prior art links and similar publications in this corpus.
Abstract
Official abstract text for this publication.
In accordance with an exemplary embodiment of the present invention, an apparatus for processing substrate comprising: a support plate; an antenna disposed in parallel to one surface of the support plate and having 1st to n-th turns (n=an integer greater than 3) wound along one direction from an inner end; and a distance control unit capable of adjusting separation distances formed between the 1st to n-th turns.
First claim
Opening claim text (preview).
1 . An apparatus for processing substrate comprising: a support plate; an antenna disposed in parallel to one surface of the support plate and having 1st to n-th turns (n=an integer greater than 3) wound along one direction from an inner end; and a distance control unit capable of adjusting separation distances formed between the 1st to n-th turns. 2 . The apparatus of claim 1 , wherein an outer end of the antenna is be fixed, and the distance control unit includes: a holder connected to the inner end of the antenna; and a driving motor connected to the holder to rotate the antenna in the one direction or in a direction opposite to the one direction. 3 . The apparatus of claim 2 , wherein the distance control unit further include a plurality of supporters fixed between the (m−1)-th turn and the m-th turn to limit the movement of the m-th turn(m=an integer that is 2,3, . . . , n−1). 4 . The apparatus of claim 3 , wherein the support plate has a plurality of fixing grooves arranged to be spaced apart from the center, and the supporters are respectively inserted and fixed to the fixing grooves. 5 . The apparatus of claim 1 , wherein the distance control unit further include a plurality of supporters fixed between the (m−1)-th turn and the m-th turn to limit the movement of the m-th turn(m=an integer that is 2,3, . . . , n−1). 6 . The apparatus of claim 5 , wherein the support plate has a plurality of fixing grooves arranged to be spaced apart from the center, and the supporters are respectively inserted and fixed to the fixing grooves. 7 . The apparatus according to claim 1 , the apparatus further comprising: a chamber having an inner space in which a process is performed on a substrate, and an upper portion thereof being opened; and a susceptor installed in the chamber on which the substrate is placed, wherein the support plate is installed above the chamber. 8 . The apparatus according to claim 2 , the apparatus further comprising: a chamber having an inner space in which a process is performed on a substrate, and an upper portion thereof being opened; and a susceptor installed in the chamber on which the substrate is placed, wherein the support plate is installed above the chamber. 9 . The apparatus according to claim 3 , the apparatus further comprising: a chamber having an inner space in which a process is performed on a substrate, and an upper portion thereof being opened; and a susceptor installed in the chamber on which the substrate is placed, wherein the support plate is installed above the chamber. 10 . The apparatus according to claim 4 , the apparatus further comprising: a chamber having an inner space in which a process is performed on a substrate, and an upper portion thereof being opened; and a susceptor installed in the chamber on which the substrate is placed, wherein the support plate is installed above the chamber. 11 . The apparatus according to claim 5 , the apparatus further comprising: a chamber having an inner space in which a process is performed on a substrate, and an upper portion thereof being opened; and a susceptor installed in the chamber on which the substrate is placed, wherein the support plate is installed above the chamber. 12 . The apparatus according to claim 6 , the apparatus further comprising: a chamber having an inner space in which a process is performed on a substrate, and an upper portion thereof being opened; and a susceptor installed in the chamber on which the substrate is placed, wherein the support plate is installed above the chamber.
Assignees
Inventors
Classifications
Workpiece holder · CPC title
Gas-filled discharge tubes (heating by discharge H05B) · CPC title
- H01J37/3211Primary
Antennas, e.g. particular shapes of coils · CPC title
Handling or holding of wafers, substrates or devices during manufacture or treatment thereof · CPC title
Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass · CPC title
Patent family
Related publications grouped by family.
External sources
Frequently asked questions
Answers are generated from the same data shown on this page.
- What does patent US2023005712A1 cover?
- In accordance with an exemplary embodiment of the present invention, an apparatus for processing substrate comprising: a support plate; an antenna disposed in parallel to one surface of the support plate and having 1st to n-th turns (n=an integer greater than 3) wound along one direction from an inner end; and a distance control unit capable of adjusting separation distances formed between the …
- Who is the assignee on this patent?
- Eugene Technology Co Ltd
- What technology area does this patent fall under?
- Primary CPC classification H01J37/3211. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Thu Jan 05 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).