Interconnect Structure of Semiconductor Device

Patent metadata

Field	Value
Publication number	US-2022165616-A1
Application number	US-202217669665-A
Country	US
Kind code	A1
Filing date	Feb 11, 2022
Priority date	Sep 11, 2020
Publication date	May 26, 2022
Grant date	—

Abstract

A method includes forming a first conductive feature in a first dielectric layer. A second dielectric layer is formed over the first conductive feature and the first dielectric layer. An opening is formed in the second dielectric layer. The opening exposes a top surface of the first conductive feature. The top surface of the first conductive feature includes a first metallic material and a second metallic material different from the first metallic material. A native oxide layer is removed from the top surface of the first conductive feature. A surfactant soaking process is performed on the top surface of the first conductive feature. The surfactant soaking process forms a surfactant layer over the top surface of the first conductive feature. A first barrier layer is deposited on a sidewall of the opening. The surfactant layer remains exposed at the end of depositing the first barrier layer.

First claim

What is claimed is:

1 . A method comprising:
forming a first conductive feature in a first dielectric layer; forming a second dielectric layer over the first conductive feature and the first dielectric layer; forming an opening in the second dielectric layer, the opening exposing a top surface of the first conductive feature, the top surface of the first conductive feature comprising a first metallic material and a second metallic material different from the first metallic material; removing a native oxide layer from the top surface of the first conductive feature; performing a surfactant soaking process on the top surface of the first conductive feature, the surfactant soaking process forming a surfactant layer over the top surface of the first conductive feature; and depositing a first barrier layer on a sidewall of the opening, wherein the surfactant layer remains exposed at the end of depositing the first barrier layer.

2 . The method of claim 1 , wherein the surfactant soaking process comprises:
soaking the top surface of the first conductive feature in a first gas comprising first surfactant molecules, the first surfactant molecules comprising unsaturated carbon functional groups; and soaking the top surface of the first conductive feature in a second gas comprising second surfactant molecules, the second surfactant molecules comprising nitrogen-based functional groups, wherein the surfactant layer comprises the first surfactant molecules and the second surfactant molecules.

3 . The method of claim 2 , wherein the first surfactant molecules are adsorbed on the first metallic material through the unsaturated carbon functional groups.

4 . The method of claim 3 , wherein the second surfactant molecules are adsorbed on the second metallic material through the nitrogen-based functional groups.

5 . The method of claim 1 , wherein the surfactant soaking process comprises:
soaking the top surface of the first conductive feature in a gas comprising a mixture of first surfactant molecules and second surfactant molecules, the first surfactant molecules comprising unsaturated carbon functional groups, and the second surfactant molecules comprising nitrogen-based functional groups, wherein the surfactant layer comprises the first surfactant molecules and the second surfactant molecules.

6 . The method of claim 1 , wherein the surfactant soaking process comprises:
soaking the top surface of the first conductive feature in a gas comprising surfactant molecules, the surfactant molecules comprising unsaturated carbon functional groups and nitrogen-based functional groups, wherein the surfactant layer comprises the surfactant molecules.

7 . The method of claim 1 , further comprising:
depositing an adhesion layer over the first barrier layer in the opening, wherein the surfactant layer remains exposed at the end of depositing the adhesion layer; and removing the surfactant layer to expose the top surface of the first conductive feature.

8 . A method comprising:
depositing a capping layer over a first conductive feature, the first conductive feature comprising a first metallic material, the capping layer comprising a second metallic material, the second metallic material being more electropositive than the first metallic material; depositing a dielectric layer over the capping layer; performing a patterning process on the dielectric layer to form an opening extending through the dielectric layer, the patterning process partially removing an exposed portion the capping layer such that a bottom of the opening exposes a first metallic surface comprising the first metallic material of the capping layer and the second metallic material of the first conductive feature; performing a surfactant soaking process on the first metallic surface, the surfactant soaking process suppressing a first deposition rate of a barrier material and a second deposition rate of an adhesion material over the first metallic surface; selectively depositing a barrier layer comprising the barrier material on a sidewall of the opening; and selectively depositing an adhesion layer comprising the adhesion material over the barrier layer in the opening.

9 . The method of claim 8 , further comprising, before performing the surfactant soaking process, performing a plasma process to remove a native oxide layer from the first metallic surface.

10 . The method of claim 8 , wherein the surfactant soaking process comprises:
soaking the first metallic surface in a first gas comprising first surfactant molecules, the first surfactant molecules comprising unsaturated carbon functional groups, wherein the first surfactant molecules are adsorbed on the first metallic material of the first metallic surface through the unsaturated carbon functional groups; and soaking the first metallic surface in a second gas comprising second surfactant molecules, the second surfactant molecules comprising nitrogen-based functional groups, wherein the second surfactant molecules are adsorbed on the second metallic material of the first metallic surface through the nitrogen-based functional groups.

11 . The method of claim 10 , wherein soaking the first metallic surface in the first gas comprising the first surfactant molecules is performed in a first process chamber, and wherein soaking the first metallic surface in the second gas comprising the second surfactant molecules is performed in a second process chamber different from the first process chamber.

12 . The method of claim 10 , wherein soaking the first metallic surface in the first gas comprising the first surfactant molecules and soaking the first metallic surface in the second gas comprising the second surfactant molecules are performed in a same process chamber.

13 . The method of claim 8 , wherein the surfactant soaking process comprises:
soaking the first metallic surface in a gas comprising a mixture of first surfactant molecules and second surfactant molecules, the first surfactant molecules comprising unsaturated carbon functional groups, and the second surfactant molecules comprising nitrogen-based functional groups, wherein the first surfactant molecules are adsorbed on the first metallic material of the first metallic surface through the unsaturated carbon functional groups, and wherein the second surfactant molecules are adsorbed on the second metallic material of the first metallic surface through the nitrogen-based functional groups.

14 . The method of claim 8 , wherein the surfactant soaking process comprises:
soaking the first metallic surface in a gas comprising surfactant molecules, the surfactant molecules comprising unsaturated carbon functional groups and nitrogen-based functional groups, wherein a first group of the surfactant molecules is adsorbed on the first metallic material of the first metallic surface through the unsaturated carbon functional groups, and wherein a second group of the surfactant molecules is adsorbed on the second metallic material of the first metallic surface through the nitrogen-based functional groups.

15 . A semiconductor structure comprising:
a first conductive feature; a dielectric layer over the first conductive feature; and a second conductive feature within the dielectric layer and in electrical contact with the first conductive feature, the second conductive feature comprising:
a conductive layer;
a barrier layer interposed between a sidewall of the conductive layer and a sidewall of the dielectric layer, wherein the barrier layer does not extend between a bottom surface of the conductive layer and a top surface of the first

Assignees

• Taiwan Semiconductor Mfg Co Ltd

Inventors

• Liu Yao-Min
• Kuo Chia-Pang
• Chin Shu-Cheng
• Chi Chih-Chien
• Weng Cheng-Hui
• Su Hung-Wen
• Tsai Ming-Hsing

Classifications

• H10W20/425

  Barrier, adhesion or liner layers · CPC title

• H10W20/057

  by selectively depositing, e.g. by using selective CVD or plating · CPC title

• H10W20/42

  Vias, e.g. via plugs · CPC title

• H10W20/0765

  the thin functional dielectric layers being temporary, e.g. sacrificial layers · CPC title

• H10W20/037

  the barrier, adhesion or liner layers being on top of a main fill metal · CPC title