Wiring board and manufacturing method of the wiring board
US-2020404781-A1 · Dec 24, 2020 · US
US2022061165A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2022061165-A1 |
| Application number | US-202117400715-A |
| Country | US |
| Kind code | A1 |
| Filing date | Aug 12, 2021 |
| Priority date | Aug 21, 2020 |
| Publication date | Feb 24, 2022 |
| Grant date | — |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
A method for manufacturing a wiring board in which the adhesion between an underlayer and a seed layer is improved. A diffusion layer in which an element forming the underlayer and an element forming a coating layer are mutually diffused is formed between the underlayer and a wiring portion of the coating layer by irradiating the wiring portion with a laser beam. A seed layer is formed by removing a portion excluding the wiring portion of the coating layer from the underlayer. A metal layer is formed by disposing a solid electrolyte membrane between an anode and the seed layer and applying voltage between the anode and the underlayer. An exposed portion without the seed layer of the underlayer is removed from an insulating substrate.
Opening claim text (preview).
What is claimed is: 1 . A method for manufacturing a wiring board including an insulating substrate, and a wiring layer disposed on a surface of the insulating substrate and having a predetermined wiring pattern, the method comprising: preparing a substrate with coating-layer including the insulating substrate, an electrically conductive underlayer disposed on the surface of the insulating substrate, and an electrically conductive coating layer disposed so as to coat a surface of the underlayer; forming a diffusion layer in which an element forming the underlayer and an element forming the coating layer are mutually diffused, between the underlayer and a wiring portion of the coating layer, by irradiating the wiring portion of the coating layer corresponding to the predetermined wiring pattern with a laser beam; forming a seed layer on the underlayer via the diffusion layer by removing a portion excluding the wiring portion of the coating layer, as a removing portion, from the underlayer of the substrate with coating-layer in which the diffusion layer is formed; forming a metal layer on a surface of the seed layer by disposing a solid electrolyte membrane between an anode and the seed layer as a cathode, pressing the solid electrolyte membrane against at least the seed layer, and applying voltage between the anode and the underlayer to reduce metal ions contained in the solid electrolyte membrane; and forming the wiring layer by removing, from the insulating substrate, an exposed portion without the seed layer of the underlayer. 2 . The method for manufacturing the wiring board according to claim 1 , wherein in forming the diffusion layer, a permeable member permeable to the laser beam is made to adhere to the surface of the coating layer, and with the permeable member kept adhering to the surface of the coating layer, the wiring portion of the coating layer is irradiated with the laser beam via the permeable member, so that the diffusion layer is formed, and in forming the seed layer, the removing portion of the coating layer is removed from the underlayer such that the permeable member is peeled off from the substrate with coating-layer, together with the removing portion of the coating layer. 3 . The method for manufacturing the wiring board according to claim 1 , wherein an element forming the coating layer is a noble metal element, the underlayer of the prepared substrate with coating-layer contains an oxide at an interface with the coating layer, and in forming the diffusion layer, a diffusion layer in which oxygen originating from the oxide is diffused is formed as the diffusion layer by irradiating the wiring portion of the coating layer with the laser beam. 4 . The method for manufacturing the wiring board according to claim 1 , wherein the coating layer contains metallic nanoparticles.
Brush or pad plating · CPC title
Using laser light · CPC title
Contacting devices · CPC title
using locally applied electromagnetic radiation, e.g. lasers · CPC title
Electroplating, e.g. finish plating · CPC title
Related publications grouped by family.
Answers are generated from the same data shown on this page.