Electron Beam Observation Device, Electron Beam Observation System, and Image Correcting Method and Method for Calculating Correction Factor for Image Correction in Electron Beam Observation Device

Patent metadata

Field	Value
Publication number	US-2022051868-A1
Application number	US-201917299153-A
Country	US
Kind code	A1
Filing date	Jan 23, 2019
Priority date	Jan 23, 2019
Publication date	Feb 17, 2022
Grant date	—

Abstract

The objective of the present invention is to reduce differences between individual electron beam observation devices accurately by means of image correction. This method for calculating a correction factor for correcting images between a plurality of electron beam observation devices; in electron beam observation devices which generate images by scanning an electron beam across a specimen, is characterized by including: a step in which a first electron beam observation device generates a first image by scanning a first electron beam across first and second patterns, on either a specimen including the first pattern and the second pattern, having a different shape or size to the first pattern, or a first specimen including the first pattern and a second specimen including the second pattern; a step in which a second electron beam observation device generates a second image by scanning a second electron beam across the first and second patterns; and a step in which the first or second electron beam observation device calculates a correction factor at a peak frequency extracted selectively from first and second frequency characteristics calculated on the basis of the first and second images.

First claim

1 .- 20 . (canceled)

21 . A correction factor calculation method in an electron beam observation device for correcting images among a plurality of the electron beam observation devices each of which generates an image by irradiating an electron beam over a specimen, the method comprising the steps of:
allowing a first electron beam observation device to generate a first image data by irradiating a first electron beam over a first pattern and a second pattern differing from the first pattern in a shape or a size, in which the first pattern and the second pattern are included in a specimen, or the first pattern is included in a first specimen and the second pattern is included in a second specimen; allowing a second electron beam observation device to generate a second image data by irradiating a second electron beam over the first and second patterns; and allowing one of the first and second electron beam observation devices to calculate a correction factor at a frequency selectively extracted from first and second frequency characteristics calculated based on the first and second image data.

22 . The correction factor calculation method for correcting images in an electron beam observation device according to claim 21 ,
wherein the first and second frequency characteristics include amplitudes applicable to converting the first and second image data into frequency space images.

23 . The correction factor calculation method for correcting images in an electron beam observation device according to claim 22 ,
wherein the first and second frequency characteristics are calculated by one of multiplication and division that applies a factor to each of factors generated when the first and second image data are converted into frequency space images.

24 . The correction factor calculation method for correcting images in an electron beam observation device according to claim 21 , the method comprising the step of:
allowing one of the first and second electron beam observation devices to create one of a correction factor table and a correction factor function based on the calculated correction factor.

25 . A method in an electron beam observation device for correcting images among a plurality of the electron beam observation devices each of which generates an image by irradiating an electron beam over a specimen, the method comprising the steps of:
allowing a first electron beam observation device to generate a first image data by irradiating a first electron beam over a first pattern and a second pattern differing from the first pattern in a shape or a size, in which the first pattern and the second pattern are included in a specimen, or the first pattern is included in a first specimen and the second pattern is included in a second specimen; allowing a second electron beam observation device to generate a second image data by irradiating a second electron beam over the first and second patterns; allowing one of the first and second electron beam observation devices to calculate a correction factor at a frequency selectively extracted from first and second frequency characteristics calculated based on the first and second image data; and allowing one of the first and second electron beam observation devices to use the correction factor and correct a third image data acquired by one of the first and second electron beam observation devices.

26 . An electron beam observation system including a plurality of electron beam observation devices that generate images by irradiating an electron beam over a specimen,
wherein a first electron beam observation device includes a first computer system that generate a first image data by irradiating a first electron beam over a first pattern and a second pattern differing from the first pattern in a shape or a size, in which the first pattern and the second pattern are included in a specimen, or the first pattern is included in a first specimen and the second pattern is included in a second specimen; wherein a second electron beam observation device includes a second computer system that generates a second image data by irradiating a second electron beam over the first and second patterns; wherein one of the first and second computer systems calculates a correction factor at a frequency selectively extracted from first and second frequency characteristics calculated based on the first and second image data; and wherein one of the first and second computer systems uses the correction factor and corrects a third image data acquired by one of the first and second electron beam observation devices.

27 . A correction factor calculation method in an electron beam observation device for correcting images among a plurality of the electron beam observation devices each of which generates an image by irradiating an electron beam over a specimen, the method comprising the steps of:
allowing a first electron beam observation device to generate a first image data by irradiating a first electron beam over a first pattern and a second pattern differing from the first pattern in a shape or a size, in which the first pattern and the second pattern are included in a specimen, or the first pattern is included in a first specimen and the second pattern is included in a second specimen; allowing the first electron beam observation device to calculate a first frequency characteristic based on the first image data; allowing a second electron beam observation device to generate a second image data by irradiating a second electron beam over the first and second patterns; allowing the second electron beam observation device to calculate a second frequency characteristic based on the second image data; and allowing one of the first and second electron beam observation devices to calculate a correction factor at a frequency selectively extracted from the first and second frequency characteristics.

28 . A method in an electron beam observation device for correcting images among a plurality of the electron beam observation devices each of which generates an image by irradiating an electron beam over a specimen, the method comprising the steps of:
allowing a first electron beam observation device to generate a first image data by irradiating a first electron beam over a first pattern and a second pattern differing from the first pattern in a shape or a size, in which the first pattern and the second pattern are included in a specimen, or the first pattern is included in a first specimen and the second pattern is included in a second specimen; allowing the first electron beam observation device to calculate a first frequency characteristic based on the first image data; allowing a second electron beam observation device to generate a second image data by irradiating a second electron beam over the first and second patterns; allowing the second electron beam observation device to calculate a second frequency characteristic based on the second image data; allowing one of the first and second electron beam observation devices to calculate a correction factor at a frequency selectively extracted from the first and second frequency characteristics; and allowing one of the first and second electron beam observation devices to use the correction factor and correct a third image data acquired by one of the first and second electron beam observation devices.

29 . An electron beam observation system including a plurality of electron beam observation devices that generate images by irradiating an electron beam over a specimen,
wherein a first electron beam observation device includes a first computer system that generate a first image data by irradiating a first electron beam over a first pattern and a second pat

Assignees

• Hitachi High Tech Corp

Inventors

• Hamada Koichi
• Kimura Megumi
• Enyama Momoyo
• Yumiba Ryou
• Sakakibara Makoto
• Sakai Kei
• Yamaguchi Satoru
• Setoguchi Katsumi
• Shirai Masumi
• Takasugi Yasunori

Classifications

• H01J37/28 Primary

  with scanning beams {(H01J37/268, H01J37/292, H01J37/2955 take precedence)} · CPC title

• H01J2237/223

  Fourier techniques · CPC title

• H01J2237/2816

  Length · CPC title

• H01J37/153

  Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators · CPC title

• H01J2237/2817

  Pattern inspection · CPC title