Method for manufacturing deposition mask, method for manufacturing display device, and deposition mask intermediate

Patent metadata

Field	Value
Publication number	US-2021407800-A1
Application number	US-202117475287-A
Country	US
Kind code	A1
Filing date	Sep 14, 2021
Priority date	Mar 15, 2019
Publication date	Dec 30, 2021
Grant date	—

Abstract

A method includes: preparing a metal sheet and a glass substrate in which an absolute value of a difference in linear expansion coefficient between the glass substrate and the metal sheet is less than or equal to 1.3×10−6/° C. in a temperature range between 25° C. and 100° C. inclusive; joining the glass substrate to the metal sheet with a plastic layer in between; forming a mask plate from the metal sheet by forming mask holes in the metal sheet joined to the glass substrate; joining, to a mask frame, a surface of the mask plate that is opposite to a surface in contact with the plastic layer, the mask frame having a higher rigidity than the mask plate and having a shape that surrounds the entire mask holes; and removing the plastic layer and the glass substrate from the mask plate joined to the mask frame.

First claim

1 . A method for manufacturing a vapor deposition mask from a metal sheet made of iron-nickel alloy, the vapor deposition mask including a mask plate with mask holes, the method comprising:
preparing the metal sheet and a glass substrate in which an absolute value of a difference between a linear expansion coefficient of the glass substrate and a linear expansion coefficient of the metal sheet is less than or equal to 1.3×10 −6 /° C. in a temperature range between 25° C. and 100° C. inclusive; joining the glass substrate to the metal sheet with a plastic layer in between; forming the mask plate from the metal sheet by forming the mask holes in the metal sheet joined to the glass substrate; joining, to a mask frame, a surface of the mask plate that is opposite to a surface in contact with the plastic layer, the mask frame having a higher rigidity than the mask plate and having a shape that surrounds the entire mask holes; and removing the plastic layer and the glass substrate from the mask plate joined to the mask frame.

2 . The method according to claim 1 , wherein
the absolute value of the difference between the linear expansion coefficient of the glass substrate and the linear expansion coefficient of the metal sheet is less than or equal to 0.7×10 −6 /° C., and the mask frame has a thickness of greater than or equal to 500 μm.

3 . The method according to claim 1 , wherein
the absolute value of the difference between the linear expansion coefficient of the glass substrate and the linear expansion coefficient of the metal sheet is less than or equal to 0.4×10 −6 /° C., and the mask frame has a thickness of greater than or equal to 20 μm.

4 . The method according to claim 1 , wherein the linear expansion coefficient of the glass substrate is smaller than the linear expansion coefficient of the metal sheet.

5 . The method according to claim 1 , wherein the glass substrate is made of a material selected from the group consisting of non-alkali glass, quartz glass, crystallized glass, borosilicate glass, high-silica glass, porous glass, and soda-lime glass.

6 . The method according to claim 1 , comprising forming mask plates, wherein
openings are formed in the mask frame, the joining the mask plate to the mask frame includes joining the mask plates to a single mask frame such that each of the mask plates covers a corresponding one of the openings, and the mask frame includes a frame-shaped portion located at an outer edge of the mask frame to surround a vapor deposition target, a grid-pattern defining element located in a region surrounded by the frame-shaped portion, and the openings defined by the defining element.

7 . A method for manufacturing a display device, the method comprising forming a pattern on a vapor deposition target using a vapor deposition mask manufactured by the method for manufacturing the vapor deposition mask according to claim 1 .

8 . A vapor deposition mask intermediate, comprising:
an iron-nickel alloy mask plate with mask holes, the mask plate including a first surface and a second surface opposite to the first surface; a mask frame that having a higher rigidity than the mask plate and having a shape that surrounds the entire mask holes in the mask plate, the mask frame being joined to the first surface of the mask plate; a plastic layer joined to the second surface of the mask plate; and a glass substrate joined to the plastic layer, wherein an absolute value of a difference between a linear expansion coefficient of the glass substrate and a linear expansion coefficient of the metal sheet is less than or equal to 1.3×10 −6 /° C. in a temperature range between 25° C. and 100° C. inclusive.

Assignees

• Toppan Inc

Inventors

• Shinno Mikio
• Terada Reiji
• Takeda kenta
• Kobayashi Akihiko

Classifications

• H10P76/408

  characterised by their sizes, orientations, dispositions, behaviours or shapes · CPC title

• H10P72/0602

  Temperature monitoring · CPC title

• H10K71/40

  Thermal treatment, e.g. annealing in the presence of a solvent vapour · CPC title

• C23C14/042 Primary

  using masks · CPC title

• C23C16/042

  using masks · CPC title