Substrate processing apparatus and method
US-2019330740-A1 · Oct 31, 2019 · US
US2021324518A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2021324518-A1 |
| Application number | US-202117230047-A |
| Country | US |
| Kind code | A1 |
| Filing date | Apr 14, 2021 |
| Priority date | Apr 17, 2020 |
| Publication date | Oct 21, 2021 |
| Grant date | — |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
An injector configured for arrangement within a reactor of a vertical furnace to inject gas in the reactor is provided. The injector is made substantial elongated and configured with an internal gas conduction channel to transport gas from a first end of the injector to a second end of the injector. An outer sidewall of the injector may be tapered towards the second end over at least 10%, preferably 30% and most preferably 50% of the length of the injector to increase tolerances for fitting the injector in the tube.
Opening claim text (preview).
What is claimed is: 1 . An injector configured for arrangement within a reaction chamber of a vertical furnace to inject gas in the reaction chamber, the injector being substantial elongated and configured with an internal gas conduction channel to transport gas from a first end of the injector to a second end of the injector, wherein an outer side wall of the injector is tapered towards the second end of the injector over at least 10% of its length. 2 . The injector according to claim 1 , wherein the injector is provided with a series of openings extending in the elongated direction along the injector to transport gas out of the conduction channel into the reaction chamber. 3 . The injector according to claim 2 , wherein the area of at least one of the openings is between 1 to 200 mm2. 4 . The injector according to claim 2 , wherein the distance between the openings of the series of openings decreases when going from the first end to the second end of the injector. 5 . The injector according to claim 4 , wherein the openings are configured such that gas is injected in at least two different directions substantially perpendicular to the elongated direction of the injector. 6 . The injector according to claim 2 , wherein the at least one opening has a concave shape from the inside to the outside of the injector, 7 . The injector according to claim 1 , wherein the inner cross-sectional area of the internal gas conduction channel inside the injector is between 100 and 1500 mm 2 . 8 . The injector according to claim 1 , wherein the injector comprises one single opening at the second end of the injector to transport gas out of the conduction channel into the reaction chamber. 9 . The injector according to claim 1 , wherein the injector is manufactured from ceramics. 10 . The injector according to claim 9 wherein the ceramics are selected from siliconcarbide (SiC), siliconoxide (SiOx), Silicon, or aluminium oxide (AlOx). 11 . The injector according to claim 1 , wherein the injector comprises a bottom portion connected to a top portion wherein the bottom portion is substantially straight and the top portion is slightly tapered and ends at the second end. 12 . The injector according to claim 1 , wherein the injector has a cross sectional area at the second end that is 2 to 80% smaller than the cross sectional area at the first end. 13 . The injector according to claim 1 , wherein the injector has a wall thickness at the second end that is 2 to 50% smaller than the wall thickness at the first end. 14 . A vertical furnace comprising: a process tube provided with an opening with a closeable door to form a reaction chamber; a heater configured to heat the reaction chamber of the process tube; and, a wafer boat that is configured to move substrates in the reaction chamber in a vertical direction, wherein an injector according to claim 1 is provided in the reaction chamber which is supported at its first end near the opening and is directed with its elongated tapered second end extending along the vertical direction into the reactions chamber. 15 . The vertical furnace according to claim 14 , wherein a liner is provided along the inside surface of the process tube. 16 . The vertical furnace according to claim 15 , wherein the liner is provided with a bulge creating space on the inside of the liner for the injector.
mainly by convection · CPC title
Vertical carrier comprising wall type elements whereby the substrates are horizontally supported, e.g. comprising sidewalls · CPC title
Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements · CPC title
of substrates stored in a container, a magazine, a carrier, a boat or the like · CPC title
mainly by radiation · CPC title
Related publications grouped by family.
Answers are generated from the same data shown on this page.