Electrode With Two Layer Coating, Method of Use, and Preparation Thereof
US-2017356095-A1 · Dec 14, 2017 · US
US2021172079A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2021172079-A1 |
| Application number | US-201816763144-A |
| Country | US |
| Kind code | A1 |
| Filing date | Nov 16, 2018 |
| Priority date | Nov 16, 2017 |
| Publication date | Jun 10, 2021 |
| Grant date | — |
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An electrode, which includes at least one tetragonally crystallized compound containing at least one element selected from the group of Cu and Ag, the crystal lattice of the compound being of the space group I41/amd type. An electrolysis cell includes the electrode.
Opening claim text (preview).
1 . An electrode comprising; at least one tetragonally crystallized compound containing at least one element selected from Cu and Ag, wherein the crystal lattice of the compound belongs to the I4 1 /amd space group. 2 . The electrode as claimed in claim 1 , wherein the compound is selected from Cu 4 O 3 and a compound isomorphous with Cu 4 O 3 . 3 . The electrode as claimed in claim 2 , wherein, in the crystal lattice of the compound isomorphous with Cu 4 O 3 (Cu + 2 Cu 2+ 2 O 3 ), at least one of lattice sites corresponding to the Cu + and the Cu 2+ contains Cu or Ag or proportions of Cu or Ag; and/or wherein the compound isomorphous with Cu 4 O 3 is selected from Ag 0.58 CeSi 1.42 , Ag 2 Cu 2 O 3 , Ag 0.28 Si 1.72 Yb, Cu 1.035 TeI, CuCr 2 O 4 , C 4 H 4 CuN 6 , Ag 0.7 CeSi 1.3 , Ag 8 O 4 S 2 Si, Ag 3 CuS 2 , CuTeCl, Ba 2 Cs 2 Cu 3 F 12 , CuO 4 Rh 2 , CuFe 2 O 4 , Ag 0.3 CeSi 1.7 , Ag 6 O 8 SSi, BaCuInF 7 , Cu 0.99 TeBr, BaCu 2 O 2 , Cu 16 O 14.15 , YBa 2 Cu 3 O 6 and C 8 Ag 9 Cl 6 Cs 5 N 8 . 4 . The electrode as claimed in claim 1 , wherein the compound is present in an amount of 0.1-100% by weight, based on the electrode or on a region of the electrode; and/or wherein the compound has been applied to a support. 5 . The electrode as claimed in claim 1 , wherein the electrode is a gas diffusion electrode. 6 . An electrolysis cell comprising: an electrode as claimed in claim 1 . 7 . A process for producing an electrode as claimed in claim 1 , comprising; providing at least one tetragonally crystallized compound containing at least one element selected from Cu and Ag, wherein the crystal lattice of the compound belongs to the I4 1 /amd space group; and further comprising a step selected from: applying the compound to a support; and forming the compound to an electrode. 8 . The process as claimed in claim 7 , wherein the compound is selected from Cu 4 O 3 and a compound isomorphous with Cu 4 O 3 . 9 . The process as claimed in claim 8 , wherein, in the crystal lattice of the compound isomorphous with Cu 4 O 3 (Cu + 2 Cu 2+ 2 O 3 ), at least one of lattice sites corresponding to the Cu + and the Cu 2+ contains Cu or Ag or proportions of Cu or Ag; and/or wherein the compound isomorphous with Cu 4 O 3 is selected from Ag 0.58 CeSi 1.42 , Ag 2 Cu 2 O 3 , Ag 0.28 Si 1.72 Yb, Cu 1.035 TeI, CuCr 2 O 4 , C 4 H 4 CuN 6 , Ag 0.7 CeSi 1.3 , Ag 8 O 4 S 2 Si, Ag 3 CuS 2 , CuTeCl, Ba 2 Cs 2 Cu 3 F 12 , CuO 4 Rh 2 , CuFe 2 O 4 , Ag 0.3 CeSi 1.7 , Ag 6 O 8 SSi, BaCuInF 7 , Cu 0.99 TeBr, BaCu 2 O 2 , Cu 16 O 14.15 , YBa 2 Cu 3 O 6 and C 8 Ag 9 Cl 6 Cs 5 N 8 . 10 . The process as claimed in claim 7 , wherein the step of applying the compound to the support is selected from applying a mixture or powder comprising the compound to the support and dry rolling the mixture or powder onto the support; applying a dispersion comprising the compound to the support; and contacting the support with a gas phase comprising the compound, and applying the compound to the support from the gas phase. 11 . The process as claimed in claim 10 , wherein the compound is applied with a mass coverage of at least 0.5 mg/cm 2 ; and/or wherein the rolling application is effected at a temperature of 25-100° C. 12 . The process as claimed in claim 7 , wherein the support is a gas diffusion electrode, a support of a gas diffusion electrode, or a gas diffusion layer. 13 . The process as claimed in claim 7 , wherein the step of forming the compound to an electrode comprises rolling of a powder comprising the compound to give the electrode. 14 . The process as claimed in claim 7 , wherein the electrode is produced in such a way that the compound is present in an amount of 0.1-100% by weight, based on the electrode or on a region of the electrode; and/or wherein the compound is provided and applied or formed in a mixture comprising at least one binder. 15 . The process as claimed in claim 14 , wherein the at least one binder is present in the mixture in an amount of >0% to 30% by weight, based on the total weight of the compound and the at least one binder. 16 . A process for electrochemical conversion of CO 2 and/or CO, wherein CO 2 and/or CO is introduced at the cathode into an electrolysis cell comprising an electrode as claimed in claim 1 as cathode and reduced. 17 . A process for reduction or electrolysis of CO2 and/or CO, comprising: using at least one tetragonally crystallized compound containing at least one element selected from Cu and Ag, wherein the crystal lattice of the compound belongs to the I4 1 /amd space group, for reduction or in the electrolysis of CO 2 and/or CO. 18 . A process for reduction or electrolysis of CO 2 and/or CO, comprising: using the electrode of claim 1 . 19 . The electrode as claimed in claim 4 , wherein the compound is present in an amount of 40-100% by weight based on the electrode or on a region of the electrode 20 . The electrode as claimed in claim 4 , wherein the compound is present in an amount of 70-100% by weight, based on the electrode or on a region of the electrode.
by application of pressure only · CPC title
Reduction · CPC title
Diaphragms; Spacing elements · CPC title
comprising ion-exchange membranes in or on which electrode material is embedded · CPC title
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