Composite sintered body, electrostatic chuck member, electrostatic chuck device, and method for producing composite sintered body

Patent metadata

Field	Value
Publication number	US-2021114937-A1
Application number	US-201916981089-A
Country	US
Kind code	A1
Filing date	Mar 22, 2019
Priority date	Mar 22, 2018
Publication date	Apr 22, 2021
Grant date	—

Abstract

A ceramic composite sintered body, including: a metal oxide as a main phase, and silicon carbide as a sub-phase, in which crystal grains of the silicon carbide are dispersed in crystal grains of the metal oxide and at crystal grain boundaries of the metal oxide, and an average crystal grain size of the silicon carbide dispersed at the crystal grain boundaries of the metal oxide is 0.30 μm or less.

First claim

1 . A ceramic composite sintered body, comprising:
a metal oxide as a main phase; and silicon carbide as a sub-phase, wherein crystal grains of the silicon carbide are dispersed in crystal grains of the metal oxide and at crystal grain boundaries of the metal oxide, and an average crystal grain size (D50) of the silicon carbide dispersed at the crystal grain boundaries of the metal oxide is 0.30 μm or less.

2 . The composite sintered body according to claim 1 , wherein an average crystal grain size (D50) of the silicon carbide dispersed in the crystal grains of the metal oxide is 0.20 μm or less.

3 . The composite sintered body according to claim 1 , wherein a proportion of the crystal grains of the silicon carbide dispersed in the crystal grains of the metal oxide is 40% or more in an area ratio, based on total crystal grains of the silicon carbide.

4 . The composite sintered body according to claim 1 , wherein the metal oxide is aluminum oxide or yttrium oxide.

5 . The composite sintered body according to claim 1 , wherein an average crystal grain size of the metal oxide is 1.2 μm or more and 10 μm or less.

6 . An electrostatic chuck member comprising:
a plate-shaped base made of the composite sintered body according to claim 1 , which is used as a forming material, wherein the plate-shaped base has one main surface serving as a mounting surface on which a plate-shaped sample is mounted; and an electrostatic attraction electrode provided on a side opposite to the mounting surface of the base, or in an inside of the base.

7 . An electrostatic chuck device comprising:
the electrostatic chuck member according to claim 6 .

8 . A method for producing a ceramic composite sintered body, comprising:
a step of mixing metal oxide particles, silicon carbide particles, and a dispersion medium; a step of adjusting pH of slurry obtained in the mixing step to a range in which surface charges of the metal oxide particles in the slurry is positive and surface charges of the silicon carbide particles in the slurry is negative; a step of forming a formed body after removing the dispersion medium from the slurry having the adjusted pH; and a step of pressure-sintering the obtained formed body by heating the formed body to a temperature of 1600° C. or higher while compacting the formed body at a pressure of 25 MPa or more under a non-oxidative atmosphere, wherein the mixing step is a step of charging the metal oxide particles, the silicon carbide particles, the dispersion medium and a dispersive medium in a dispersion stirring mill and mixing them.

9 . The method for producing a composite sintered body according to claim 8 , further comprising:
a step of oxidizing a surface of the silicon carbide particle, prior to the mixing step.

10 . The method for producing a composite sintered body according to claim 8 , wherein in the pH adjusting step, the pH of the slurry is adjusted to 5 or more and 7 or less.

11 . The method for producing a composite sintered body according to claim 8 , wherein a metal oxide content of the metal oxide particles is 99.99% or more.

12 . The method for producing a composite sintered body according to claim 8 , wherein the dispersive medium is beads, and
the beads are removed from the slurry, before the step of forming a formed body is performed.

Assignees

• Sumitomo Osaka Cement Co Ltd

Inventors

• Hidaka Nobuhiro
• Kimura Naoto

Classifications

• H10P72/722

  Details of electrostatic chucks · CPC title

• H10P72/7616

  characterised by a coating, a hardness or a material · CPC title

• H10P72/72 Primary

  using electrostatic chucks · CPC title

• C04B35/62635

  Mixing details · CPC title

• C04B35/6261

  Milling · CPC title