Sorbent based gas concentration monitor
US-11619601-B2 · Apr 4, 2023 · US
US2021041382A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2021041382-A1 |
| Application number | US-202017073798-A |
| Country | US |
| Kind code | A1 |
| Filing date | Oct 19, 2020 |
| Priority date | Nov 1, 2017 |
| Publication date | Feb 11, 2021 |
| Grant date | — |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
A gas monitor apparatus includes a sorbent material that adsorbs a target gas based on a concentration of the target gas in a monitored environment and a reference material that does not respond to the target gas. The gas monitor also includes a first thermistor disposed within the sorbent material and a second thermistor disposed within the reference material, the first thermistor to provide a first indication of a first temperature of the sorbent material and the second thermistor to provide a second indication of a second temperature of the reference material. A processing device determines a concentration of the target gas based at least in part on a differential measurement between the first temperature and the second temperature.
Opening claim text (preview).
What is claimed is: 1 . A gas monitor comprising: a sorbent material that selectively adsorbs a target gas based on a concentration of the target gas in a monitored environment, wherein the sorbent material is configured to passively absorb the target gas without heat being provided to the sorbent material; a reference material that is not responsive to the target gas; a first thermistor disposed within the sorbent material and a second thermistor disposed within the reference material, the first thermistor to provide a first indication of a first temperature of the sorbent material and the second thermistor to provide a second indication of a second temperature of the reference material; and a processing device to determine a concentration of the target gas based at least in part on a differential measurement between the first temperature and the second temperature. 2 . The gas monitor of claim 1 , further comprising: a first heating element to provide heat to the sorbent material; and a second heating element to provide heat to the reference material, wherein the first heating element and the second heating element are to provide periodic heating to the sorbent material and the reference material to determine an absolute value of the concentration of the target gas or calibrate the gas monitor. 3 . The gas monitor of claim 2 , wherein the processing device is to determine the concentration of the target gas based on mapping the differential measurements to an isotherm curve for the target gas and sorbent. 4 . The gas monitor of claim 1 , wherein the sorbent material comprises a microporous or nano-porous carbon material and the target gas is carbon dioxide. 5 . The gas monitor of claim 1 , wherein the target gas is one of carbon dioxide, carbon monoxide, benzene, or Formaldehyde. 6 . The gas monitor of claim 1 , wherein the sorbent material comprises a printed sorbent ink with a binder. 7 . The gas monitor of claim 1 , further comprising a chamber allowing gas flow along the sorbent material and the reference material. 8 . The gas monitor of claim 1 , further comprising: a second sorbent material that selectively adsorbs a second target gas; and a third thermistor disposed within the second sorbent material, wherein the processing device is further to determine a concentration of the second target gas based at least in part on an output of the third thermistor. 9 . A method comprising: receiving an indication of a temperature of a sorbent, wherein the sorbent changes temperature based on a heat of adsorption of a target gas, wherein the sorbent is configured to passively absorb the target gas without heat being provided to the sorbent; and determining, based at least in part on the indication of the temperature of the sorbent, a concentration of the target gas in a monitored environment in contact with the sorbent. 10 . The method of claim 9 , further comprising: receiving a second indication of a second temperature of a reference material associated with the sorbent, wherein determining the concentration of the sorbent comprises calculating a differential between the indication of the temperature of the sorbent and the second indication of the second temperature of the reference material. 11 . The method of claim 9 , further comprising: periodically driving a heating element operatively coupled to the sorbent, wherein determining the concentration of the sorbent comprises determining an absolute value of the concentration based on a difference in the indication of the temperature of the sorbent relative to a second temperature due to the heating element. 12 . The method of claim 11 , further comprising determining the second temperature based on a second indication of the second temperature received from a thermistor coupled to a reference material that does not respond to the target gas. 13 . The method of claim 11 further comprising comparing changes in the difference to an isotherm curve for the sorbent in the presence of the target gas. 14 . The method of claim 11 , wherein periodically driving the heating element comprising driving the heating element at a rate greater 0.1 Hz and less than 100 Hz. 15 . The method of claim 9 , wherein the target gas is one of carbon dioxide, carbon monoxide, benzene, or Formaldehyde. 16 . A method comprising: coupling a first thermistor and a second thermistor to a substrate; depositing a sorbent material on the substrate to couple the sorbent material to the first thermistor, wherein the sorbent material selectively adsorbs a target gas based on a concentration of the target gas in a monitored environment, and wherein the sorbent material is configured to passively absorb the target gas without heat being provided to the sorbent material; depositing a reference material on the substrate to couple the reference material to the second substrate; and coupling the first thermistor and the second thermistor to a processing device. 17 . The method of claim 16 , wherein the method further comprises: providing a first heating element coupled to the sorbent material; and providing a second heating element coupled to the reference material, wherein the first heating element and the second heating element are to provide periodic heating to the sorbent material and the reference material to determine an absolute value of the concentration of the target gas. 18 . The method of claim 16 , wherein depositing the sorbent material comprises printing the sorbent material mixed with at least one of a binder or a solvent. 19 . The method of claim 16 , wherein depositing the sorbent material further comprises depositing the sorbent material with a porous glassy solid binder. 20 . The method of claim 16 , wherein depositing the sorbent material further comprises depositing a sorbent ink comprising the sorbent material, a styrene acrylic-based polymer latex, and a solvent.
by using a differential method · CPC title
the element being a non-linear resistance, e.g. thermistor (G01K7/26 takes precedence) · CPC title
in respect of space · CPC title
concerning the temperature responsive elements (measuring temperature or quantity of heat, thermally-sensitive elements G01K; thermoelectric devices H10N10/00, H10N15/00) · CPC title
Temperature mapping · CPC title
Related publications grouped by family.
Answers are generated from the same data shown on this page.