Ito particles, dispersion, and production method of ito film

US2021002495A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2021002495-A1
Application numberUS-202016928855-A
CountryUS
Kind codeA1
Filing dateJul 14, 2020
Priority dateJan 15, 2018
Publication dateJan 7, 2021
Grant date

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

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Provided is ITO particles satisfying a relationship expressed in Expression (1) given below. 16×S/P 2 ≤0.330 . . . (1) (In the expression, S indicates a particle area in a TEM photographed image, and P indicates a perimeter of the particle.)

First claim

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1 . ITO particles satisfying a relationship expressed in Expression (1) given below: 16× S/P 2≤0.330  (1) wherein S indicates a particle area in a TEM photographed image, and P indicates a perimeter of the particle. 2 . The ITO particles according to claim 1 , wherein a molar ratio of a content amount of Sn to a content amount of In (Sn/In) falls within a range from 3.5 to 24. 3 . The ITO particles according to claim 1 , wherein an aligned crystal orientation is provided inside particles. 4 . Dispersion comprising the ITO particles according to claim 1 , dispersed in a solvent. 5 . The dispersion according to claim 4 , wherein the solvent comprises water. 6 . The dispersion according to claim 4 , wherein the dispersion is substantially prevented from comprising a surfactant. 7 . The dispersion according to claim 4 , wherein a ratio of a volume of the ITO particles to a volume of the solvent is 40% or less. 8 . A production method of an ITO film, comprising: forming the dispersion according to claim 4 into mist; bringing the misted dispersion, into contact with a base plate; and drying the dispersion on the base plate after the contact.

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What does patent US2021002495A1 cover?
Provided is ITO particles satisfying a relationship expressed in Expression (1) given below. 16×S/P 2 ≤0.330 . . . (1) (In the expression, S indicates a particle area in a TEM photographed image, and P indicates a perimeter of the particle.)
Who is the assignee on this patent?
Univ Tohoku, Nikon Corp
What technology area does this patent fall under?
Primary CPC classification C01G19/00. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu Jan 07 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).