Surface treating apparatus

US2020224315A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2020224315-A1
Application numberUS-201916727390-A
CountryUS
Kind codeA1
Filing dateDec 26, 2019
Priority dateJan 10, 2019
Publication dateJul 16, 2020
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The film forming mechanism 110 ejects a continuous laminar liquid under pressure of about 0.01 MPa at a flow rate of 5 to 10 L/min. Such a liquid film prevents droplets reflected on a surface of an antiscattering member 60 from splashing and entering the adjacent treatment chamber. When a plate-like work 10 is shaken to collide with the liquid film, the film flows down along the plate-like work 10 since the film formed by the film forming mechanism 110 is liquid. Thereby, a shake of the plate-like work 10 is converged. An amount of air flowing in toward a transport direction in each treatment chamber is reduced.

First claim

Opening claim text (preview).

What is claimed is: 1 . A surface treating apparatus comprising: a first treatment chamber in which a sheet-like treatment object is carried in a vertically held state; a first processing solution flow down mechanism, provided in the first treatment chamber, for squirting a first processing solution to flow down from an upper portion of the carried treatment object over a surface region of the vertically held treatment object; a second treatment chamber adjacent to the first treatment chamber in which the treatment object is carried in a vertically held state; a second processing solution flow down mechanism, provided in the second treatment chamber, for squirting a second processing solution to flow down from the upper portion of the carried treatment object over a surface region of the vertically held treatment object; a partition wall, provided between the first treatment chamber and the second treatment chamber, having a carry-in opening that enables the treatment object to be carried in through the carry-in opening in the vertically held state; and a film forming mechanism provided between the first processing solution flow down mechanism in the first treatment chamber and the second processing solution flow down mechanism in the second treatment chamber that forms a thin layered liquid film along a direction of gravity on a plane orthogonal to a direction in which the treatment object is carried. 2 . The surface treating apparatus according to claim 1 , wherein the film forming mechanism is provided in the first treatment chamber or the second treatment chamber in a vicinity of carry-in opening. 3 . The surface treating apparatus according to claim 2 , further including an air flow rate control mechanism that controls air to flow in a vertical direction along the two planes of the sheet-like treatment object. 4 . The surface treating apparatus according to claim 1 , wherein the liquid film is composed of the same liquid that is squirted to flow down over the sheet-like treatment object in the treatment chamber. 5 . The surface treating apparatus according to claim 1 , wherein the liquid film has a film opening narrower than the carry-in opening; 6 . The surface treating apparatus according to claim 5 , wherein the film opening is wider than a width of a holding part for holding the sheet-like treatment object. 7 . The surface treating apparatus according to claim 1 , wherein thickness of the sheet-like treatment object is 40 μm or less. 8 . The surface treating apparatus according to claim 1 , wherein the film opening is formed by arranging a pair of discharge parts apart from each other. 9 . The surface treating apparatus according to claim 8 , wherein the pair of discharge parts discharge liquid obliquely so as to face the film opening. 10 . The surface treating apparatus according to claim 1 , further including a guiding plate that is spaced wider than the carry-in opening and guides the liquid film. 11 . The surface treating apparatus according to claim 3 , wherein the air flow rate control mechanism includes an air suction port and a height adjustment mechanism that adjusts a distance between the air suction port and the treatment object. 12 . A surface treating apparatus characterized by having: a plurality of treatment chambers arranged in series in which a sheet-like treatment object is carried in a vertically held state via carry-in openings, wherein, in each of the treatment chambers, a predetermined processing solution is squirted to flow down from an upper portion of a surface area of the vertically held treatment object to apply a predetermined surface treatment to the surface of the treatment object; and film forming mechanisms, among the treatment chambers, provided in an inside of the carry-in opening of the treatment chamber on an inlet side and/or an inside of the carry-in opening of the treatment chamber on an outlet side, wherein each of the film forming mechanisms forms a thin layered liquid film along a direction of gravity on a plane orthogonal to a direction in which the treatment object is carried. 13 . The surface treating apparatus according to claim 12 , wherein each of the treatment chambers includes an air flow rate control mechanism that controls air to flow in a vertical direction along the two planes of the sheet-like treatment object.

Assignees

Inventors

Classifications

  • Apparatus for treatments of printed circuits with liquids not provided for in groups H05K3/02 - H05K3/46; conveyors and holding means therefor (apparatus specially adapted for manufacturing assemblages of electric components, e.g. printed circuit boards, H05K13/00) · CPC title

  • by electroless plating (adhesives therefor H05K3/387) · CPC title

  • Specific elements or parts of the apparatus · CPC title

  • Vertically held PCB · CPC title

  • Apparatus for electroless plating · CPC title

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What does patent US2020224315A1 cover?
The film forming mechanism 110 ejects a continuous laminar liquid under pressure of about 0.01 MPa at a flow rate of 5 to 10 L/min. Such a liquid film prevents droplets reflected on a surface of an antiscattering member 60 from splashing and entering the adjacent treatment chamber. When a plate-like work 10 is shaken to collide with the liquid film, the film flows down along the plate-like work…
Who is the assignee on this patent?
Uemura Kogyo Kk
What technology area does this patent fall under?
Primary CPC classification C23C18/1619. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu Jul 16 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).