Island etched filter passages
US-2016346714-A1 · Dec 1, 2016 · US
Method for perforating carbon nanomaterial, and method for producing filter molded article
US2020101424A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2020101424-A1 |
| Application number | US-201916697967-A |
| Country | US |
| Kind code | A1 |
| Filing date | Nov 27, 2019 |
| Priority date | Jun 30, 2014 |
| Publication date | Apr 2, 2020 |
| Grant date | — |
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Abstract
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Provided is a method for perforating a carbon nanomaterial for forming a hole having a desired size in a carbon nanomaterial, characterized in that the carbon nanomaterial is heated and held at a low temperature in the air containing oxygen of 160 to 250° C. for a predetermined time and that a hole having a desired size is thereby formed uniformly in the carbon nanomaterial by controlling a length of heating time.
First claim
Opening claim text (preview).
1 . (canceled) 2 . A method for producing a filter molded article having a graphene layer as a filtering material, comprising: attaching a support layer having a water passage hole perforated in advance to the graphene layer formed on an initial substrate for a graphene; and forming a water passage hole by heating and holding the graphene layer at a low temperature in the air containing oxygen of 160 to 250° C. for a predetermined time. 3 . The method for producing a filter molded article according to claim 2 , wherein the support is a film resist, and the method includes exposing the film resist to light and stabilizing the film resist. 4 . The method for producing a filter molded article according to claim 2 , wherein the step of forming a water passage hole by heating and holding the graphene layer at a low temperature is performed in the air containing oxygen of 200 to 250° C.
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Classifications
- B01D67/0062Primary
by micromachining techniques, e.g. using masking and etching steps, photolithography · CPC title
Nanotechnology for materials or surface science, e.g. nanocomposites · CPC title
After-treatment · CPC title
Fullerenes, i.e. graphene-based structures, such as nanohorns, nanococoons, nanoscrolls or fullerene-like structures, e.g. WS2 or MoS2 chalcogenide nanotubes, planar C3N4, etc. · CPC title
Macromolecular compounds which are rendered insoluble or differentially wettable (G03F7/075 takes precedence; macromolecular azides G03F7/012; macromolecular diazonium compounds G03F7/021) · CPC title
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- What does patent US2020101424A1 cover?
- Provided is a method for perforating a carbon nanomaterial for forming a hole having a desired size in a carbon nanomaterial, characterized in that the carbon nanomaterial is heated and held at a low temperature in the air containing oxygen of 160 to 250° C. for a predetermined time and that a hole having a desired size is thereby formed uniformly in the carbon nanomaterial by controlling a len…
- Who is the assignee on this patent?
- Univ Shinshu, Kotobuki Tsushou Co Ltd
- What technology area does this patent fall under?
- Primary CPC classification B01D67/0062. Mapped technology areas include Operations & Transport.
- When was this patent published?
- Publication date Thu Apr 02 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).