Methods of forming semiconductor devices having threshold switching devices

US2019355905A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2019355905-A1
Application numberUS-201916529017-A
CountryUS
Kind codeA1
Filing dateAug 1, 2019
Priority dateAug 3, 2016
Publication dateNov 21, 2019
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

Forming a semiconductor device that includes a memory cell array may include performing a switching firing operation on one or more memory cells of the memory array to cause a threshold voltage distribution associated with threshold switching devices in the memory cells to be reduced. The switching device firing operation may be performed such that the threshold voltage distribution is reduced while maintaining the one or more threshold switching devices in the amorphous state. Performing the switching device firing operation on a threshold switching device may include heating the threshold switching device, applying a voltage to the threshold switching device, applying a current to the threshold switching device, some combination thereof, or the like.

First claim

Opening claim text (preview).

What is claimed is: 1 . A method, comprising: forming a memory cell array on a semiconductor substrate, the memory cell array including, a set of first conductive lines, a set of second conductive lines extending substantially perpendicularly to the first conductive lines, and a set of memory cells between the first conductive lines and the second conductive lines, the memory cells including data storage elements and threshold switching devices in an amorphous phase, each threshold switching device configured to change resistance based on a magnitude of a voltage applied on the threshold switching device at least meeting a threshold voltage associated with the threshold switching device, respectively; and performing a switching device firing operation on the memory cell array while maintaining the threshold switching devices in an amorphous state, such that a threshold voltage distribution associated with the threshold switching devices is reduced.

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Classifications

  • Write to perform initialising, forming process, electro forming or conditioning · CPC title

  • Auxiliary circuits · CPC title

  • Array using an access device for each cell which being not a transistor and not a diode · CPC title

  • comprising metal oxide memory material, e.g. perovskites · CPC title

  • using resistive RAM [RRAM] elements · CPC title

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What does patent US2019355905A1 cover?
Forming a semiconductor device that includes a memory cell array may include performing a switching firing operation on one or more memory cells of the memory array to cause a threshold voltage distribution associated with threshold switching devices in the memory cells to be reduced. The switching device firing operation may be performed such that the threshold voltage distribution is reduced …
Who is the assignee on this patent?
Samsung Electronics Co Ltd
What technology area does this patent fall under?
Primary CPC classification G11C13/0002. Mapped technology areas include Physics.
When was this patent published?
Publication date Thu Nov 21 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).