Polishing apparatus

US2019308296A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2019308296-A1
Application numberUS-201916371326-A
CountryUS
Kind codeA1
Filing dateApr 1, 2019
Priority dateApr 5, 2018
Publication dateOct 10, 2019
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A polishing apparatus includes a polishing unit having a spindle having an axial bore defined therein, a housing by which the spindle is rotatably supported, a polishing pad mounted on an end of the spindle and having an opening defined therein that is held in fluid communication with the axial bore, a slurry supply pipe inserted in the axial bore in the spindle and having a supply port supplying a slurry to the workpiece held on the chuck table and an inlet port remote from the supply port, introducing the slurry into the slurry supply pipe, a slurry introducing unit connected to the inlet port of the slurry supply pipe, introducing the slurry into the inlet port, and a cleaning water introducing unit connected to the inlet port of the slurry supply pipe, introducing cleaning water into the inlet port.

First claim

Opening claim text (preview).

What is claimed is: 1 . A polishing apparatus comprising: a chuck table holding a workpiece thereon; and a polishing unit polishing the workpiece held on the chuck table, wherein the polishing unit includes a spindle having an axial bore defined therein, a housing by which the spindle is rotatably supported, a polishing pad mounted on an end of the spindle and having an opening defined therein that is held in fluid communication with the axial bore, a slurry supply pipe inserted in the axial bore in the spindle and having a supply port supplying a slurry to the workpiece held on the chuck table and an inlet port remote from the supply port, introducing the slurry into the slurry supply pipe, slurry introducing means connected to the inlet port of the slurry supply pipe, introducing the slurry into the inlet port, and cleaning water introducing means connected to the inlet port of the slurry supply pipe, introducing cleaning water into the inlet port, the slurry supply pipe has an ejection port defined in a side wall of the slurry supply pipe above and near the supply port thereof, the ejection port being open toward an inner wall surface of the spindle that defines the axial bore, the slurry introducing means introduces the slurry into the slurry supply pipe at a flow rate set to such a value that the slurry introduced into the slurry supply pipe reaches the supply port without being ejected from the ejection port and is supplied from the supply port through the central opening in the polishing pad to the workpiece held on the chuck table, and the cleaning water introducing means introduces the cleaning water into the slurry supply pipe at a flow rate set to such a value, which is larger than the flow rate of the slurry, that the cleaning water introduced into the slurry supply pipe is ejected from the ejection port toward the inner wall surface of the spindle and cleans the inner wall surface of the spindle. 2 . The polishing apparatus according to claim 1 , wherein the supply port has a diameter smaller than an inside diameter of the slurry supply pipe leading to the supply port causing the cleaning water introduced into the slurry supply pipe to be ejected from the ejection port toward the inner wall surface of the spindle and cleans the inner wall surface of the spindle. 3 . The polishing apparatus according to claim 1 , wherein the slurry supply pipe has a guide disposed therein guiding the cleaning water toward the ejection port, whereby the cleaning water is ejected from the ejection port toward the inner wall surface of the spindle and cleans the inner wall surface of the spindle.

Assignees

Inventors

Classifications

  • for single side lapping · CPC title

  • for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents · CPC title

  • Feeding, loading or unloading work specially adapted to lapping · CPC title

  • characterised by the shape of the lapping pad surface, e.g. grooved · CPC title

  • by the mechanical action of a moving fluid, e.g. by flushing (B08B9/04 takes precedence {; by fluid jets mounted on cleaning devices B08B9/0433}) · CPC title

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What does patent US2019308296A1 cover?
A polishing apparatus includes a polishing unit having a spindle having an axial bore defined therein, a housing by which the spindle is rotatably supported, a polishing pad mounted on an end of the spindle and having an opening defined therein that is held in fluid communication with the axial bore, a slurry supply pipe inserted in the axial bore in the spindle and having a supply port supplyi…
Who is the assignee on this patent?
Disco Corp
What technology area does this patent fall under?
Primary CPC classification B24B37/107. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Thu Oct 10 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).