Substrate liquid treatment apparatus

Patent metadata

Field	Value
Publication number	US-2018218924-A1
Application number	US-201815883481-A
Country	US
Kind code	A1
Filing date	Jan 30, 2018
Priority date	Feb 1, 2017
Publication date	Aug 2, 2018
Grant date	—

Abstract

A substrate liquid treatment apparatus includes an inner tank configured to store a treatment liquid and having an upper opening, an outer tank disposed outside the inner tank, and a lid movable between a close position for closing the upper opening of the inner tank and an open position for opening the upper opening of the inner tank. The lid includes a main portion that covers the upper opening of the inner tank when the lid is positioned at the close position, and a splash shielding portion connected to the main portion. When the lid is positioned at the close position, the splash shielding portion extends from a position higher than an upper end of a side wall of the inner tank adjacent to the splash shielding portion to a position which is lower than the upper end of the side wall and which is on the outer tank side of the side wall.

First claim

What is claimed is:

1 . A substrate liquid treatment apparatus comprising:
an inner tank configured to store a treatment liquid and having an upper opening; an outer tank disposed outside the inner tank; and a lid movable between a close position for closing the upper opening of the inner tank and an open position for opening the upper opening of the inner tank, wherein the lid includes: a main portion that covers the upper opening of the inner tank when the lid is positioned at the close position; and a splash shielding portion connected to the main portion, and wherein when the lid is positioned at the close position, the splash shielding portion extends from a position higher than an upper end of a side wall of the inner tank adjacent to the splash shielding portion to a position which is lower than the upper end of the side wall and which is on the outer tank side of the side wall.

2 . The substrate liquid treatment apparatus according to claim 1 , wherein the lid includes a first lid part that covers a first part of the upper opening of the inner tank and a second lid part that covers a second part of the upper opening of the inner tank, the first lid part and the second lid part are rotatable about respective rotation axes extending horizontally to move between the close position and the open position, and the first lid part and the second lid part each have the main portion and the splash shielding portion.

3 . The substrate liquid treatment apparatus according to claim 2 , wherein the lid includes a guide portion that guides a liquid, which adheres to an upper surface of the main portion when the first lid part is in the close position, to a location outside of the outer tank when the first lid part is placed in the open position.

4 . The substrate liquid treatment apparatus according to claim 1 , wherein the outer tank is configured to receive the treatment liquid overflowing from the inner tank.

5 . The substrate liquid treatment apparatus according to claim 4 , wherein when the lid is positioned in the close position, a lower end of the splash shielding portion is positioned at a horizontal position outside the inner tank and inside the outer tank.

6 . The substrate liquid treatment apparatus according to claim 2 , wherein when the first lid part and the second lid part are in the close position, the whole of the main portions of the first lid part and the second lid part is positioned at a level which is substantially the same as a height of a surface of the treatment liquid in the inner tank when the treatment liquid is overflowing from the inner tank to the outer tank.

7 . The substrate liquid treatment apparatus according to claim 2 , wherein when the first lid part and the second lid part are in the close position, the main portions of the first lid part and the second lid part are inclined such that, when the treatment liquid is overflowing from the inner tank to the outer tank, proximal end portions of the main portions of the first lid part and the second lid part are positioned higher than the surface of the treatment liquid in the inner tank, while distal end portions of the main portions of the first lid part and the second lid part are positioned lower than the surface of the treatment liquid in the inner tank.

8 . The substrate liquid treatment apparatus according to claim 7 , wherein when the first lid part and the second lid part are in the close position, the distal end portion of the main portion of the first lid part and the distal end portion of the main portion of the second lid part overlap each other in a plan view.

9 . The substrate liquid treatment apparatus according to claim 8 , wherein when the first lid part and the second lid part are in the close position, the distal end portion of the main portion of the first lid part and the distal end portion of the main portion of the second lid part are spaced apart from each other.

10 . The substrate liquid treatment apparatus according to claim 7 , further comprising a first auxiliary lid and a second auxiliary lid disposed above the first lid part and the second lid part, respectively.

11 . The substrate liquid treatment apparatus according to claim 2 , wherein the splash shielding portion of each of the first lid part and the second lid part has a first side portion extending in a direction of the rotation axis, and a second side portion extending in a direction perpendicular to the rotation axis, and an oblique side portion extending at angles with respect to the first side portion and the second side portion to connect end portions of the first side portion and the second side portion with each other.

12 . The substrate liquid treatment apparatus according to claim 11 , wherein a lower surface of each of the first and second lid part is inclined such that the lower surface lowers as approaching the first side portion and lowers as approaching the second side portion.

13 . The substrate liquid treatment apparatus according to claim 2 , further comprising a substrate support member configured to support a plurality of substrates from below in the inner tank, and a substrate holding member provided on at least one of the first lid part and the second lid part, wherein the substrate holding member is configured to engage with the substrates supported by the substrate support member to prevent or suppress displacement of the substrates at least in an upward direction when the first lid part and the second lid part are in the close position.

Assignees

• Tokyo Electron Ltd

Inventors

• Tanaka Koji
• Shiokawa Toshiyuki
• Yamashita Koji
• Masutomi Hiroyuki
• Kosugi Hitoshi
• Inada Takao
• Ikeda Takashi
• Hirayama Tsukasa

Classifications

• H10P72/3312

  Vertical transfer of a batch of workpieces · CPC title

• H10P72/3308

  Vertical transfer of a single workpiece · CPC title

• H10P72/3302

  Mechanical parts of transfer devices · CPC title

• H10P72/0416

  with the semiconductor substrates being dipped in baths or vessels · CPC title

• H10P72/0408

  for drying · CPC title