Process for producing flexible organic-inorganic laminates

US2018187306A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2018187306-A1
Application numberUS-201515316661-A
CountryUS
Kind codeA1
Filing dateMay 7, 2015
Priority dateJun 12, 2014
Publication dateJul 5, 2018
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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Abstract

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The present invention is in the field of processes for producing flexible organic-inorganic laminates as well as barrier films comprising flexible organic-inorganic laminates by atomic layer deposition. In particular the present invention relates to a process for producing a laminate comprising more than once the sequence comprising: (a) depositing an inorganic layer by performing 4 to 150 cycles of an atomic layer deposition process, and (b) depositing an organic layer comprising sulfur by a molecular layer deposition process.

First claim

Opening claim text (preview).

1 . A process for producing a laminate, the process comprising, more than once, a sequence comprising: (a) depositing an inorganic layer by performing 4 to 150 cycles of an atomic layer deposition process, and (b) depositing an organic layer comprising sulfur by a molecular layer deposition process. 2 . The process according to claim 1 wherein the molecular layer deposition process comprises depositing the organic layer with a thiol. 3 . The process according to claim 1 , wherein the molecular layer deposition process comprises depositing the organic layer with a dithiol. 4 . The process according to claim 1 , wherein the molecular layer deposition process comprises depositing the organic layer with an aromatic thiol. 5 . The process according to claim 1 , wherein the atomic layer deposition process comprises depositing the inorganic layer with an Al-containing compound. 6 . The process according to claim 1 , wherein the process comprises performing the sequence comprising (a) and (b) at least 30 times. 7 . A laminate comprising, more than once, a sequence comprising (a) an inorganic layer having a thickness of 0.4 to 15 nm and (b) a sulfur-comprising organic layer. 8 . The laminate according to claim 7 wherein the organic layer comprises sulfur in an oxidation state −2, −1 or 0. 9 . The laminate according to claim 7 , wherein the inorganic layer comprises AlO x (OH) y , wherein 0≤x≤1.5; 0≤y≤3 and 2 x+y=3. 10 . The laminate according to claim 7 , comprising at least 30 of the inorganic layers (a) alternating with at least 30 of the organic layers (b). 11 . A barrier film comprising the laminate according to claim 7 . 12 . The barrier film according to claim 11 wherein the barrier film further comprises a polymeric substrate. 13 . The barrier film according to claim 11 wherein the barrier film further comprises a planarization layer. 14 . A method of encapsulating, packaging, or passivating an object, the method comprising: encapsulating, packaging, or passivating the object with the barrier film according to claim 11 . 15 . An electronic device comprising the barrier film according to claim 11 . 16 . The barrier film according to claim 11 , wherein a water vapor transmission rate after drying at 70% relative humidity at 70° C. for 480 h is smaller than 10 −5 g/m 2 d. 17 . The barrier film according to claim 11 , wherein a water vapor transmission rate after bending with a radius of 1.5 cm and drying at 70% relative humidity at 70° C. for 480 h is smaller than 10 −2 g/m 2 d. 18 . The barrier film according to claim 11 , wherein a water vapor transmission rate after bending with a radius of 1.5 cm and drying at 70% relative humidity at 70° C. for 480 h is not more than 1000 times higher than a water vapor transmission rate after drying at 70% relative humidity at 70° C. for 480 h without bending.

Assignees

Inventors

Classifications

  • of aluminium, magnesium or beryllium · CPC title

  • by cleaning or etching · CPC title

  • specially adapted for making a layer stack of alternating different compositions or gradient compositions · CPC title

  • Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D · CPC title

  • Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides · CPC title

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What does patent US2018187306A1 cover?
The present invention is in the field of processes for producing flexible organic-inorganic laminates as well as barrier films comprising flexible organic-inorganic laminates by atomic layer deposition. In particular the present invention relates to a process for producing a laminate comprising more than once the sequence comprising: (a) depositing an inorganic layer by performing 4 to 150 cycl…
Who is the assignee on this patent?
Basf Coatings Gmbh
What technology area does this patent fall under?
Primary CPC classification C23C16/45529. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu Jul 05 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).