Process for producing flexible organic-inorganic laminates

Patent metadata

Field	Value
Publication number	US-2018010249-A1
Application number	US-201515543788-A
Country	US
Kind code	A1
Filing date	Dec 22, 2015
Priority date	Jan 20, 2015
Publication date	Jan 11, 2018
Grant date	—

Abstract

Processes for producing flexible organic-inorganic laminates by atomic layer deposition are described, as well as barrier films comprising flexible organic-inorganic laminates. In particular, a process for producing a laminate including (a) depositing an inorganic layer by an atomic layer deposition process, and (b) depositing an organic layer comprising selenium by a molecular layer deposition process is provided.

First claim

We claim:

1 . A process for producing a laminate, the process comprising:
(a) depositing an inorganic layer by an atomic layer deposition process; and (b) depositing an organic layer comprising selenium by a molecular layer deposition process.

2 . The process according to claim 1 wherein a selenol is used in the molecular layer deposition process to deposit the organic layer.

3 . The process according to claim 1 wherein a diselenol is used in the molecular layer deposition process to deposit the organic layer.

4 . The process according to claim 1 wherein an aromatic selenol is used in the molecular layer deposition process to deposit the organic layer.

5 . The process according to claim 1 wherein an Al-containing compound is used in the atomic layer deposition process to deposit the inorganic layer.

6 . The process according to claim 1 wherein the inorganic layer is deposited by 4 to 150 atomic layer deposition cycles.

7 . A laminate comprising
(a) an inorganic layer; and (b) a selenium-comprising organic layer.

8 . The laminate according to claim 7 wherein the organic layer contains selenium in the oxidation state −2, −1 or 0.

9 . The laminate according to claim 7 wherein the inorganic layer comprises AlO x (OH) y , wherein 0≦x≦1.5, 0≦y≦3, and 2 x+y=3.

10 . The laminate according to claim 7 wherein the inorganic layer has a thickness of 0.4 to 15 nm.

11 . A barrier film comprising the laminate according to claim 7 .

12 . The barrier film according to claim 11 wherein the barrier film further comprises a polymeric substrate.

13 . The barrier film according to claim 11 wherein the barrier film further comprises a planarization layer.

14 . (canceled)

15 . An electronic device comprising the barrier film according to claim 11 .

Assignees

• Basf Coatings Gmbh

Inventors

• Ahlf Maraike
• Frank Juergen
• Adermann Torben
• Klotz Stephan

Classifications

• C23C16/45534

  Use of auxiliary reactants other than used for contributing to the composition of the main film, e.g. catalysts, activators or scavengers · CPC title

• H10K50/30

  Organic light-emitting transistors · CPC title

• C23C16/45529 Primary

  specially adapted for making a layer stack of alternating different compositions or gradient compositions · CPC title

• H10K50/8445 Primary

  multilayered coatings having a repetitive structure, e.g. having multiple organic-inorganic bilayers · CPC title

• C23C16/45553

  characterized by the use of precursors specially adapted for ALD · CPC title