Lithographic apparatus and device manufacturing method

Patent metadata

Field	Value
Publication number	US-2018046095-A1
Application number	US-201715795227-A
Country	US
Kind code	A1
Filing date	Oct 26, 2017
Priority date	Jul 24, 2003
Publication date	Feb 15, 2018
Grant date	—

Abstract

In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.

First claim

1 .- 20 . (canceled)

21 . A movable table system for a lithographic apparatus comprising a projection system configured to project a beam of radiation onto a substrate and a liquid supply system configured to provide a liquid to a space between the projection system and an object facing the projection system, the movable table system comprising a movable table having:
an essentially opaque surface comprising an aperture through which electromagnetic radiation passes to a surface located below the aperture and above which the liquid from the liquid supply system is to be provided, wherein the electromagnetic magnetic radiation passes to a sensor system component configured to be exposed to electromagnetic radiation; and a liquid impermeable layer spanning at least the aperture and through which the electromagnetic radiation passes to the surface below the liquid impermeable layer, the liquid impermeable layer preventing the surface from contact with liquid contacting the liquid impermeable layer.

22 . The movable table system of claim 21 , wherein the essentially opaque surface comprises a layer of metal with the aperture.

23 . The movable table system of claim 22 , wherein at least part of the liquid impermeable layer is within the aperture.

24 . The movable table system of claim 22 , wherein the liquid impermeable layer overlies at least part of the layer of metal.

25 . The movable table system of claim 21 , wherein the liquid impermeable layer is spaced apart from the surface.

26 . The movable table system of claim 21 , wherein the essentially opaque surface is in direct contact with the liquid impermeable layer.

27 . The movable table system of claim 21 , comprising a grating and the liquid impermeable layer overlies at least part of the grating.

28 . The movable table system of claim 21 , wherein the sensor system component comprises a detector and wherein the surface comprises a detection surface of the detector.

29 . The movable table system of claim 21 , comprising the sensor system component and the sensor system is located or locatable below the projection system.

30 . A lithographic apparatus comprising:
a projection system configured to project a beam of radiation onto a substrate; a liquid supply system configured to provide a liquid to a space between the projection system and an object facing the projection system; and the movable table system of claim 21 .

31 . A device manufacturing method, comprising:
projecting a beam of radiation onto a radiation-sensitive substrate through liquid in a space between a projection system of a lithographic apparatus and the substrate; providing a liquid between the projection system and an essentially opaque surface of a movable table of the lithographic apparatus, the essentially opaque surface comprising an aperture through which electromagnetic radiation can pass to a surface located below the aperture and above which the liquid from the liquid supply system is provided; and passing electromagnetic radiation through a liquid impermeable layer spanning at least the aperture to the surface below the liquid impermeable layer and to a sensor system component configured to be exposed to electromagnetic radiation, the liquid impermeable layer preventing the surface from contact with liquid contacting the liquid impermeable layer.

32 . The method according to claim 31 , comprising passing the electromagnetic radiation to a grating, the liquid impermeable layer overlying at least part of the grating.

33 . The method according to claim 31 , comprising passing the electromagnetic radiation through an aperture of a layer of metal onto the surface.

34 . The method according to claim 33 , wherein the liquid impermeable layer at least partially overlies the layer of metal.

35 . The method according to claim 31 , wherein the surface comprises a detection surface of a detector and comprising detecting the electromagnetic radiation using the detector.

36 . A movable table system for a lithographic apparatus comprising a projection system configured to project a beam of radiation onto a substrate and a liquid supply system configured to provide a liquid to a space between the projection system and an object facing the projection system, the movable table system comprising a movable table having:
a grating structure above which the liquid from the liquid supply system is to be provided and arranged to receive electromagnetic radiation, wherein the electromagnetic magnetic radiation passes from the grating structure to a sensor system component configured to be exposed to electromagnetic radiation, and a liquid impermeable layer through which the electromagnetic radiation passes to the grating structure below the liquid impermeable layer, the liquid impermeable layer at least in part preventing at least part of the grating structure from contact with liquid on the liquid impermeable layer.

37 . The movable table system of claim 36 , wherein the grating structure comprises a layer of metal having an aperture to receive the electromagnetic radiation, wherein at least part of the liquid impermeable layer spans the aperture.

38 . The movable table system of claim 36 , wherein the grating structure comprises a layer of metal having an aperture to receive the electromagnetic radiation, wherein at least part of the liquid impermeable layer overlies at least part of layer of metal.

39 . The movable table system of claim 38 , wherein the layer of metal is in contact with the liquid impermeable layer.

40 . The movable table system of claim 36 , wherein the grating structure comprises an aperture to pass the electromagnetic radiation to a surface, wherein the structure blocks passage of the liquid through the aperture to the surface.

41 . The movable table system of claim 40 , wherein the sensor system component comprises a detector and wherein the surface comprises a detection surface of the detector.

42 . The movable table system of claim 41 , wherein the liquid impermeable layer is spaced apart from the surface.

43 . The movable table system of claim 36 , comprising the sensor system component and the sensor system is located or locatable below the projection system.

44 . A lithographic apparatus comprising:
a projection system configured to project a beam of radiation onto a substrate; a liquid supply system configured to provide a liquid to a space between the projection system and an object facing the projection system; and the movable table system of claim 36 .

Assignees

• Asml Netherlands Bv

Inventors

• Sengers Timotheus Franciscus
• Donders Sjoerd Nicolaas Lambertus
• Jansen Hans
• Boogaard Arjen

Classifications

• G03F7/7095

  Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient · CPC title

• G03F7/70866 Primary

  of mask or workpiece · CPC title

• G03F7/70591

  Testing optical components · CPC title

• G03F7/7085

  Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load · CPC title

• G03F7/70341 Primary

  Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply (chemical composition of immersion liquids G03F7/2041) · CPC title