Cleaning device, method of manufacturing the same and substrate cleaning apparatus

Patent metadata

Field	Value
Publication number	US-2017209902-A1
Application number	US-201715480678-A
Country	US
Kind code	A1
Filing date	Apr 6, 2017
Priority date	Nov 20, 2014
Publication date	Jul 27, 2017
Grant date	—

Abstract

A cleaning device, according to one embodiment, for cleaning a substrate by being rotated, includes: a cleaning member configured to clean a substrate; and a sleeve configured to be provided along a circumference of the cleaning member, a lower part of the sleeve being divided into a plurality of chucking claws each of which holds a portion of a side face of the cleaning member, wherein at inside of each of the plurality of chucking claws, a plurality of protrusions are provided substantially parallel to a rotation direction of the cleaning member, an end of each of the plurality of protrusions is configured to contact the side face of the cleaning member.

First claim

1 - 13 . (canceled)

14 . A cleaning member holding apparatus configured to hold a cleaning member, wherein the cleaning member comprises:
a bigger diameter portion comprising a cleaning surface; and a smaller diameter portion comprising a first surface facing the cleaning surface on which at least one recess is provided; the cleaning member holding apparatus comprising: a chuck member configured to hold a side face of the smaller diameter portion; and at least one protrusion configured to be inserted to the recess.

15 . The cleaning member holding apparatus according to claim 14 further comprising a second surface from which the protrusion is projected, the second surface facing the first surface, there being a gap between the first surface and the second surface.

16 . The cleaning member holding apparatus according to claim 15 , wherein a relationship b>a +c is satisfied, where the “a” is a depth of the recess, the “b” is a length of the protrusion, and the “c” is a height of the gap.

17 . The cleaning member holding apparatus according to claim 14 further comprising a plurality of the protrusion.

18 . The cleaning member holding apparatus according to claim 14 , wherein a groove is provided on the protrusion.

19 . The cleaning member holding apparatus according to claim 14 , wherein an annular groove is provided on the protrusion.

20 . The cleaning member holding apparatus according to claim 14 , wherein the protrusion comprises a sharp distal end.

21 . The cleaning member holding apparatus according to claim 14 , wherein a concave portion is provided on a center of a bottom surface of the protrusion.

22 . The cleaning member holding apparatus according to claim 14 , wherein at least a part of a cross section of the protrusion is formed of a straight line.

23 . The cleaning member holding apparatus according to claim 14 , wherein the chuck member is a chuck claw.

24 . A cleaning member comprising:
a bigger diameter portion comprising a cleaning surface; and a smaller diameter portion comprising a first surface facing the cleaning surface on which at least one recess is provided, the recess being configured so that a protrusion of a cleaning member holding apparatus is inserted.

25 . The cleaning member according to claim 24 , wherein the protrusion is projected from a second surface of the cleaning member holding apparatus, the second surface facing the first surface, there being a gap between the first surface and the second surface.

26 . The cleaning member according to claim 25 , wherein a relationship b>a+c is satisfied, where the “a” is a depth of the recess, the “b” is a length of the protrusion, and the “c” is a height of the gap.

27 . The cleaning member according to claim 24 , wherein a plurality of the recess are provided on the first surface.

28 . The cleaning member according to claim 24 , wherein a bottom of the recess is tapered.

29 . The cleaning member according to claim 24 , wherein at least a part of a cross section of the recess is formed of a straight line.

Assignees

• Ebara Corp

Inventors

• Ishibashi Tomoatsu

Classifications

• H10P95/00

  Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass · CPC title

• H10P72/7618

  characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating carrousel · CPC title

• H10P72/7611

  characterised by edge profile or support profile · CPC title

• H10P72/0414

  using mainly spraying means, e.g. nozzles · CPC title

• H10P72/0412

  using mainly scrubbing means, e.g. brushes · CPC title