Scalable nucleic acid-based nanofabrication

Patent metadata

Field	Value
Publication number	US-2017190573-A1
Application number	US-201515312854-A
Country	US
Kind code	A1
Filing date	May 22, 2015
Priority date	May 22, 2014
Publication date	Jul 6, 2017
Grant date	—

Abstract

The present disclosure relates to the alignment of moieties (e.g., nanoparticles and/or nanowires) into prescribed architectures on two- and/or three-dimensional substrates (e.g., nucleic acid nanostructures/crystals). The present disclosure also relates to a nucleic acid (e.g., DNA) lithography method that includes, in some embodiments, adsorbing a bare nucleic acid nano-structure onto a surface of a substrate, and etching the surface of the substrate containing the bare nucleic acid nanostructure, thereby producing a patterned substrate.

First claim

What is claimed is:

1 . A nucleic acid lithography method comprising:
(a) adsorption a bare nucleic acid nanostructure onto a surface of a substrate; and (b) dry etching the surface of the substrate onto which the bare nucleic acid nanostructure is adsorbed, thereby producing a patterned substrate.

2 . The method of claim 1 , wherein the bare nucleic acid nanostructure is a bare deoxyribonucleic acid (DNA) nanostructure.

3 . The method of claim 1 , wherein the bare nucleic acid nanostructure is a bare ribonucleic acid (RNA) nanostructure.

4 . The method of claim 1 , wherein the bare nucleic acid nanostructure is a bare locked nucleic acid (LNA) nanostructure.

5 . The method of claim 1 , wherein the bare nucleic acid nanostructure is a bare protein nucleic acid (PNA) nanostructure.

6 . The method of claim 1 , wherein the dry etching is selected from plasma etching, ion beam etching, electron beam etching and X-ray etching.

7 . The method of claim 1 , wherein the bare nucleic nanostructure is a bare two-dimensional nucleic acid nanostructure.

8 . The method of claim 1 , wherein the bare nucleic nanostructure is a bare three-dimensional nucleic acid nanostructure.

9 . The method of claim 1 , wherein the substrate comprises an inorganic material.

10 . The method of claim 1 , wherein the substrate comprises an organic material.

11 . The method of claim 1 , wherein the substrate comprises silicon, silica, an oxide, a nitride, a metal or a non-metal.

12 . The method of claim 1 , wherein the substrate comprises a semiconductor or a combination of semiconductors.

13 . The method of claim 12 , wherein the semiconductor is a Group III-V semiconductor or a Group II-VI semiconductor.

14 . The method of claim 1 , wherein the substrate comprises a polymeric film.

15 . The method of claim 14 , wherein the polymeric film comprises polydimethylsiloxane (PDMS) or poly(methyl methacrylate) (PMMA).

16 . The method of claim 1 , wherein the bare nucleic acid nanostructure is a bare DNA nanostructure that is assembled from single-stranded DNA.

17 . The method of claim 16 , wherein the bare DNA nanostructure is assembled from synthetic single-stranded oligonucleotides.

18 . The method of claim 17 , wherein the bare DNA nanostructure is assembled from at least 50 synthetic single-stranded heterogeneous oligonucleotides.

19 . The method of claim 1 , wherein the bare DNA nanostructure is assembled from a single-stranded DNA with a length of at least 1 kilobase.

20 . The method of claim 1 , wherein the method does not include a metal, a metal oxide, or an oxide growth step.

21 . The method of claim 1 , wherein the adsorption step of (a) comprises contacting the surface of the substrate with a solution that comprises the bare nucleic acid nanostructure.

22 . The method of claim 21 , wherein the adsorption step of (a) includes physisorption, electrostatic absorption, or chemical absorption.

23 . The method of claim 1 , wherein the bare nucleic acid nanostructure is functionalized with metal nanoparticles, metal clusters, oxides, chalcogenides, nanowires, polymers and/or biomolecules.

24 . A patterned substrate produced by the method of claim 1 having a feature resolution of less than 10 nm.

25 . The patterned substrate of claim 24 , wherein the patterned substrate has a feature resolution of 1 nm to 1 μm.

26 . The patterned substrate of claim 25 , wherein the patterned substrate has a feature resolution of 5 nm to 1 μm.

27 . The patterned substrate of claim 25 , wherein the patterned substrate has a feature resolution of 1 nm to 2 nm.

28 . A device comprising the patterned substrate of claim 24 .

29 . The device of claim 28 , wherein the device is an electronic device, a plasmonic device, a photonic device, a photovoltaic device or a hybrid device.

30 . A nucleic acid lithography method comprising:
(a) adsorbing a bare nucleic acid nanostructure onto a first substrate layer that is positioned above a second substrate layer; (b) dry etching or wet etching the surface of the first substrate layer onto which the bare nucleic acid nanostructure is adsorbed, thereby producing a secondary mask that is positioned above the second substrate layer; and (c) dry etching the second substrate layer onto which the secondary mask is adsorbed, thereby producing a patterned substrate.

31 . The method of claim 30 , wherein the bare nucleic acid nanostructure is a bare deoxyribonucleic acid (DNA) nanostructure.

32 . The method of claim 30 , wherein the bare nucleic acid nanostructure is a bare ribonucleic acid (RNA) nanostructure.

33 . The method of claim 30 , wherein the bare nucleic acid nanostructure is a bare locked nucleic acid (LNA) nanostructure.

34 . The method of claim 30 , wherein the bare nucleic acid nanostructure is a bare protein nucleic acid (PNA) nanostructure.

35 . The method of claim 30 , wherein the dry etching of step (b) and/or step (c) is selected from plasma etching, ion beam etching, electron beam etching and X-ray etching.

36 . The method of claim 30 , wherein the bare nucleic nanostructure is a bare two-dimensional nucleic acid nanostructure.

37 . The method of claim 30 , wherein the bare nucleic nanostructure is a bare three-dimensional nucleic acid nanostructure.

38 . The method of claim 30 , wherein the first substrate and/or the second substrate comprise an inorganic material.

39 . The method of claim 30 , wherein the first substrate and/or the second substrate comprise an organic material.

40 . The method of claim 30 , wherein the first substrate and/or the second substrate comprises silicon, silica, an oxide, a nitride, a metal or a non-metal.

41 . The method of claim 30 , wherein the first substrate and/or the second substrate comprise a semiconductor or a combination of semiconductors.

42 . The method of claim 41 , wherein the semiconductor is a Group III-V semiconductor or a Group II-VI semiconductor.

43 . The method of claim 30 , wherein the first substrate and/or the second substrate comprises a polymeric film.

44 . The method of claim 43 , wherein the polymeric film comprises polydimethylsiloxane (PDMS) or poly(methyl methacrylate) (PMMA).

45 . The method of claim 30 , wherein the bare nucleic acid nanostructure is a bare DNA nanostructure that is assembled from single-stranded DNA.

46 . The method of claim 45 , wherein the bare DNA nanostructure is assembled from synthetic single-stranded oligonucleotides.

47 . The method of claim 46 , wherein the bare DNA nanostructure is assembled from at least 50 synthetic single-stranded heterogeneous oligonucleotides.

48 . The method of claim 45 , wherein the bare DNA nanostructure is assembled from a single-stranded DNA with a length of at least 1 kilobase.

49 . The method of claim 30 , wherein the method does not include a metal, metal oxide, or an oxide growth step.

50 . The method of

Assignees

• Harvard College

Inventors

• Shen Jie
• Sun Wei
• Yin Peng

Classifications

• B82B3/0047 Primary

  Bonding two or more elements · CPC title

• B82Y5/00

  Nanobiotechnology or nanomedicine, e.g. protein engineering or drug delivery · CPC title

• B82Y30/00

  Nanotechnology for materials or surface science, e.g. nanocomposites · CPC title

• B01J2219/00659

  Two-dimensional arrays · CPC title

• B82Y40/00

  Manufacture or treatment of nanostructures · CPC title