Fabrication of multilayer nanograting structures

Patent metadata

Field	Value
Publication number	US-10490679-B2
Application number	US-201816158977-A
Country	US
Kind code	B2
Filing date	Oct 12, 2018
Priority date	Feb 17, 2016
Publication date	Nov 26, 2019
Grant date	Nov 26, 2019

Abstract

Provided are nanograting structures and methods of fabrication thereof that allow for stable, robust gratings and nanostructure embedded gratings that enhance electromagnetic field, fluorescence, and photothermal coupling through surface plasmon or, photonic resonance. The gratings produced exhibit long term stability of the grating structure and improved shelf life without degradation of the properties such as fluorescence enhancement. Embodiments of the invention build nanograting structures layer-by-layer to optimize structural and optical properties and to enhance durability.

First claim

Having thus described various embodiments of the invention, what is claimed as new and desired to be protected by Letters Patent includes the following:

1. A method of manufacturing a nanoscale grating structure, comprising the steps of:
spin-coating a mold in a solution of a polymer dissolved in a solvent;
curing the solution of the polymer in the mold to obtain a grating;
transferring the grating to a substrate;
applying a hydrophilicity treatment to the grating;
coating the treated grating in a fluorescence-enhancing reflective layer;
coating the fluorescence-enhancing reflective layer with a protective layer.

2. The method of claim 1 , wherein curing the solution of the polymer comprises exposing the polymer solution to ultraviolet light.

3. The method of claim 1 , wherein curing the solution of the polymer comprises exposing the grating to 3-aminopropyltriethoxysilane.

4. The method of claim 1 , further comprising the step of annealing the grating.

5. The method of claim 4 , wherein the grating is annealed at 60 degrees Celsius for three hours, then heated to 400 degrees Celsius at a rate of 1 degree Celsius per minute, and then held at 400 degrees Celsius for one hour.

6. The method of claim 1 , further comprising the step of applying an adhesion layer between the treated polymer grating and the fluorescence-enhancing reflective layer.

7. The method of claim 6 , wherein the adhesion layer is made of titanium (IV) oxide.

8. The method of claim 6 , wherein the adhesion layer is between approximately 5 nanometers thick and 10 nanometers thick.

9. The method of claim 1 , wherein the fluorescence-enhancing reflective layer is made of silver.

10. The method of claim 1 , wherein the protective layer is made of aluminum (III) oxide and is approximately 10 nanometers thick.

11. The method of claim 1 , wherein the protective layer is deposited using atomic layer deposition.

12. The method of claim 1 , wherein the polymer is poly(methylsilsesquioxane).

13. A nanoscale structure, comprising:
a substrate;
a poly(methylsilsesquioxane) base layer applied to the substrate,
wherein the base layer has been subjected to a crosslinker,
wherein the base layer has been subjected to a hydrophilicity agent;
an adhesion layer applied directly to the base layer;
a fluorescence-enhancing reflective layer applied directly to the adhesion layer.

14. The structure of claim 13 , wherein the fluorescence-enhancing reflective layer is gold.

15. The structure of claim 13 , wherein the fluorescence-enhancing reflective layer is silver, and further comprising a protective layer applied directly to the fluorescence-enhancing reflective layer.

16. The structure of claim 13 , wherein the hydrophilicity treatment is exposure to oxygen plasma.

17. The structure of claim 13 , wherein the adhesion layer is chromium (III) oxide.

18. The structure of claim 13 , wherein the crosslinker is 3-aminopropyltriethoxysilane.

19. The structure of claim 13 , wherein the structure is a grating structure.

Assignees

• Univ Missouri

Inventors

• Gangopadhyay Shubhra
• Bok Sangho
• Pathan Samiullah
• Mathai Cherian Joseph
• Basuray Sagnik
• Gangopadhyay Keshab
• Chen Biyan
• Grant Sheila
• Wood Aaron

Classifications

• H10P14/68

  Organic materials, e.g. photoresists · CPC title

• H10P14/66

  characterised by the type of materials · CPC title

• H10P14/60

  of insulating materials · CPC title

• G02B5/1809

  with pitch less than or comparable to the wavelength · CPC title

• C01G23/04

  Oxides; Hydroxides · CPC title