Method for perforating carbon nanomaterial and method for producing filter molded article

Patent metadata

Field	Value
Publication number	US-2017128890-A1
Application number	US-201515322682-A
Country	US
Kind code	A1
Filing date	Jun 17, 2015
Priority date	Jun 30, 2014
Publication date	May 11, 2017
Grant date	—

Abstract

An object is to form a hole having a desired size accurately and uniformly in a carbon nanomaterial used for a filter or the like, such as a graphene, a carbon nanotube, or a carbon nanohorn.
Provided is a method for perforating a carbon nanomaterial for forming a hole having a desired size in a carbon nanomaterial, characterized in that the carbon nanomaterial is heated and held at a low temperature in the air containing oxygen of 160 to 250° C. for a predetermined time and that a hole having a desired size is thereby formed uniformly in the carbon nanomaterial by controlling a length of heating time.

First claim

1 . A method for perforating a carbon nanomaterial for forming a hole having a desired size in the carbon nanomaterial, wherein
the carbon nanomaterial is heated and held at a low temperature in the air containing oxygen of 200 to 250° C. for a predetermined time.

2 . A method for producing a filter molded article having a graphene layer as a filtering material, comprising:
attaching a support layer having a water passage hole perforated in advance to the graphene layer formed on an initial substrate for a graphene; and forming a water passage hole by heating and holding the graphene layer at a low temperature in the air containing oxygen of 160 to 250° C. for a predetermined time.

3 . The method for producing a filter molded article according to claim 2 , wherein
the support is a film resist, and the method includes exposing the film resist to light and stabilizing the film resist.

4 . The method for producing a filter molded article according to claim 2 , wherein
the step of forming a water passage hole by heating and holding the graphene layer at a low temperature is performed in the air containing oxygen of 200 to 250° C.

Assignees

• Univ Shinshu
• Kotobuki Tsushou Co Ltd

Inventors

• Kaneko Katsumi
• Takagi Toshio
• Murata Katsuyuki

Classifications

• Y10S977/902

  Specified use of nanostructure · CPC title

• C01B32/05

  Preparation or purification of carbon not covered by groups C01B32/15, C01B32/20, C01B32/25, C01B32/30 · CPC title

• B01D67/0062 Primary

  by micromachining techniques, e.g. using masking and etching steps, photolithography · CPC title

• G03F7/11

  having cover layers or intermediate layers, e.g. subbing layers {(G03F7/091 - G03F7/093, B41N3/03 take precedence)} · CPC title

• Y10S977/842

  for carbon nanotubes or fullerenes · CPC title