Substrate processing apparatus

US2017073813A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2017073813-A1
Application numberUS-201615220385-A
CountryUS
Kind codeA1
Filing dateJul 26, 2016
Priority dateSep 11, 2015
Publication dateMar 16, 2017
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Provided is a substrate processing apparatus including a tube having an inner space therein, a substrate supporting unit including a plurality of isolation plates configured to vertically stack a plurality of substrates thereon and divide a processing space, in which the plurality of substrates are processed, into a plurality of processing spaces in the tube, a gas supply unit configured to supply a processing gas to the plurality of substrates, and an exhaust unit disposed to face the gas supply unit to exhaust a gas inside the tube. A plurality of through-holes are defined in each of the isolation plates.

First claim

Opening claim text (preview).

What is claimed is: 1 . A substrate processing apparatus comprising: a tube having an inner space therein; a substrate supporting unit comprising a plurality of isolation plates configured to vertically stack a plurality of substrates thereon and divide a processing space, in which the plurality of substrates are processed, into a plurality of processing spaces in the tube; a gas supply unit configured to supply a processing gas to the plurality of substrates; and an exhaust unit disposed to face the gas supply unit to exhaust a gas inside the tube, wherein a plurality of through-holes are provided in each of the isolation plates. 2 . The substrate processing apparatus of claim 1 , wherein the plurality of isolation plates are vertically spaced apart from each other, and the plurality of substrates are spaced apart from the plurality of isolation plates and stacked between the plurality of isolation plates, respectively. 3 . The substrate processing apparatus of claim 1 , wherein the gas supply unit comprises a plurality of injection nozzles installed at heights different from each other to respectively correspond to the processing spaces at one side of the tube, and the exhaust unit comprises a plurality of exhaust ports vertically installed to correspond to the injection nozzle on the other side of the tube. 4 . The substrate processing apparatus of claim 3 , wherein at least a portion of the injection nozzle passes through the tube. 5 . The substrate processing apparatus of claims 1 , wherein the plurality of through-holes are defined radially toward a substrate disposed therebelow. 6 . The substrate processing apparatus of claim 5 , wherein the sum of effective areas of the through-holes defined in a central portion of the isolation plate is different from that of effective areas of the through-holes defined in an outer portion thereof. 7 . The substrate processing apparatus of claim 6 , wherein the total sum of the areas of the plurality of through-holes is 5% to 50% with respect to an entire area of the isolation plates. 8 . The substrate processing apparatus of claims 1 , wherein the through-hole extends in a direction crossing a flow direction of a gas flowing from the gas supply unit to the exhaust unit, and the plurality of through-holes are defined in a line along the flow direction of the gas. 9 . The substrate processing apparatus of claim 8 , wherein the sum of effective areas of the through-holes disposed adjacent to the gas supply unit is different from that of effective areas of the through-holes disposed far from the gas supply unit with respect to a central portion of the isolation plate. 10 . The substrate processing apparatus of claim 9 , wherein the total sum of the areas of the plurality of through-holes is 5% to 50% with respect to an entire area of the isolation plate.

Assignees

Inventors

Classifications

  • Laminar flow · CPC title

  • Elongated nozzles, tubes with holes · CPC title

  • the substrate being supported substantially horizontally · CPC title

  • Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps · CPC title

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Frequently asked questions

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What does patent US2017073813A1 cover?
Provided is a substrate processing apparatus including a tube having an inner space therein, a substrate supporting unit including a plurality of isolation plates configured to vertically stack a plurality of substrates thereon and divide a processing space, in which the plurality of substrates are processed, into a plurality of processing spaces in the tube, a gas supply unit configured to sup…
Who is the assignee on this patent?
Eugene Technology Co Ltd
What technology area does this patent fall under?
Primary CPC classification C23C16/45578. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu Mar 16 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).