Substrate processing apparatus and control method for a substrate processing apparatus
US-2024120204-A1 · Apr 11, 2024 · US
US2017051402A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2017051402-A1 |
| Application number | US-201514828304-A |
| Country | US |
| Kind code | A1 |
| Filing date | Aug 17, 2015 |
| Priority date | Aug 17, 2015 |
| Publication date | Feb 23, 2017 |
| Grant date | — |
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A susceptor includes a plate part, a first heater for heating a first portion of the plate part, a second heater for heating a second portion of the plate part, and a heat insulating portion for thermally insulating the first portion and the second portion from each other on an upper surface side of the plate part.
Opening claim text (preview).
What is claimed is: 1 . A susceptor comprising: a plate part; a first heater for heating a first portion of the plate part; a second heater for heating a second portion of the plate part; and a heat insulating portion for thermally insulating the first portion and the second portion from each other on an upper surface side of the plate part. 2 . The susceptor according to claim 1 , wherein the heat insulating portion is a grooved portion provided in the plate part on the upper surface side. 3 . The susceptor according to claim 1 , wherein the second portion surrounds the first portion as viewed in plan. 4 . The susceptor according to claim 3 , further comprising: a third portion formed as a portion of the plate part, the third portion surrounding the second portion as viewed in plan; a third heater for heating the third portion; and an outer heat insulating portion for thermally insulating the second portion and the third portion from each other on the upper surface side of the plate part. 5 . The susceptor according to claim 1 , wherein each of the first portion and the second portion is formed in sectoral form as viewed in plan. 6 . The susceptor according to claim 1 , wherein the first portion is a portion including an outer edge of the plate part, and the second portion is a portion including an outer edge of the plate part. 7 . The susceptor according to claim 3 , further comprising: a plurality of third portions formed as part of the plate part, the third portions as a whole surrounding the second portion as viewed in plan; a plurality of third heaters provided in the plurality of third portions in a one-to-one relationship; an outer heat insulating portion for thermally insulating the second portion and the plurality of third portions from each other on the upper surface side of the plate part; and outer-edge-side heat insulating portions for thermally insulating the plurality of third portions from each other on the upper surface side of the plate part. 8 . The susceptor according to claim 2 , further comprising: a first closing part provided on the first portion to close part of a groove in the grooved portion without contacting the second portion; and a second closing part provided on the second portion to close part of a groove in the grooved portion without contacting the first portion and the first closing part. 9 . The susceptor according to claim 2 , wherein the first portion and the second portion are separate parts; a projection is provided on a side surface of the first portion, the second portion being put on the projection; and the grooved portion is formed by a side surface of the first portion, an upper surface of the projection and a side surface of the second portion. 10 . The susceptor according to claim 1 , further comprising a cooling member attached to the plate part. 11 . The susceptor according to claim 2 , further comprising a cooling member attached to the plate part, wherein the cooling member is attached to the plate part right below the grooved portion. 12 . The susceptor according to claim 1 , further comprising an electrostatic chuck. 13 . The susceptor according to claim 1 , wherein the heat insulating portion is a cooling device provided in the plate part. 14 . A substrate processing apparatus comprising: a susceptor having a plate part, a first heater for heating a first portion of the plate part, a second heater for heating a second portion of the plate part, and a heat insulating portion for thermally insulating the first portion and the second portion from each other on an upper surface side of the plate part; a chamber in which the susceptor is housed; and an gas exhaust part attached to a side surface of the chamber, wherein the first portion is a portion including an outer edge of the plate part; the second portion is a portion including an outer edge of the plate part; and the gas exhaust part and the first portion are opposed to each other as viewed in plan. 15 . A substrate processing apparatus comprising: a susceptor having a plate part, a first heater for heating a first portion of the plate part, a second heater for heating a second portion of the plate part, and a heat insulating portion for thermally insulating the first portion and the second portion from each other on an upper surface side of the plate part; a chamber in which the susceptor is housed; and a gate valve attached to a side surface of the chamber, wherein the first portion is a portion including an outer edge of the plate part; the second portion is a portion including an outer edge of the plate part; and the gate valve and the second portion are opposed to each other as viewed in plan.
Temperature monitoring · CPC title
characterised by the construction of the processing chambers, e.g. modular processing chambers · CPC title
mainly by convection · CPC title
mainly by conduction · CPC title
characterized by the apparatus · CPC title
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