Process and device for forming a graphene layer

Patent metadata

Field	Value
Publication number	US-2017044669-A1
Application number	US-201615258983-A
Country	US
Kind code	A1
Filing date	Sep 7, 2016
Priority date	May 6, 2013
Publication date	Feb 16, 2017
Grant date	—

Abstract

The invention concerns a method of forming a graphene layer involving: heating a support layer in a reaction chamber; and forming the graphene layer on a surface of the support layer by: a) during a first time period, introducing into the reaction chamber an organic compound gas to cause a formation of carbon atoms on the surface; b) during a second time period after the first time period, reducing a rate of introduction of the organic compound gas into the reaction chamber and introducing into the reaction chamber a further gas, wherein the further gas is a carbon etching gas; and repeating a) and b) one or more times.

First claim

1 . An apparatus for forming a graphene layer comprising:
a reaction chamber containing a support layer; at least one heating element for heating the support layer; and a control device configured to control the formation of said graphene layer on a surface of said support layer by: a) during a first time period, introducing into said reaction chamber an organic compound gas to provide graphene growth by causing a formation of carbon atoms on said surface; b) during a second time period directly after said first time period, reducing a rate of introduction of said organic compound gas into said reaction chamber and introducing into said reaction chamber a further gas, wherein said further gas is a carbon etching gas; and repeating a) and b) one or more times.

2 . The apparatus of claim 1 , wherein the control device is further configured to introduce said further gas into said reaction chamber during each of said first time periods.

3 . The apparatus of claim 2 , wherein said further gas is at least one of hydrogen and oxygen.

4 . The apparatus of claim 1 , wherein the control device is further configured to control each of said second time periods to have a duration at least one tenth of the duration of each of said first time periods.

5 . The apparatus of claim 1 , wherein the control device is further configured to control each of said second time periods to have a duration at least equal to the duration of each of said first time periods.

6 . The apparatus of claim 1 , wherein the control device is further configured to control the duration of each of said first time periods to be at least one second.

7 . The apparatus of claim 1 , wherein the control device is further configured to control the duration of each of said second time periods to be at least 1 second.

8 . The apparatus of claim 1 , wherein the control device is further configured control the dose of organic compound gas introduced into said reaction chamber during each of said first time periods to be equal to between 0.1 and 100 Pa·s.

9 . The apparatus of claim 1 , wherein the control device is further configured to control the dose of organic compound gas introduced into said reaction chamber during each of said second time periods to be less than or equal to 0.01 Pa·s.

10 . The apparatus of claim 1 , wherein said support layer is a copper foil.

11 . The apparatus of claim 1 , wherein the control device is further configured to control the introduction of said organic compound gas into said reaction chamber to be at a rate of at least 1 sccm during said first time periods and to be at a rate of at most 0.1 sccm during said second time periods.

12 . The apparatus of claim 1 , wherein the control device is further configured not to introduce said organic compound gas into said reaction chamber during said second time periods.

13 . The apparatus of claim 1 , wherein the control device is further configured to repeat a) and b) throughout a growth period of said graphene layer of at least 10 seconds.

14 . The apparatus of claim 1 , wherein the control device is further configured to additionally introduce an inert gas into said reaction chamber during said first and second time periods.

15 . The apparatus of claim 1 , wherein said organic compound gas is at least one of: methane, butane, ethylene and acetylene.

16 . The apparatus of claim 1 , wherein said graphene layer has between 1 and 10 layers of carbon atoms.

17 . The apparatus of claim 1 , wherein said graphene layer has a single layer of carbon atoms.

18 . The apparatus claim 1 , wherein the control device is further configured to control the rate of introduction of said organic compound gas into said reaction chamber to be at a first rate during one or more of said first time periods, and to be at a second rate lower than said first rate during one or more of said first time periods.

Assignees

• Centre Nat Rech Scient

Inventors

• Bouchiat Vincent
• Coraux Johann
• Han Zheng

Classifications

• C01B2204/22

  Electronic properties · CPC title

• C23C16/4586

  Elements in the interior of the support, e.g. electrodes, heating or cooling devices · CPC title

• C01B2204/04

  Specific amount of layers or specific thickness · CPC title

• C01B2204/02

  Single layer graphene · CPC title

• C23C16/52 Primary

  Controlling or regulating the coating process {(C23C16/45557, C23C16/279 take precedence)} · CPC title