Copper foil with carrier, laminate, printed wiring board, and method of producing electronic devices

US2016381806A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2016381806-A1
Application numberUS-201615188292-A
CountryUS
Kind codeA1
Filing dateJun 21, 2016
Priority dateJun 24, 2015
Publication dateDec 29, 2016
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present invention provides a copper foil with a carrier including an ultra-thin copper layer having a thickness of 0.9 μm or less and capable of preferably preventing generation of pin holes during peeling of the carrier. A copper foil with a carrier including a carrier, an intermediate layer, and an ultra-thin copper layer in this order, wherein the ultra-thin copper layer has a thickness of 0.9 μm or less, the surface close to the ultra-thin copper layer of the carrier has an arithmetic average roughness Ra of 0.3 μm or less, as measured with a laser microscope according to JIS B0601-1994, and the releasing strength during peeling of the carrier by a 90° releasing method according to JIS C 6471 8.1 is 20 N/m or less.

First claim

Opening claim text (preview).

What is claimed is: 1 . A copper foil with a carrier, comprising a carrier, an intermediate layer, and an ultra-thin copper layer in this order, wherein the ultra-thin copper layer has a thickness of 0.9 μm or less, the surface close to the ultra-thin copper layer of the carrier has an arithmetic average roughness Ra of 0.3 μm or less, as measured with a laser microscope according to JIS B0601-1994, and the releasing strength during peeling of the carrier by a 90° releasing method according to JIS C 6471 8.1 is 20 N/m or less. 2 . The copper foil with a carrier according to claim 1 , wherein the surface close to the ultra-thin copper layer of the carrier has an arithmetic average roughness Ra of 0.1 to 0.3 μm, as measured with a laser microscope according to JIS B0601-1994. 3 . The copper foil with a carrier according to claim 1 , wherein the releasing strength during peeling of the carrier by a 90° releasing method according to JIS C 6471 8.1 is 3 to 20 N/m. 4 . The copper foil with a carrier according to claim 2 , wherein the releasing strength during peeling of the carrier by a 90° releasing method according to JIS C 6471 8.1 is 3 to 20 N/m. 5 . The copper foil with a carrier according to claim 1 , wherein the ultra-thin copper layer has a thickness of 0.05 to 0.9 μm. 6 . The copper foil with a carrier according to claim 1 , wherein the ultra-thin copper layer has a thickness of 0.1 to 0.9 μm. 7 . The copper foil with a carrier according to claim 1 , wherein the ultra-thin copper layer has a thickness of 0.85 μm or less. 8 . The copper foil with a carrier according to claim 1 , wherein the number of pin holes per unit area (m 2 ) of the ultra-thin copper layer (pin holes/m 2 ) is 20 pin holes/m 2 or less. 9 . The copper foil with a carrier according to claim 1 , wherein if the ultra-thin copper layer is disposed on one surface of the carrier in a copper foil with a carrier according to claim 1 , one or more layers selected from the group consisting of a roughened layer, a heat-resistant layer, an anti-corrosive layer, a chromate treated layer, and a silane coupling treated layer are disposed on one surface or both surfaces close to the ultra-thin copper layer and close to the carrier, or if the ultra-thin copper layer is disposed on both surfaces of the carrier in a copper foil with a carrier according to claim 1 , one or more layers selected from the group consisting of a roughened layer, a heat-resistant layer, an anti-corrosive layer, a chromate treated layer, and a silane coupling treated layer are disposed on the surface of the ultra-thin copper layer on at least one of both surfaces. 10 . The copper foil with a carrier according to claim 9 , wherein at least one of the anti-corrosive layer and the heat-resistant layer contains one or more elements selected from nickel, cobalt, copper, and zinc. 11 . The copper foil with a carrier according to claim 1 , wherein the ultra-thin copper layer has a resin layer thereon. 12 . The copper foil with a carrier according to claim 9 , wherein the one or more layers selected from a roughened layer, a heat-resistant layer, an anti-corrosive layer, a chromate treated layer, and a silane coupling treated layer have a resin layer thereon. 13 . The copper foil with a carrier according to claim 11 , wherein the resin layer contains a dielectric substance. 14 . The copper foil with a carrier according to claim 12 , wherein the resin layer contains a dielectric substance. 15 . A method of producing a printed wiring board using a copper foil with a carrier according to claim 1 . 16 . A method of producing a laminate using a copper foil with a carrier according to claim 1 . 17 . A laminate comprising a copper foil with a carrier according to claim 1 and a resin, wherein end surfaces of the copper foil with a carrier are partially or completely covered with the resin. 18 . A laminate comprising two copper foils with a carrier according to claim 1 , wherein the carrier or the ultra-thin copper layer of one of the copper foils with a carrier is laminated on the carrier or the ultra-thin copper layer of the other copper foil with a carrier. 19 . A method of producing a printed wiring board using a laminate produced by the method according to claim 16 . 20 . A method of producing a printed wiring board, comprising: a step of disposing at least one layer group composed of a resin layer and a circuit on a laminate produced by the method according to claim 16 , and, a step of peeling the ultra-thin copper layer or the carrier from the copper foil with a carrier of the laminate after formation of the at least one layer group composed of a resin layer and a circuit. 21 . A method of producing a printed wiring board, comprising: a step of providing a copper foil with a carrier according to claim 1 and an insulating substrate, a step of laminating the copper foil with a carrier on the insulating substrate, a step of peeling the copper carrier of the copper foil with a carrier to form a copper clad laminate board after lamination of the copper foil with a carrier on the insulating substrate, and a step of then forming a circuit by one of a semi-additive process, a subtractive process, a partly additive process, and a modified semi-additive process. 22 . A method of producing a printed wiring board, comprising: a step of forming a circuit on the surface close to the ultra-thin copper layer or the carrier of a copper foil with a carrier according to claim 1 , a step of forming a resin layer on the surface close to the ultra-thin copper layer or the carrier of the copper foil with a carrier such that the circuit is embedded, a step of peeling the carrier or the ultra-thin copper layer, and a step of removing the ultra-thin copper layer or the carrier after peeling of the carrier or the ultra-thin copper layer to expose the circuit formed on the surface close to the ultra-thin copper layer or the carrier of the copper foil with a carrier and embedded in the resin layer. 23 . A method of producing a printed wiring board, comprising: a step of laminating the surface close to the ultra-thin copper layer or the carrier of a copper foil with a carrier according to claim 1 on a resin substrate, a step of disposing at least one layer group composed of a resin layer and a circuit on the surface close to the ultra-thin copper layer or the carrier of the copper foil with a carrier opposite to the surface thereof laminated on the resin substrate, and a step of peeling the carrier or the ultra-thin copper layer from the copper foil with a carrier after formation of the at least one layer group composed of a resin layer and a circuit. 24 . A method of producing an electronic device using a printed wiring board produced by a method of producing a printed wiring board produced by the method according to claim 15 .

Assignees

Inventors

Classifications

  • Surface contacts, e.g. bumps (H05K3/4092 takes precedence; deposition of finish layers on pads H05K3/24; forming solder bumps H05K3/3465) · CPC title

  • H05K1/02Primary

    Details · CPC title

  • H05K1/09Primary

    Use of materials for the {conductive, e.g. } metallic pattern · CPC title

  • Temporary metallic carrier, e.g. for transferring material · CPC title

  • Metal foils · CPC title

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What does patent US2016381806A1 cover?
The present invention provides a copper foil with a carrier including an ultra-thin copper layer having a thickness of 0.9 μm or less and capable of preferably preventing generation of pin holes during peeling of the carrier. A copper foil with a carrier including a carrier, an intermediate layer, and an ultra-thin copper layer in this order, wherein the ultra-thin copper layer has a thickness …
Who is the assignee on this patent?
Jx Nippon Mining & Metals Corp
What technology area does this patent fall under?
Primary CPC classification H05K1/02. Mapped technology areas include Electricity.
When was this patent published?
Publication date Thu Dec 29 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).