Substrate processing apparatus and ceiling part

US2016376701A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2016376701-A1
Application numberUS-201615260907-A
CountryUS
Kind codeA1
Filing dateSep 9, 2016
Priority dateMar 20, 2014
Publication dateDec 29, 2016
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A substrate processing apparatus includes a reaction tube processing a substrate, a heating part disposed on an outside of the reaction tube that heats the interior of the reaction tube, an insulating part disposed on an outside of the heating part, a plurality of flow channels installed in the insulating part and allows an air or a cooling medium to flow, and a ceiling part configured to cover an upper surface of the insulating part. The ceiling part includes a first member having a supply hole formed to communicate with the flow channels and to supply the air or cooling medium into the flow channels, and a second member having a space formed between the second member and the first member and allowing the air or the cooling medium to flow therein and having a partition part to partition the space into at least two spaces.

First claim

Opening claim text (preview).

What is claimed is: 1 . A substrate processing apparatus, comprising: a reaction tube configured to process a substrate; a heating part disposed on an outside of the reaction tube and configured to heat the interior of the reaction tube; an insulating part disposed on an outside of the heating part; a plurality of flow channels installed in the insulating part and configured to allow an air or a cooling medium to flow; and a ceiling part configured to cover an upper surface of the insulating part, wherein the ceiling part includes a first member having a supply hole formed to communicate with the flow channels and to supply the air or the cooling medium into the flow channels, and a second member disposed on the first member, having a space formed between the second member and the first member and allowing the air or the cooling medium to flow therein, and having a partition part formed to partition the space into at least two spaces. 2 . The apparatus of claim 1 , further comprising an intake mechanism configured to supply the air or the cooling medium to the at least two spaces, wherein the intake mechanism includes: an intake part having an intake port configured to connect with the at least two spaces; a capture part configured to capture the air or the cooling medium therein; and an introduction part configured to allow the intake part and the capture part to communicate with each other. 3 . The apparatus of claim 2 , wherein the intake mechanism comprises an opening/closing part installed in the introduction part to open and close the intake part, and a driving part configured to drive the opening/closing part. 4 . The apparatus of claim 3 , wherein the introduction part faces the intake part and the capture part is adjacent to the introduction part. 5 . The apparatus of claim 1 , wherein the second member is disk shaped having a large diameter portion and a small diameter portion. 6 . The apparatus of claim 5 , further comprising: a third member disposed on the second member and having a disk shape having a large diameter portion and a small diameter portion; and a fourth member disposed on the third member and having a disk shape formed as an upper end of the ceiling part. 7 . The apparatus of claim 6 , wherein the small diameter portion of the second member and the small diameter portion of the third member at least partially overlap. 8 . The apparatus of claim 7 , wherein an exhaust port configured to exhaust the air or cooling medium is located at the center of the first member and the second member. 9 . The apparatus of claim 8 , wherein the third member has an exhaust path in a diameter direction to communicate perpendicularly to the exhaust port, and a recess having a shape corresponding to the exhaust path is located on the upper surface of the second member. 10 . A ceiling part of an insulating part having a space formed to allow an air or a cooling medium to flow therein, wherein the ceiling part includes a first member having a supply hole formed to supply the air or the cooling medium to the insulating part, and a second member disposed on the first member, having the space formed between the second member and the first member, and having a partition part formed to partition the space into at least two spaces.

Assignees

Inventors

Classifications

  • mainly by convection · CPC title

  • using thermal contact gas · CPC title

  • Cooling of the reaction chamber walls (C23C16/45572 takes precedence) · CPC title

  • characterised by the method of coating (C23C16/04 takes precedence) · CPC title

  • Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps · CPC title

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What does patent US2016376701A1 cover?
A substrate processing apparatus includes a reaction tube processing a substrate, a heating part disposed on an outside of the reaction tube that heats the interior of the reaction tube, an insulating part disposed on an outside of the heating part, a plurality of flow channels installed in the insulating part and allows an air or a cooling medium to flow, and a ceiling part configured to cover…
Who is the assignee on this patent?
Hitachi Int Electric Inc
What technology area does this patent fall under?
Primary CPC classification H10P72/0434. Mapped technology areas include Electricity.
When was this patent published?
Publication date Thu Dec 29 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).