High speed epi system and chamber concepts

Patent metadata

Field	Value
Publication number	US-2016348240-A1
Application number	US-201515111541-A
Country	US
Kind code	A1
Filing date	Jan 6, 2015
Priority date	Jan 27, 2014
Publication date	Dec 1, 2016
Grant date	—

Abstract

Embodiments described herein generally relate to a batch processing chamber. The batch processing chamber includes a lid, a chamber wall and a bottom that define a processing region. A cassette including a stack of susceptors for supporting substrates is disposed in the processing region. The edge of the cassette is coupled to a plurality of shafts and the shafts are coupled to a rotor. During operation, the rotor rotates the cassette to improve deposition uniformity. A heating element is disposed on the chamber wall and a plurality of gas inlets is disposed through the heating element on the chamber wall. Each gas inlet is substantially perpendicular to the chamber wall.

First claim

1 . A rotating batch processing chamber, comprising:
a chamber wall; a bottom; a lid, wherein the chamber wall, the bottom and the lid define a processing region; a cassette configured to hold a plurality of substrates disposed in the processing region; a plurality of shafts coupled to an edge of the cassette; a rotor coupled to the plurality of shafts; a stator coupled to the rotor; and a first heating member disposed adjacent to the chamber wall.

2 . The rotating batch processing chamber of claim 1 , wherein the first heating member includes a plurality of infrared lamps.

3 . The rotating batch processing chamber of claim 2 , wherein the chamber wall is cylindrical, the plurality of infrared lamps are circular and the plurality of infrared lamps surrounds the chamber wall.

4 . The rotating batch processing chamber of claim 1 , further comprising a second heating element disposed above and/or below the cassette.

5 . The rotating batch processing chamber of claim 1 , further comprising a reflector surrounding the first heating element.

6 . A rotating batch processing chamber, comprising:
a chamber wall; a bottom; a lid, wherein the chamber wall, the bottom and the lid define a processing region; a cassette configured to hold a plurality of substrates disposed in the processing region; a plurality of shafts coupled to an edge of the cassette; a rotor coupled to the plurality of shafts; a stator coupled to the rotor; a first heating member disposed adjacent to the chamber wall; and a plurality of gas inlets disposed through the first heating member on the chamber wall, wherein each of the plurality of gas inlets is substantially perpendicular to the chamber wall.

7 . The rotating batch processing chamber of claim 6 , wherein the first heating member includes a plurality of infrared lamps.

8 . The rotating batch processing chamber of claim 7 , wherein the chamber wall is cylindrical, the plurality of infrared lamps are circular and the plurality of infrared lamps surrounds the chamber wall.

9 . The rotating batch processing chamber of claim 6 , wherein the first heating member includes one or more inductive heaters.

10 . The rotating batch processing chamber of claim 6 , further comprising a second heating element disposed above and/or below the cassette.

11 . The rotating batch processing chamber of claim 6 , wherein the rotor and the stator are permanent magnets, and the rotor is magnetically coupled to the stator.

12 . The rotating batch processing chamber of claim 6 , further comprising a linear arc motor coupled to the plurality of shafts, wherein the linear arc motor includes the rotor and the stator.

13 . A rotating batch processing chamber, comprising:
a chamber wall; a bottom; a lid, wherein the chamber wall, the bottom and the lid define a processing region; a cassette configured to hold a plurality of substrates disposed in the processing region; a first heating member disposed adjacent to the chamber wall; a plurality of gas inlets disposed through the first heating member on the chamber wall, wherein each of the plurality of gas inlets is perpendicular to the chamber wall; a chamber liner disposed between the cassette and the chamber wall; and a plurality of gas lines disposed between the chamber liner and the chamber wall, wherein each of the plurality of gas lines is substantially parallel to the chamber wall.

14 . The rotating batch processing chamber of claim 13 , wherein the first heating member includes a plurality of infrared lamps.

15 . The rotating batch processing chamber of claim 13 , further comprising a second heating element disposed above and/or below the cassette.

Assignees

• Applied Materials Inc

Inventors

• Burrows Brian H
• Scudder Lance A
• Maqsood Kashif
• Anderson Roger N
• Acharya Sumedh Dattatraya

Classifications

• H10P72/3312

  Vertical transfer of a batch of workpieces · CPC title

• H10P72/0462

  characterised by the construction of the processing chambers, e.g. modular processing chambers · CPC title

• H10P72/0436

  mainly by radiation · CPC title

• C23C16/4584 Primary

  the substrate being rotated · CPC title

• C23C16/24

  Deposition of silicon only · CPC title