Method for Forming Projections and Depressions, Sealing Structure, and Light-Emitting Device

US2016322608A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2016322608-A1
Application numberUS-201615211444-A
CountryUS
Kind codeA1
Filing dateJul 15, 2016
Priority dateApr 19, 2013
Publication dateNov 3, 2016
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A novel method for forming projections and depressions is provided. A novel sealing structure is provided. A novel light-emitting device is provided. A first step of forming a film containing at least two kinds of metals having different etching rates over a surface; a second step of heating the film so that the metal having a lower etching rate segregates; a third step of selectively etching the metal having a higher etching rate; and a fourth step of selectively etching the surface using a residue containing the metal having a lower etching rate are included.

First claim

Opening claim text (preview).

1 - 5 . (canceled) 6 . A sealing structure comprising: a substrate; a sealing substrate opposite a surface of the substrate; a sealant between the substrate and the sealing substrate; and a sealed structure sealed in a region surrounded by the substrate, the sealing substrate, and the sealant, wherein the surface of the substrate is provided with: projections and depressions; a surface being adjacent to the projections and depressions and being flatter and smoother than the projections and depressions; and a first film overlapping the flat and smooth surface, and wherein the sealant is in contact with the projections and depressions. 7 . The sealing structure according to claim 6 , wherein a surface of the sealing substrate is provided with: projections and depressions; a surface being adjacent to the projections and depressions of the sealing substrate and being flatter and smoother than the projections and depressions of the sealing substrate; and a second film overlapping the flat and smooth surface. 8 . The sealing structure according to claim 7 wherein the sealant contains glass whose melting point is higher than or equal to 300° C. and lower than or equal to 700° C. 9 . The sealing structure according to claim 7 , wherein the sealant is in contact with the second film which the sealing substrate is provided with. 10 . The sealing structure according to claim 7 , wherein the substrate comprises at least one of glass, ceramics, a metal, an inorganic material, and a resin. 11 . The sealing structure according to claim 7 , wherein the sealing substrate comprises at least one of glass, ceramics, a metal, an inorganic material, and a resin. 12 . An electronic device comprising the sealing structure according to claim 8 . 13 . A light-emitting device comprising: a substrate; a sealing substrate opposite a surface of the substrate; a sealant between the substrate and the sealing substrate; and a light-emitting element sealed in a region surrounded by the substrate, the sealing substrate, and the sealant, wherein the surface of the substrate is provided with: projections and depressions; a surface being adjacent to the projections and depressions and being flatter and smoother than the projections and depressions; and a conductive film overlapping the surface, wherein the light-emitting element is electrically connected to the conductive film, and wherein the sealant is adjacent to the projections and depressions. 14 . The light-emitting device according to claim 13 , wherein the substrate comprises at least one of glass, ceramics, a metal, an inorganic material, and a resin. 15 . The light-emitting device according to claim 13 , wherein the sealing substrate comprises at least one of glass, ceramics, a metal, an inorganic material, and a resin. 16 . An electronic device comprising the light-emitting device according to claim 13 . 17 . (canceled)

Assignees

Inventors

Classifications

  • characterised by the processes involved to create the masks · CPC title

  • characterised by their composition, e.g. multilayer masks · CPC title

  • Gaseous compositions · CPC title

  • Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.] · CPC title

  • Compositions for etching metallic material from a metallic material substrate of different composition · CPC title

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What does patent US2016322608A1 cover?
A novel method for forming projections and depressions is provided. A novel sealing structure is provided. A novel light-emitting device is provided. A first step of forming a film containing at least two kinds of metals having different etching rates over a surface; a second step of heating the film so that the metal having a lower etching rate segregates; a third step of selectively etching t…
Who is the assignee on this patent?
Semiconductor Energy Lab
What technology area does this patent fall under?
Primary CPC classification C23F1/02. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu Nov 03 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).