Pattern forming method and heating apparatus

Patent metadata

Field	Value
Publication number	US-2016293403-A1
Application number	US-201314388887-A
Country	US
Kind code	A1
Filing date	Nov 25, 2013
Priority date	Nov 25, 2013
Publication date	Oct 6, 2016
Grant date	—

Abstract

The present invention, when forming a pattern on a substrate, forms a film of a block copolymer containing at least two polymers on the substrate, heats the film of the block copolymer under a solvent vapor atmosphere to subject the block copolymer to phase separation, and removes one of the polymers in the film of the phase-separated block copolymer, thereby accelerating fluidization of the polymers of the block copolymer to enable acceleration of the phase separation.

First claim

What Is Claimed

1 . A pattern forming method of forming a pattern on a substrate, comprising the steps of:
forming a film of a block copolymer containing at least two polymers on the substrate; heating the film of the block copolymer under a solvent vapor atmosphere to subject the block copolymer to phase separation; and removing one of the polymers in the film of the phase-separated block copolymer.

2 . The pattern forming method according to claim 1 ,
wherein in the step of phase separation, a partial pressure of a solvent vapor in the solvent vapor atmosphere is decreased continuously or stepwise.

3 . The pattern forming method according to claim 1 ,
wherein in the step of phase separation, the solvent vapor atmosphere contains vapor of a first solvent and vapor of a second solvent.

4 . The pattern forming method according to claim 3 ,
wherein a ratio between a partial pressure of the vapor of the first solvent and a partial pressure of the vapor of the second solvent is changed with time.

5 . The pattern forming method according to claim 1 ,
wherein in the step of phase separation, a solvent vapor in the solvent vapor atmosphere is changed from vapor of a third solvent to vapor of a fourth solvent.

6 . The pattern forming method according to claim 1 ,
wherein in the step of phase separation, a temperature of heating the film of the block copolymer is decreased.

7 . The pattern forming method according to claim 1 , further comprising the step of:
after the step of phase separation, a step of heating the film of the block copolymer under an inert gas atmosphere to dry the film.

8 . The pattern forming method according to claim 7 ,
wherein a temperature in the step of drying is higher than a temperature in the step of phase separation.

9 . A heating apparatus for heating a substrate, comprising:
a mounting table which is disposed in a container and on which the substrate, on which a film of a block copolymer is to be formed, is mounted; a heating unit which is embedded in the mounting table and heats the substrate mounted on the mounting table; a solvent vapor supply unit which supplies gas containing vapor of a solvent into the container; and an ejection unit which ejects the gas in the container.

10 . The heating apparatus according to claim 9 , further comprising:
a control unit which controls the solvent vapor supply unit to decrease continuously or stepwise a partial pressure of the vapor of the solvent in gas containing the vapor of the solvent.

11 . The heating apparatus according to claim 9 ,
wherein the vapor of the solvent contains vapor of a first solvent and vapor of a second solvent.

12 . The heating apparatus according to claim 9 ,
wherein the solvent vapor supply unit supplies gas containing vapor of a first solvent into the container, and wherein the heating apparatus further comprises: an additional solvent vapor supply unit which supplies gas containing vapor of a second solvent into the container; and a control unit which controls the solvent vapor supply unit and the additional solvent vapor supply unit to change with time a ratio between a partial pressure of the vapor of the first solvent and a partial pressure of the vapor of the second solvent.

13 . The heating apparatus according to claim 12 ,
wherein the control unit controls the solvent vapor supply unit and the additional solvent vapor supply unit to change the vapor of the solvent in the gas containing the vapor of the solvent to be supplied into the container, from the vapor of the first solvent to the vapor of the second solvent.

14 . The heating apparatus according to claim 9 , further comprising:
a control unit which controls the heating unit to decrease a temperature of heating the film of the block copolymer.

15 . The heating apparatus according to claim 9 ,
wherein the heating unit heats the film of the block copolymer on the substrate under an inert gas atmosphere.

16 . The heating apparatus according to claim 15 ,
wherein a temperature when drying the film of the block copolymer is higher than a temperature when heating the film of the block copolymer.

Assignees

• Tokyo Electron Ltd

Inventors

• Muramatsu Makoto
• Kitano Takahiro
• Tomita Tadatoshi
• Tanouchi Keiji

Classifications

• H10P72/7612

  characterised by lifting arrangements, e.g. lift pins · CPC title

• H10P72/0436

  mainly by radiation · CPC title

• H10P72/0434

  mainly by convection · CPC title

• H10P50/287

  by chemical means · CPC title

• H10P14/6529

  by exposure to a gas or vapour · CPC title