Carbon thin-film device and method of manufacturing the same

Patent metadata

Field	Value
Publication number	US-2016289825-A1
Application number	US-201615089702-A
Country	US
Kind code	A1
Filing date	Apr 4, 2016
Priority date	Apr 6, 2015
Publication date	Oct 6, 2016
Grant date	—

Abstract

Disclosed is a carbon thin-film device and method for manufacturing the same. The method includes forming a functional group on a surface of a substrate and functionalizing the substrate, and depositing a carbon thin film through ALD on the substrate in which the functional group is formed.

First claim

What is claimed is:

1 . A method of manufacturing a carbon thin-film device, the method comprising:
forming a functional group on a surface of a substrate to functionalize the substrate, and depositing a carbon thin film through atomic layer deposition on the substrate on which the functional group is formed.

2 . The method of claim 1 , wherein the functional group comprises at least one selected from oxygen group, hydroxyl group, and amino group.

3 . The method of claim 1 , wherein the functionalizing of the substrate comprises:
supplying a solution, which is made by mixing sulfuric acid and hydrogen peroxide water, to the substrate to form a hydroxyl group on the substrate.

4 . The method of claim 1 , wherein the functionalizing of the substrate comprises:
treating the substrate with oxygen plasma to form an oxygen group on the substrate.

5 . The method of claim 1 , wherein the functionalizing of the substrate comprises:
forming an adsorption layer, which comprises the functional group, on the substrate.

6 . The method of claim 5 , wherein the adsorption layer is formed of a single atomic layer or a single molecular layer.

7 . The method of claim 5 , wherein the functionalizing of the substrate comprises:
forming the functional group on the substrate to allow oxygen or nitrogen atoms of the adsorption layer to be covalent-bonded with atoms of the substrate.

8 . The method of claim 5 , wherein the depositing of the carbon thin film on the substrate comprises:
forming the carbon thin film on the substrate to allow carbon atoms of a basal layer of the carbon thin film to be covalent-bonded with oxygen or nitrogen atoms of the adsorption layer.

9 . The method of claim 1 , wherein the depositing of the carbon thin film on the substrate comprises:
repeating unit cycles in a number of times, wherein the unit cycle comprises: supplying halocarbon as carbon precursors to the substrate; supplying a purge gas to the substrate to purge the substrate; supplying a reaction gas to the substrate; and supplying a purge gas to the substrate to purge the substrate, wherein a supply time of the halocarbon at the first unit cycle is longer than a supply time of the halocarbon at the unit cycle after the second unit cycle.

10 . The method of claim 9 , wherein the reaction gas has larger bonding energy to halogen atoms of the halocarbon than to carbon atoms of the halocarbon.

11 . The method of claim 9 , wherein the halocarbon is carbon tetrabromide (CBr 4 ),
wherein the reaction gas is hydrogen gas or hydrogen plasma.

12 . The method of claim 1 , further comprising:
pre-supplying halocarbon to the substrate, on which the functional group is formed, between the functionalizing of the substrate and the depositing of the carbon thin film on the substrate.

13 . The method of claim 12 , wherein the halocarbon is carbon tetrabromide (CBr 4 ).

14 . The method of claim 12 , wherein the pre-supplying of the halocarbon comprises:
supplying the halocarbon to the substrate, on which the functional group is formed, for 30 seconds to 5 minutes.

15 . The method of claim 1 , wherein the carbon thin film is formed at deposition temperature of 200 to 450′C.

16 . A carbon thin-film device comprising:
a substrate; an adsorption layer on the substrate; and a carbon layer on the adsorption layer, wherein the adsorption layer comprises a functional group comprising at least one selected from oxygen and nitrogen atoms.

17 . The carbon thin-film device of claim 16 , wherein the adsorption layer is formed of a single layer with oxygen or nitrogen atoms.

18 . The carbon thin-film device of claim 16 , wherein the oxygen or nitrogen atoms of the adsorption layer is covalent-bonded with carbon atoms of a basal layer of the carbon layer.

19 . The carbon thin-film device of claim 18 , wherein the oxygen or nitrogen atoms of the adsorption layer is covalent-bonded with atoms of a surface layer of the substrate.

20 . A carbon nanowire comprising:
a nanowire; a carbon layer wrapping the nanowire; and an adsorption layer between the nanowire and the carbon layer, wherein the adsorption layer comprises a functional group, the functional group comprising at least one selected from oxygen and nitrogen atoms.

Assignees

• Industry-Academic Cooperation Foundation Yonsei Univ

Inventors

• Kim Hyungjun
• Choi Taejin
• Song Jeong-Gyu

Classifications

• C23C16/44 Primary

  characterised by the method of coating (C23C16/04 takes precedence) · CPC title

• C23C16/45525

  Atomic layer deposition [ALD] · CPC title

• C23C16/26

  Deposition of carbon only · CPC title

• C23C16/02 Primary

  Pretreatment of the material to be coated (C23C16/04 takes precedence) · CPC title