Film deposition apparatus for fine pattern forming
US-2024096595-A1 · Mar 21, 2024 · US
Pretreatment of the material to be coated (C23C16/04 takes precedence)
Pretreatment of the material to be coated (C23C16/04 takes precedence) · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C23C16/02 |
| Official title | Pretreatment of the material to be coated (C23C16/04 takes precedence) |
| Display label | Pretreatment of the material to be coated (C23C16/04 takes precedence) |
| Total patents | 648 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is growing.
| Year | Patents |
|---|---|
| 2015 | 31 |
| 2016 | 27 |
| 2017 | 48 |
| 2018 | 48 |
| 2019 | 53 |
| 2020 | 66 |
| 2021 | 56 |
| 2022 | 77 |
| 2023 | 68 |
| 2024 | 61 |
| 2025 | 91 |
| 2026 | 22 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Treatment for flowable dielectric deposition on substrate surfaces
US-9847222-B2 · Dec 19, 2017 · US
Method for forming metal chalcogenide thin films on a semiconductor device
US-2016372365-A1 · Dec 22, 2016 · US
Method of modifying substrate surface
US-2016362781-A1 · Dec 15, 2016 · US
Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
US-2016365246-A1 · Dec 15, 2016 · US
Optically-Finished Thin Diamond Substrate or Window of High Aspect Ratio and a Method of Production Thereof
US-2016333472-A1 · Nov 17, 2016 · US
Method for forming manganese-containing film
US-2016326646-A1 · Nov 10, 2016 · US
Inhibitor plasma mediated atomic layer deposition for seamless feature fill
US-2016329238-A1 · Nov 10, 2016 · US
Metal capping process and processing platform thereof
US-9487864-B2 · Nov 8, 2016 · US
Biomimetic membranes and methods of making biomimetic membranes
US-9486742-B1 · Nov 8, 2016 · US
Carbon thin-film device and method of manufacturing the same
US-2016289825-A1 · Oct 6, 2016 · US
Carbon-coating-film cleaning method and device
US-2016281217-A1 · Sep 29, 2016 · US
Raspberry-type metal oxide nanostructures coated with ceo2 nanoparticles for chemical mechanical planarization (cmp)
US-2016280963-A1 · Sep 29, 2016 · US
Preliminary treatment method for workpiece
US-2016281237-A1 · Sep 29, 2016 · US
Ultrathin atomic layer deposition film accuracy thickness control
US-2016276148-A1 · Sep 22, 2016 · US
Inhibitor plasma mediated atomic layer deposition for seamless feature fill
US-9425078-B2 · Aug 23, 2016 · US
Seamless hexagonal boron nitride atomic monolayer thin film and method of fabricating the same
US-2016237558-A1 · Aug 18, 2016 · US
Coated container
US-9415913-B1 · Aug 16, 2016 · US
Growing films via sequential liquid/vapor phases
US-2016215388-A1 · Jul 28, 2016 · US
Method of Forming Silicon Film and Apparatus Therefor
US-2016189957-A1 · Jun 30, 2016 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C23C16/02?
- CPC C23C16/02 is the Cooperative Patent Classification code for “Pretreatment of the material to be coated (C23C16/04 takes precedence).”
- How many patents are filed under CPC C23C16/02 (Pretreatment of the material to be coated (C23C16/04 takes precedence))?
- Our database includes 648 publications tagged with this CPC code.
- Is patent activity under CPC C23C16/02 growing?
- Publication counts under this code: 61 in 2024 vs 91 in 2025 (latest complete years).