Composition for Treating Surface of Substrate, Method and Device

Patent metadata

Field	Value
Publication number	US-2016289455-A1
Application number	US-201615084169-A
Country	US
Kind code	A1
Filing date	Mar 29, 2016
Priority date	Apr 1, 2015
Publication date	Oct 6, 2016
Grant date	—

Abstract

Treatment compositions and methods of treating the surface of a substrate by using the treatment composition, and a semiconductor or MEMS substrate having the treatment composition thereon.

First claim

1 . A treatment composition comprising a silane-and-phosphorus-containing compound formed by reacting a mixture comprising one or more silane-containing components and one or more phosphorus-containing components wherein at least one of the silane-containing components has the following structure:

where R is selected from hydrogen, unsubstituted straight, cyclic and branched alkyl groups, unsubstituted aryl groups, unsubstituted heteroaryl groups, substituted straight, cyclic and branched alkyl groups, substituted aryl groups or substituted heteroaryl groups, wherein said substituted alkyl, aryl and heteroaryl groups are selected from halogen-substituted straight, cyclic and branched alkyl, halogen-substituted aryl groups or halogen-substituted heteroaryl groups, ether, amine, ester, amide, and alkoxy groups, with the proviso that there is no hydrogen bonded to a nitrogen or an oxygen in said silane-containing component of structure (0);
X 1 , X 2 and X 3 are independently selected from the group consisting of halogens, alkoxy groups, organic acid groups, unsubstituted straight, cyclic and branched alkyl groups, unsubstituted aryl groups, unsubstituted heteroaryl groups, substituted straight, cyclic and branched alkyl groups, substituted aryl groups or substituted heteroaryl groups, wherein said substituted alkyl, aryl and heteroaryl groups are selected from halogen-substituted straight, cyclic and branched alkyl, halogen-substituted aryl groups, halogen-substituted heteroaryl groups, ether, amine, ester and amide groups, with the proviso that at least one of X 1 , X 2 and X 3 is selected from the group consisting of a halogen, an alkoxy group or an organic acid group;
and at least one of said one or more phosphorus-containing components has the following structure:

where, a is 1 or 2, and R 1 and R 2 are independently selected from hydrogen, unsubstituted straight, cyclic and branched alkyl groups, unsubstituted aryl groups, unsubstituted heteroaryl groups, substituted straight, cyclic and branched alkyl groups, substituted aryl groups or substituted heteroaryl groups, wherein said substituted alkyl, aryl and heteroaryl groups are selected from halogen-substituted straight, cyclic and branched alkyl, halogen-substituted aryl groups, halogen-substituted heteroaryl groups, ether, amine, ester, amide, and alkoxy groups;
and optionally further comprising one or more non-aqueous solvents.

2 . The treatment composition of claim 1 further wherein at least one of said X 1 , X 2 , or X 3 is a halogen.

3 . The treatment composition of claim 1 further wherein one, and only one, of said X 1 , X 2 , or X 3 is a halogen.

4 . The treatment composition of claim 1 further wherein X 1 is a halogen and X 2 , X 3 , and R are independently selected from unsubstituted alkyl, aryl, and heteroaryl groups or fluorine-substituted alkyl, aryl, and heteroaryl groups.

5 . The treatment composition of claim 1 wherein said silane-containing component of structure (0) is selected from the group consisting of alkoxydimethylalkylsilane, dialkoxymethylalkylsilane, trialkoxyalkylsilane, chlorodimethylalkylsilane, dichloromethylalkylsilane, trichloroalkylsilane, alkoxydiethylalkylsilane, dialkoxyethylalkylsilane, trialkoxyalkylsilane, chlorodiethylalkylsilane, dichloroethylalkylsilane, in which the alkyl groups independently comprise 1 to 30 carbons, and wherein said carbons may have halogens substituted for some or all hydrogens attached to said carbons, and the alkoxy groups may be any C 1 -C 8 alkoxy group, and may comprise halogens substituted for some or all hydrogens in the alkoxy groups.

6 . The treatment composition of claim 1 wherein said R comprises 7 to 30 carbons.

7 . The treatment composition of claim 1 wherein said a is 2, and said R 1 comprises 4 to 30 carbon atoms in any of the substituted and unsubstituted alkyl, aryl and heteroaryl groups.

8 . The treatment composition of claim 1 wherein said phosphorus-containing component of structure (4) is selected from the group consisting of octadecylphosphonic acid, octylphosponic acid, decylphosponic acid, dodecylphosponic acid, tetradecylphosponic acid, hexadecylphosponic acid, eicosylphosponic acid, docosylphosphonic acid and tetracosylphosphonic acid.

9 . The treatment composition of claim 1 comprising said one or more silane-containing components of structure (0) in excess of an amount that will react with said one or more phosphorus-containing component of structure (4).

10 . The treatment composition of claim 1 further comprising said one or more non-aqueous solvents selected from the group consisting of: silicone oil, 3,3′,4,4′-oxydiphthalic dianhydride, benzyl alcohol, 1-octanol, NMP, glycol ether, C 1-40 aliphatic hydrocarbons; C 1-40 aromatic hydrocarbons, substituted naphthalenes, d-limonene, l-limonene, dl-limonene, orange peel oil, dipentene, halogenated hydrocarbons, fluorinated hydrocarbons, silane-containing components of structure (0), and mixtures thereof.

11 . The treatment composition of claim 1 further comprising one or more non-aqueous solvents selected from the group consisting of: silane-containing components of structure (0), silicone oil, hexane, octane, decane, dodecane, tetradecane, hexadecane, octadecane, icosane, benzene, toluene, xylene, mesitylene, naphthalene, methylnaphthalene, dimethylnapthalene, trimethylnapthalene, tetramethylnapthalene, tetrahydronaphthalene, d-limonene, l-limonene, dl-limonene, orange peel oil, dipentene, methylene chloride, chloroform, 1,1,1-trichloroethane, trichloroethylene; fluorochlorohydrocarbons, fluorochlorocarbons, chlorohydrocarbons, fluorohydrocarbons, fluorocarbons, chlorocarbons, ethers of fluorochlorohydrocarbon with hydrocarbon, fluorochlorohydrocarbons, fluorochlorocarbons, chlorohydrocarbons, fluorohydrocarbons, fluorocarbons or chlorocarbons; ethers of fluorochlorocarbon with hydrocarbon, fluorochlorohydrocarbons, fluorochlorocarbons, chlorohydrocarbons, fluorohydrocarbons, fluorocarbons or chlorocarbons; ethers of chlorohydrocarbon with hydrocarbon, fluorochlorohydrocarbon, fluorochlorocarbon, chlorohydrocarbon, fluorohydrocarbon, fluorocarbon or chlorocarbons; ethers of fluorohydrocarbon with hydrocarbon, fluorochlorohydrocarbons, fluorochlorocarbons, chlorohydrocarbons, fluorohydrocarbons, fluorocarbons or chlorocarbons; ethers of fluorocarbon with hydrocarbon, fluorochlorohydrocarbon, fluorochlorocarbon, chlorohydrocarbon, fluorohydrocarbon, fluorocarbon or chlorocarbon; ethers of chlorocarbon with hydrocarbon, fluorochlorohydrocarbon, fluorochlorocarbon, chlorohydrocarbon, fluorohydrocarbon, fluorocarbon or chlorocarbon; and mixtures thereof.

12 . The treatment composition of claim 1 wherein said one or more silane-containing components of structure (0) is selected from the group consisting of chlorotrimethylsilane, chlorodimethyloctylsilane, trichlorooctylamine, bis(triethoxysilyl)ethane, and (tridecafluoro-1,1,2,2-tetrahydrooctyl)trichlorosilane.

13 . The treatment composition of claim 1 wherein said treatment composition comprises: (i) 0.01 to 99.999 wt % of the one or more silane-containing components of structure (0); (ii) 0.001 to 60 wt % of the one or more phosphorus-containing components of structure (4); and (iii) 0 to 99.989 wt % non-aqueous solvent (excluding the silane-containing components of structure (0) which are included in (i)) based on the total weight of the composition.

Assignees

• Air Prod & Chem

Inventors

• Inaoka Seiji
• Casteel Jr William Jack
• Vrtis Raymond Nicholas
• Theodorou Kathleen Esther
• Chen Tianniu
• Brown Mark Richard

Classifications

• H10P95/00

  Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass · CPC title

• H10P70/27

  during, before or after processing of conductive materials, e.g. polysilicon or amorphous silicon layers · CPC title

• H10P70/23

  during, before or after processing of insulating materials · CPC title

• H10P70/00

  Cleaning of wafers, substrates or parts of devices · CPC title

• H10P14/6923

  the material being boron or phosphorus doped silicon oxides, e.g. BPSG, BSG or PSG · CPC title