Real time software and array control

Patent metadata

Field	Value
Publication number	US-2016282849-A1
Application number	US-201615078419-A
Country	US
Kind code	A1
Filing date	Mar 23, 2016
Priority date	Mar 24, 2015
Publication date	Sep 29, 2016
Grant date	—

Abstract

A real time software and array control software application platform which maintains the ability to manage the synchronization between substrate alignments and image projection systems during maskless lithography patterning in a manufacturing process is disclosed. The application coordinates and controls the image projection systems such that discrepancies in and misalignments of the substrate may be determined and accounted for in real time. The image projection systems may run in parallel and may be controlled by a central processor.

First claim

What is claimed is:

1 . A method for the real time coordination of image projection systems, comprising:
detecting a location and an orientation of a substrate within a processing unit; activating at least two image projection systems; coordinating the at least two image projection systems; controlling the at least two image projection systems, wherein the controlling aligns the at least two image projection systems with an alignment of the substrate; and processing the substrate in the processing unit.

2 . The method of claim 1 , wherein the at least two image projection systems are controlled in parallel.

3 . The method of claim 1 , wherein the detecting and controlling occur in real time.

4 . The method of claim 1 , wherein the coordinating synchronizes the image projection systems.

5 . The method of claim 4 , wherein the detecting reads a distortion of the substrate and determines instructions for the adjustment of the image projection systems.

6 . The method of claim 5 , wherein the coordinating further adjusts the image projection systems based on the instructions.

7 . The method of claim 1 , further comprising determining instructions for the adjustment of the image projection systems after the detecting, and adjusting the image projection systems after the activating.

8 . The method of claim 1 , wherein the at least two image projection systems is an array of image projection systems, the array containing twenty-two image projection systems, wherein the image projection systems of the array are controlled in parallel.

9 . A computer system for performing the real time coordination of image projection systems, comprising:
a processor; and a memory storing instructions that, when executed by the processor, cause the computer system to:
detect a location and an orientation of a substrate within a processing unit;
activate at least two image projection systems;
coordinate the at least two image projection systems;
control the at least two image projection systems, wherein the controlling aligns the at least two image projection systems with an alignment of the substrate; and
process the substrate in the processing unit.

10 . The computer system of claim 9 , wherein the at least two image projection systems are controlled in parallel.

11 . The computer system of claim 9 , wherein the detecting and controlling occur in real time.

12 . The computer system of claim 9 , wherein the coordinating synchronizes the image projection systems.

13 . The computer system of claim 12 , wherein the detecting reads a distortion of the substrate and determines instructions for the adjustment of the image projection systems.

14 . The computer system of claim 13 , wherein the coordinating further adjusts the image projection systems based on the instructions.

15 . The computer system of claim 9 , further comprising determining instructions for the adjustment of the image projection systems after the detecting, and adjusting the image projection systems after the activating.

16 . The computer system of claim 9 , wherein the at least two image projection systems is an array of image projection systems, the array containing twenty-two image projection systems, wherein the image projection systems of the array are controlled in parallel.

17 . A non-transitory computer-readable medium storing instructions that, when executed by a processor, cause a computer system to coordinate image projection systems in real time, by performing the steps of:
detecting a location and an orientation of a substrate within a processing unit; activating at least two image projection systems; coordinating the at least two image projection systems; controlling the at least two image projection systems, wherein the controlling aligns the at least two image projection systems with an alignment of the substrate; and processing the substrate in the processing unit.

18 . The non-transitory computer-readable medium of claim 17 , wherein the at least two image projection systems are controlled in parallel.

19 . The non-transitory computer-readable medium of claim 17 , wherein the detecting and controlling occur in real time.

20 . The non-transitory computer-readable medium of claim 17 , wherein the coordinating synchronizes the image projection systems.

21 . The non-transitory computer-readable medium of claim 20 , wherein the detecting reads a distortion of the substrate and determines instructions for the adjustment of the image projection systems.

22 . The non-transitory computer-readable medium of claim 21 , wherein the coordinating further adjusts the image projection systems based on the instructions.

23 . The non-transitory computer-readable medium of claim 17 , further comprising determining instructions for the adjustment of the image projection systems after the detecting, and adjusting the image projection systems after the activating.

24 . The non-transitory computer-readable medium of claim 17 , wherein the at least two image projection systems is an array of image projection systems, the array containing twenty-two image projection systems, wherein the image projection systems of the array are controlled in parallel.

Assignees

• Applied Materials Inc

Inventors

• Hollerbach Uwe
• Laidig Thomas L
• Hunt Mark
• STARSES Don

Classifications

• G03F7/70508

  Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus · CPC title

• G05B2219/45028

  Lithography · CPC title

• G03F7/70358 Primary

  Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging · CPC title

• G03F7/70275

  Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems · CPC title

• G03F7/70783

  Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight · CPC title