Thermo-mechanical actuator
US-12117739-B2 · Oct 15, 2024 · US
Physics
Physics · Cooperative Patent Classification (CPC)
Computing, optics, measurement, and control technologies.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | G03F7/70783 |
| Official title | — |
| Display label | Physics (mapped technology topic) |
| Total patents | 600 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is declining.
| Year | Patents |
|---|---|
| 2015 | 56 |
| 2016 | 56 |
| 2017 | 47 |
| 2018 | 61 |
| 2019 | 78 |
| 2020 | 74 |
| 2021 | 49 |
| 2022 | 44 |
| 2023 | 41 |
| 2024 | 53 |
| 2025 | 35 |
| 2026 | 6 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Lithographic method to apply a pattern to a substrate and lithographic apparatus
US-9423688-B2 · Aug 23, 2016 · US
Lithographic apparatus, method of deforming a substrate table and device manufacturing method
US-9329501-B2 · May 3, 2016 · US
Lithography tool having a reticle stage capable of dynamic reticle bending to compensate for distortion
US-2016011525-A1 · Jan 14, 2016 · US
Projection objective for microlithography
US-9217932-B2 · Dec 22, 2015 · US
Semiconductor manufacturing apparatus and device manufacturing method using substrate distortion correction
US-9209052-B2 · Dec 8, 2015 · US
Substrate holding apparatus, pattern transfer apparatus, and pattern transfer method
US-9188879-B2 · Nov 17, 2015 · US
System and Method for Lithography Exposure With Correction of Overlay Shift Induced By Mask Heating
US-2015316861-A1 · Nov 5, 2015 · US
Lithographic apparatus, substrate support system, device manufacturing method and control program
US-2015316860-A1 · Nov 5, 2015 · US
Component of an EUV or UV lithography apparatus and method for producing it
US-9176399-B2 · Nov 3, 2015 · US
Apparatus and methods for measuring thermally induced reticle distortion
US-2015309418-A1 · Oct 29, 2015 · US
Work stage of exposing apparatus, exposing method and method of manufacturing a structure
US-9158210-B2 · Oct 13, 2015 · US
Exposure apparatus, exposure control system, and exposure method
US-9158212-B2 · Oct 13, 2015 · US
Patterning Device Support and Lithographic Apparatus
US-2015277240-A1 · Oct 1, 2015 · US
Patterning Device Manipulating System and Lithographic Apparatuses
US-2015277241-A1 · Oct 1, 2015 · US
EUV mask
US-9146458-B2 · Sep 29, 2015 · US
Support structure for wafer table
US-9146480-B2 · Sep 29, 2015 · US
Lithographic apparatus and method
US-9141004-B2 · Sep 22, 2015 · US
Lithography tool with backside polisher
US-2015262831-A1 · Sep 17, 2015 · US
Exposure apparatus and exposure system
US-2015253681-A1 · Sep 10, 2015 · US
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Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC G03F7/70783?
- CPC G03F7/70783 is the Cooperative Patent Classification code for “Physics.”
- How many patents are filed under CPC G03F7/70783 (Physics)?
- Our database includes 600 publications tagged with this CPC code.
- Is patent activity under CPC G03F7/70783 growing?
- Publication counts under this code: 53 in 2024 vs 35 in 2025 (latest complete years).