Substrate processing apparatus and substrate processing method

Patent metadata

Field	Value
Publication number	US-2016276379-A1
Application number	US-201414777694-A
Country	US
Kind code	A1
Filing date	Mar 17, 2014
Priority date	Mar 29, 2013
Publication date	Sep 22, 2016
Grant date	—

Abstract

According to one embodiment, a substrate processing apparatus ( 1 ) includes: a support ( 4 ) configured to support a substrate (W); a rotation mechanism ( 5 ) configured to rotate the support ( 4 ) about an axis that crosses the substrate (W) supported by the support ( 4 ) as a rotation axis; a nozzle ( 6 ) configured to supply a treatment liquid to a surface of the substrate (W) on the support ( 4 ) being rotated by the rotation mechanism ( 5 ); a heater ( 8 ) configured to heat the substrate (W) supported by the support ( 4 ) at a distance from the substrate (W); and a movement mechanism ( 9 ) configured to move the heater ( 8 ) in directions toward and away from the substrate (W) supported by the support ( 4 ).

First claim

1 . A substrate processing apparatus comprising:
a support configured to support a substrate; a rotation mechanism configured to rotate the support about an axis that crosses the substrate supported by the support as a rotation axis; a nozzle configured to supply a treatment liquid to a surface of the substrate on the support being rotated by the rotation mechanism; a heater configured to heat the substrate supported by the support at a distance from the substrate; and a movement mechanism configured to move the heater in directions toward and away from the substrate supported by the support.

2 . The substrate processing apparatus according to claim 1 , wherein more than one nozzle is provide and the plurality of nozzles are aligned from center toward periphery of the substrate.

3 . The substrate processing apparatus according to claim 2 , wherein a flow amount of the treatment liquid is set for each of the nozzles such that the treatment liquid forms a uniform liquid film on the surface of the substrate.

4 . The substrate processing apparatus according to claim 3 , wherein the flow amount of the treatment liquid set for the nozzles is increased in order from the center toward the periphery of the substrate.

5 . A substrate processing method comprising:
rotating a substrate, which faces a heater at a distance therefrom, in a horizontal plane; supplying a treatment liquid from a nozzle to a surface of the substrate being rotated; heating the substrate and the treatment liquid on the surface of the substrate by the heater; moving the heater away from the substrate; and heating the treatment liquid on the surface of the substrate at least, or the substrate and the treatment liquid on the surface of the substrate by the heater moved away from the substrate.

6 . The substrate processing method according to claim 5 , further comprising supplying the treatment liquid from the nozzle to the surface of the substrate being rotated between the moving the heater away from the substrate and the heating the treatment liquid on the surface of the substrate at least, or the substrate and the treatment liquid on the surface of the substrate by the heater moved away from the substrate.

7 . The substrate processing method according to claim 5 , wherein the supplying includes supplying the treatment liquid to the surface of the substrate being rotated from a plurality of nozzles which are aligned from center toward periphery of the substrate.

8 . The substrate processing method according to claim 7 , wherein a flow amount of the treatment liquid is set for each of the nozzles such that the treatment liquid forms a uniform liquid film on the surface of the substrate.

9 . The substrate processing method according to claim 8 , wherein the flow amount of the treatment liquid set for the nozzles is increased in order from the center toward the periphery of the substrate.

Assignees

• Shibaura Mechatronics Corp

Inventors

• Hamada Koichi
• Kobayashi Nobuo

Classifications

• H10P72/7618

  characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating carrousel · CPC title

• H10P72/0602

  Temperature monitoring · CPC title

• H10P72/0436

  mainly by radiation · CPC title

• H10P72/0434

  mainly by convection · CPC title

• H10P72/0414

  using mainly spraying means, e.g. nozzles · CPC title