Lithography apparatus, control method therefor, and method of manufacturing article

Patent metadata

Field	Value
Publication number	US-2016231648-A1
Application number	US-201615013458-A
Country	US
Kind code	A1
Filing date	Feb 2, 2016
Priority date	Feb 9, 2015
Publication date	Aug 11, 2016
Grant date	—

Abstract

A lithography apparatus is provided. The lithography apparatus includes a control unit that obtains information of an expected processing count to be processed in a lot by a transfer unit, obtains information of an accumulated processing count, in the transfer unit, of each of originals in a original storage unit, and preferentially selects, from the originals, an original whose process enable count before the accumulated processing count reaches a predetermined count is not smaller than the expected processing count.

First claim

What is claimed is:

1 . A lithography apparatus comprising:
a transfer unit configured to transfer, to a substrate, a pattern formed on an original; an original storage unit configured to store a plurality of originals; a control unit configured to select, from the plurality of originals, an original to be used by the transfer unit; and a conveyance unit configured to extract, from the original storage unit, the original selected by the control unit, and convey the extracted original to an original holding position of the transfer unit, wherein the control unit obtains information of an expected processing count to be processed in a lot by the transfer unit, obtains information of an accumulated processing count, in the transfer unit, of each of the originals in the original storage unit, and preferentially selects, from the plurality of originals, an original whose process enable count before the accumulated processing count reaches a predetermined count is not smaller than the expected processing count.

2 . The apparatus according to claim 1 , wherein if a sum of the process enable counts of the respective originals is smaller than the expected processing count, the control unit outputs an original shortage error message or an original request message.

3 . The apparatus according to claim 1 , wherein if there is no original whose process enable count is not smaller than the expected processing count, the control unit outputs a lot interruption warning or an original request message.

4 . The apparatus according to claim 2 , further comprising:
a display unit configured to display a corresponding warning in response to the message from the control unit.

5 . The apparatus according to claim 1 , wherein the control unit preferentially selects, from the plurality of originals, an original whose process enable count before the accumulated processing count reaches the predetermined count is equal to the expected processing count.

6 . The apparatus according to claim 1 , wherein for an original whose process enable count is smaller than the expected processing count, the control unit sends a command to execute original recovery processing of the original.

7 . The apparatus according to claim 1 , wherein for originals whose sum of the process enable counts is smaller than a predetermined limit margin count, the control unit sends a command to execute original recovery processing of the originals.

8 . The apparatus according to claim 1 , wherein the transfer unit includes a plurality of transfer units, and the expected processing count to be processed in the lot is distributed to the plurality of transfer units.

9 . A control method for a lithography apparatus including a transfer unit configured to transfer, to a substrate, a pattern formed on an original, an original storage unit configured to store a plurality of originals, and a conveyance unit configured to extract a selected original from the original storage unit and convey the extracted original to an original holding position of the transfer unit, the method comprising:
obtaining information of an expected processing count to be processed in a lot by the transfer unit; obtaining information of an accumulated processing count, in the transfer unit, of each of the originals in the original storage unit; and preferentially selecting, from the plurality of originals, as an original to be used by the transfer unit, an original whose process enable count before the accumulated processing count reaches a predetermined count is not smaller than the expected processing count.

10 . A method of manufacturing an article, comprising:
forming a pattern on a substrate using a lithography apparatus; and processing the substrate on which the pattern has been formed in the forming, wherein the lithography apparatus includes a transfer unit configured to transfer, to the substrate, the pattern formed on an original, an original storage unit configured to store a plurality of originals, a control unit configured to select, from the plurality of originals, an original to be used by the transfer unit, and a conveyance unit configured to extract, from the original storage unit, the original selected by the control unit, and convey the extracted original to an original holding position of the transfer unit, and the control unit obtains information of an expected processing count to be processed in a lot by the transfer unit, obtains information of an accumulated processing count, in the transfer unit, of each of the originals in the original storage unit, and preferentially selects, from the plurality of originals, an original whose process enable count before the accumulated processing count reaches a predetermined count is not smaller than the expected processing count.

Assignees

• Canon Kk

Inventors

• Hirano Shinichi

Classifications

• G03F7/0002 Primary

  Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping · CPC title

• B29C64/393

  for controlling or regulating additive manufacturing processes · CPC title

• G03F7/00

  Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (using photoresist structures for special production processes, see the relevant places, e.g. B44C, H10P76/00, H05K) · CPC title

• G03F7/0037

  Production of three-dimensional images · CPC title

• G03F9/00

  Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (G03F7/22 takes precedence; preparation of photographic masks G03F1/00; within photographic printing apparatus for making copies G03B27/00) · CPC title