Graphene quantum dots synthesis method

US2016200582A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2016200582-A1
Application numberUS-201514808630-A
CountryUS
Kind codeA1
Filing dateJul 24, 2015
Priority dateJan 8, 2015
Publication dateJul 14, 2016
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A graphene quantum dots synthesis method includes fixing a graphene aqueous solution or a graphene oxide aqueous solution on a spin coater to spin the graphene aqueous solution or the graphene oxide aqueous solution, and irradiating a pulsed laser to focus on a graphene aqueous solution or a graphene oxide aqueous solution to generate exfoliation. After a processing period, quantum dots are generated in the graphene aqueous solution or the graphene oxide aqueous solution. Since graphene aqueous solution or graphene oxide aqueous solution does not contain organic chemistry pharmacy, the quantum dots synthesized by the method of the present invention can be produced without pollution. Furthermore, the purpose of simple process, low cost, and time-saved of synthesis can be achieved.

First claim

Opening claim text (preview).

What is claimed is: 1 . A graphene quantum dots synthesis method, comprising: fixing a graphene aqueous solution on a spin coater to spin the graphene aqueous solution, and the graphene aqueous solution includes deionized water and multiple graphene sheets; irradiating a pulsed laser outputted from a laser source to focus on the spinning of the graphene aqueous solution; exfoliating the multiple graphene sheets of the graphene aqueous solution; and forming multiple quantum dots with nano-size in the graphene aqueous solution. 2 . The graphene quantum dots synthesis method according to claim 1 , further comprising: filtering the graphene aqueous solution by a molecular sieve material to eliminate the impurities of the graphene aqueous solution; and purifying the graphene aqueous solution by a centrifuge. 3 . The graphene quantum dots synthesis method according to claim 1 , wherein the pulsed laser energy is greater than 40 mJ. 4 . A graphene quantum dots synthesis method, comprising: fixing a graphene oxide aqueous solution on a spin coater to spin the graphene oxide aqueous solution, and the graphene oxide aqueous solution includes deionized water and multiple graphene oxide sheets; irradiating a pulsed laser outputted from a laser source to focus on the spinning of the graphene oxide aqueous solution; exfoliating the multiple graphene oxide sheets of the graphene oxide aqueous solution; and forming multiple quantum dots with nano-size in the graphene oxide aqueous solution. 5 . The graphene quantum dots synthesis method according to claim 4 , further comprising: filtering the graphene oxide aqueous solution by a molecular sieve material to eliminate the impurities of the graphene oxide aqueous solution; and purifying the graphene oxide aqueous solution by a centrifuge. 6 . The graphene quantum dots synthesis method according to claim 4 , wherein the pulsed laser energy is greater than 40 mJ.

Assignees

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Classifications

  • Shaping or removal of materials, e.g. etching · CPC title

  • Chemistry & Metallurgy · mapped topic

  • Chemistry & Metallurgy · mapped topic

  • Nanobiotechnology or nanomedicine, e.g. protein engineering or drug delivery · CPC title

  • Exhibiting three-dimensional carrier confinement, e.g. quantum dots · CPC title

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What does patent US2016200582A1 cover?
A graphene quantum dots synthesis method includes fixing a graphene aqueous solution or a graphene oxide aqueous solution on a spin coater to spin the graphene aqueous solution or the graphene oxide aqueous solution, and irradiating a pulsed laser to focus on a graphene aqueous solution or a graphene oxide aqueous solution to generate exfoliation. After a processing period, quantum dots are gen…
Who is the assignee on this patent?
Univ Chung Yuan Christian
What technology area does this patent fall under?
Primary CPC classification C01B31/0476. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu Jul 14 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).