Pattern quality management chart, pattern quality management method, and pattern formation method

Patent metadata

Field	Value
Publication number	US-2016195599-A1
Application number	US-201615070444-A
Country	US
Kind code	A1
Filing date	Mar 15, 2016
Priority date	Sep 25, 2013
Publication date	Jul 7, 2016
Grant date	—

Abstract

A pattern quality management chart includes a chart substrate which is made of the same material as a substrate patterned by a first region having a predetermined affinity to a functional liquid for pattern formation and a second region having an affinity lower than the predetermined affinity, and at least one unit region group formed on the surface of the chart substrate. The unit region group includes a plurality of unit regions which are constituted of the first region surrounded therearound by the second region, and each of the unit regions is classified into either a compliant type unit region which has a shape and a size such that, when a predetermined amount of functional liquid is supplied to the unit region under predetermined supply conditions, the functional liquid does not overflow into the surrounding second region and the unit region is completely filled with the functional liquid, or a non-compliant type unit region which has a shape and a size such that part of the functional liquid overflows into the surrounding second region and/or a part of the unit region is not filled with the functional liquid. A plurality of unit regions include at least one compliant type unit region and at least one non-compliant type unit region.

First claim

What is claimed is:

1 . A pattern quality management chart for managing pattern quality for supplying a functional liquid for pattern formation to the surface of a substrate patterned by a first region having a predetermined affinity to the functional liquid and a second region having an affinity lower than the predetermined affinity under predetermined supply conditions to form a pattern, the pattern quality management chart comprising:
a chart substrate which is made of the same material as the substrate; and at least one unit region group formed on the surface of the chart substrate, wherein the unit region group includes a plurality of unit regions constituted of the first region surrounded therearound by the second region, each of the unit regions is classified into either a compliant type unit region which has a shape and a size such that, when a predetermined amount of functional liquid is supplied to the unit region under the predetermined supply conditions, the functional liquid does not overflow into the surrounding second region and the unit region is completely filled with the functional liquid or a non-compliant type unit region which has a shape and a size such that part of the functional liquid overflows into the surrounding second region and a part of the unit region is not filled with the functional liquid, and the plurality of unit regions include at least one compliant type unit region and at least one non-compliant type unit region.

2 . The pattern quality management chart according to claim 1 ,
wherein each of the plurality of unit regions has an elliptical shape or a rectangular shape having a minor axis and a major axis.

3 . The pattern quality management chart according to claim 2 ,
wherein the plurality of unit regions include, as the non-compliant type unit region, at least one unit region which has a length of a minor axis such that, when a predetermined amount of functional liquid is supplied to the unit region under the predetermined supply conditions, part of the functional liquid overflows into an adjacent second region in the minor axis direction and at least one unit region which has a length of a major axis such that, when a predetermined amount of functional liquid is supplied to the unit region under the predetermined supply conditions, a part of the unit region in the major axis direction is not filled with the functional liquid.

4 . The pattern quality management chart according to claim 2 ,
wherein the plurality of unit regions include, as the non-compliant type unit region, at least one unit region which has a length of a minor axis such that, when a predetermined amount of functional liquid is supplied to the unit region under the predetermined supply conditions, part of the functional liquid overflows into an adjacent second region in the minor axis direction, and a length of a major axis such that a part of the unit region in the major axis direction is not filled with the functional liquid.

5 . The pattern quality management chart according to claim 2 ,
wherein the plurality of unit regions include a plurality of compliant type unit regions in which at least one of a minor axis and a major axis is different in length, and a plurality of non-compliant type unit regions in which at least one of a minor axis and a major axis is different in length.

6 . The pattern quality management chart according to claim 1 ,
wherein each of the plurality of unit regions has a circular shape or a square shape.

7 . The pattern quality management chart according to claim 1 ,
wherein the plurality of unit regions included in the unit region group are arranged such that the centers thereof are arranged at regular intervals.

8 . The pattern quality management chart according to claim 1 ,
wherein the plurality of unit region groups are arranged and formed on the surface of the chart substrate.

9 . The pattern quality management chart according to claim 1 ,
wherein the plurality of unit regions are formed through any of laser irradiation, electron beam irradiation, radiant ray irradiation using a photomask, plasma processing using a shadow mask, and nanoimprinting.

10 . A pattern quality management method which manages pattern quality for supplying a functional liquid for pattern formation to the surface of a substrate patterned by a first region having a predetermined affinity to the functional liquid and a second region having an affinity lower than the predetermined affinity under predetermined supply conditions to form a pattern, the pattern quality management method comprising:
producing the pattern quality management chart according to claim 1 ; supplying the predetermined amount of functional liquid to each of the plurality of unit regions of each unit region group of the pattern quality management chart; evaluating a wetting spread shape of the functional liquid in the plurality of unit regions; and determining suitability of pattern formation conditions based on an evaluation result of the wetting spread shape of the functional liquid.

11 . The pattern quality management method according to claim 10 ,
wherein the wetting spread shape of the functional liquid is evaluated according to one of whether or not the corresponding unit region is completely filled with the functional liquid, whether or not part of the functional liquid overflows from the unit region into the surrounding second region, and whether or not a part of the unit region is filled with the functional liquid.

12 . The pattern quality management method according to claim 10 ,
wherein the evaluation of the wetting spread shape of the functional liquid is performed visually with an enlarged image of each of the unit regions.

13 . The pattern quality management method according to claim 10 ,
wherein the evaluation of the wetting spread shape of the functional liquid is performed through image recognition with an enlarged image of each of the unit regions.

14 . The pattern quality management method according to claim 10 ,
wherein the supply of the functional liquid to the plurality of unit regions is performed using an ink jet method.

15 . A pattern formation method comprising, as a series of processing steps:
a patterning step of patterning the surface of a substrate by a first region having a predetermined affinity to a functional liquid for pattern formation and a second region having an affinity lower than the predetermined affinity; and a supply step of supplying the functional liquid to the first region on the surface of the substrate under the predetermined supply conditions to form a pattern, wherein an evaluation result of a wetting spread shape of the functional liquid in the plurality of unit regions using the pattern quality management method according to claim 10 is reflected in pattern formation through the series of processing steps.

Assignees

• Fujifilm Corp

Inventors

• Tatsuta Takeichi

Classifications

• G01R35/007 Primary

  Standards or reference devices, e.g. voltage or resistance standards, "golden references" · CPC title

• B05D1/26

  performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface · CPC title

• G01R31/2894

  Aspects of quality control [QC] (G01R31/31718 takes precedence; program control for QC G05B19/41875) · CPC title

• B41J11/0015 Primary

  for treating before, during or after printing or for uniform coating or laminating the copy material before or after printing (selective coating B41J2/2114) · CPC title

• H05K3/125

  by ink-jet printing · CPC title