Substrate and Patterning Device for Use in Metrology, Metrology Method and Device Manufacturing Method

Patent metadata

Field	Value
Publication number	US-2016179019-A1
Application number	US-201615057651-A
Country	US
Kind code	A1
Filing date	Mar 1, 2016
Priority date	Mar 24, 2011
Publication date	Jun 23, 2016
Grant date	—

Abstract

A pattern from a patterning device is applied to a substrate by a lithographic apparatus. The applied pattern includes product features and metrology targets. The metrology targets include large targets and small targets which are for measuring overlay. Some of the smaller targets are distributed at locations between the larger targets, while other small targets are placed at the same locations as a large target. By comparing values measured using a small target and large target at the same location, parameter values measured using all the small targets can be corrected for better accuracy. The large targets can be located primarily within scribe lanes while the small targets are distributed within product areas.

First claim

What is claimed is:

1 . A patterning device for use in manufacturing a substrate, the patterning device comprising:
product pattern features; and target pattern features, wherein the target pattern features are formed in first and second sets arranged so as to produce first and second sets of targets on the substrate when a pattern is applied from the patterning device to the substrate.

2 . The patterning device of claim 1 , wherein the target pattern features are formed to produce an overlay grating.

3 . An inspection apparatus configured to measure a property of a substrate, the apparatus comprising:
an illumination system configured to provide a beam of radiation; and a radiation projector configured to project the beam of radiation onto the substrate; wherein the substrate comprises:
product areas;
product features located within the product areas; and
targets configured to produce a diffraction pattern in response to being illuminated by the beam of radiation, the diffraction pattern corresponding to the property of the substrate, wherein the targets comprise:
a first set of targets located outside the product areas; and
a second set of targets comprising first and second sub-set of targets, the first and second sub-set of targets having areas equal to each other and smaller than areas of the first set of targets, the first sub-set of targets being located outside the product areas and the second sub-set of targets being located within the product areas.

4 . The apparatus of claim 3 , wherein:
the parameter of performance is overlay; and the targets comprise overlay gratings formed in two patterned layers.

5 . The apparatus of claim 3 , wherein each of the targets comprises a composite target, the composite target comprising a plurality of overlay grating portions.

6 . The apparatus of claim 3 , wherein:
the parameter of performance is overlay; the targets comprise overlay gratings formed in two patterned layers; and
the overlay gratings comprise overlay grating portions, each of the overlay grating portions having a different overlay bias than each of the other overlay grating portions.

7 . The apparatus of claim 3 , further comprising a scribe lane located between two of the product areas; and
wherein the first set of targets and the first sub-set of targets are located within the scribe lane.

Assignees

• Asml Netherlands Bv

Inventors

• Van Der Schaar Maurits
• Warnaar Patrick
• Bhattacharyya Kaustuve
• Smilde Hendrik Jan Hidde
• Kubis Michael

Classifications

• H10W46/00

  Marks applied to devices, e.g. for alignment or identification · CPC title

• H10W42/00

  Arrangements for protection of devices (arrangements for thermal protection H10W40/00) · CPC title

• G03F9/7042 Primary

  Alignment for lithographic apparatus using patterning methods other than those involving the exposure to radiation, e.g. by stamping or imprinting (non-exposure lithographic processes per se G03F7/0002) · CPC title

• G03F7/70683

  Mark designs · CPC title

• G03F7/70616

  Monitoring the printed patterns · CPC title