Film forming apparatus

Patent metadata

Field	Value
Publication number	US-2016138159-A1
Application number	US-201514936759-A
Country	US
Kind code	A1
Filing date	Nov 10, 2015
Priority date	Nov 13, 2014
Publication date	May 19, 2016
Grant date	—

Abstract

A film forming apparatus of forming a film by supplying a process gas onto a substrate includes a rotation table having a loading region and is configured to revolve the substrate loaded on the loading region; a process gas supply mechanism configured to supply the process gas to a gas supply region to perform film formation on the substrate repeatedly passing through the gas supply region a plurality of times by revolution of the substrate; a first gear disposed on the other surface side of the rotation table and rotated in a rotation direction of the rotation table; a second gear configured with planetary gears engaging with the first gear, disposed to be revolved together with the loading region, and configured to rotate the loading region so as to allow the substrate to be rotated.

First claim

What is claimed is:

1 . A film forming apparatus that forms a film by supplying a process gas onto a substrate, comprising:
a rotation table disposed in a vacuum chamber and having a loading region formed on one surface side of the rotation table, the rotation table being configured to revolve the substrate loaded on the loading region; a process gas supply mechanism configured to supply the process gas to a gas supply region on the one surface side of the rotation table to thereby perform film formation on the substrate repeatedly passing through the gas supply region a plurality of times by revolution of the substrate; a first gear disposed on the other surface side of the rotation table and rotated in a rotation direction of the rotation table; a second gear configured with planetary gears engaging with the first gear, the planetary gears being disposed to be revolved together with the loading region and configured to rotate the loading region so as to allow the substrate to be rotated; and a rotation driving part configured to rotate the first gear to adjust a rotation speed of the substrate.

2 . The film forming apparatus of claim 1 , further comprising:
a rotation shaft on which the second gear is disposed, the rotation shaft configured to rotate the loading region; a bearing configured to support the rotation shaft; and a support member configured to support the bearing at the rotation table.

3 . The film forming apparatus of claim 2 , wherein the support member comprises a support disposed to be separated from the rotation shaft in the rotation direction of the rotation table, and a connection part disposed to be separated from the other surface side of the rotation table and connected to the support and the bearing, and
wherein, at an upper side of the connection part, heaters configured to heat the substrate are disposed at each of inner and outer sides of a moving path of the rotation shaft and the support, respectively.

4 . The film forming apparatus of claim 1 , wherein the first gear and the second gear are disposed in division regions on the one surface side of the rotation table, and a gas supply part configured to supply a gas to the division regions and an exhaust path configured to evacuate the division regions are provided.

Assignees

• Tokyo Electron Ltd

Inventors

• Kato Hitoshi
• Miura Shigehiro
• Kikuchi Hiroyuki
• Aikawa Katsuyoshi

Classifications

• H10P72/7626

  characterised by the construction of the shaft · CPC title

• H10P72/7621

  characterised by supporting two or more semiconductor substrates · CPC title

• H10P72/7618

  characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating carrousel · CPC title

• C23C16/45544

  characterized by the apparatus · CPC title

• H01L21/67766

  Electricity · mapped topic