Optical transformation module and optical measurement system, and method of manufacturing a semiconductor device using optical transformation module and optical measurement system

Patent metadata

Field	Value
Publication number	US-2016018328-A1
Application number	US-201514805439-A
Country	US
Kind code	A1
Filing date	Jul 21, 2015
Priority date	Jul 21, 2014
Publication date	Jan 21, 2016
Grant date	—

Abstract

An optical transformation module includes a light generator generating a parallel light beam to be incident onto a surface of an inspection object and changing a wavelength of the parallel light beam, and a rotating grating positioned on a path of the parallel light beam and rotatable by a predetermined rotation angle such that the parallel light beam is transformed according to the wavelength of the parallel light beam and the rotation angle of the rotating grating to have a desired incidence angle and a desired incidence position onto the surface of the inspection object.

First claim

What is claimed is:

1 . An optical transformation module, comprising:
a light generator generating a parallel light beam to be incident onto a surface of an inspection object and changing a wavelength of the parallel light beam; and a rotating grating positioned on a path of the parallel light beam and rotatable by a predetermined angle such that the parallel light beam is transformed according to the wavelength of the parallel light beam and the rotation angle of the rotating grating to have a desired incidence angle and a desired incidence position onto the surface of the inspection object.

2 . The optical transformation module of claim 1 , wherein the rotating grating comprises a plurality of regions which are arranged alternately in a direction and have different refractive indices respectively.

3 . The optical transformation module of claim 1 , wherein the rotating grating comprises a plurality of regions which are arranged alternately in a direction and have different transmittances respectively.

4 . The optical transformation module of claim 1 , wherein the rotating grating has a striped or grid pattern.

5 . The optical transformation module of claim 1 , wherein the light generator comprises
a light source generating a light and changing a wavelength of the light; and a collimating lens positioned on a path of the light to convert the light into the parallel light beam having the wavelength.

6 . The optical transformation module of claim 1 , wherein the light generator comprises a laser source which generates a laser beam and changes a wavelength of the laser beam.

7 . An optical measurement system, comprising:
an optical transformation module generating a parallel light beam to be incident onto a surface of an inspection object and adjusting an incidence angle and the incidence position of the parallel light beam with respect to the surface; and a collector collecting a reflecting light beam from the surface of the inspection object, the optical transformation module comprising; a light generator generating the parallel light beam and changing a wavelength of the parallel light beam; and a rotating grating positioned on a path of the parallel light beam and rotatable by a predetermined angle such that the parallel light beam is transformed according to the wavelength of the parallel light beam and the rotation angle of the rotating grating to have a desired incidence angle and a desired incidence position onto the surface of the inspection object.

8 . The optical measurement system of claim 7 , wherein the rotating grating comprises a plurality of regions which are arranged alternately in a direction and have different refractive indices respectively.

9 . The optical measurement system of claim 7 , wherein the rotating grating comprises a plurality of regions which are arranged alternately in a direction and have different transmittances respectively.

10 . The optical measurement system of claim 7 , wherein the rotating grating has a striped or grid pattern.

11 . The optical measurement system of claim 7 , wherein the light generator comprises
a light source generating a light and changing a wavelength of the light; and a collimating lens positioned on a path of the light to convert the light into the parallel light beam having the wavelength.

12 . The optical measurement system of claim 7 , wherein the light generator comprises a laser source which generates a laser beam and changes a wavelength of the laser beam.

13 . The optical measurement system of claim 7 , further comprising a lens array through which the parallel light beam is incident onto the surface of the inspection object at the incidence and the incidence position,
the lens array comprises a focusing lens positioned on a path of the parallel light beam passing through the rotating grating to convert the parallel light beam into a convergent/divergent light beam; an objective lens positioned on a path of the convergent/divergent light beam to convert again the convergent/divergent light beam into the parallel light beam, direct the parallel light beam to the inspection object at the incidence angle and the incidence position, and convert a light beam reflecting from the inspection object into a reflecting parallel light beam; and an ocular lens positioned on a path of the reflecting parallel light beam to convert the reflecting parallel light beam into a reflecting light beam.

14 . The optical measurement system of claim 13 , further comprising a beam splitter which is positioned between the focusing lens and the objective lens to reflect the convergent/divergent light beam passing through the focusing lens to the objective lens.

15 . The optical measurement system of claim 7 , wherein the reflecting light beam has image information of the inspection object, and the collector comprises a charge coupled device (CCD) lens for collecting the image information of the inspection object from the reflecting light beam.

Assignees

• Samsung Electronics Co Ltd

Inventors

• Kim Tae-Joong
• Jeong Yong-Deok
• Kim Kwang-Soo
• Jeon Byeong-Hwan
• Yang Yu-Sin
• Lee Sang-Kil
• Jun Chung-Sam

Classifications

• G02B26/0808

  by means of one or more diffracting elements · CPC title

• G01N21/9501 Primary

  Semiconductor wafers (manufacturing processes per se of semiconductor devices implementing a measuring step H10P74/20) · CPC title

• G02B3/0006

  Arrays (G02B3/02, G02B5/188 take precedence) · CPC title

• G01N2201/068

  Optics, miscellaneous · CPC title

• G01N21/4738 Primary

  Diffuse reflection (precedence is given to G01N21/55 - G01N21/57 if specular component is taken into consideration), e.g. also for testing fluids, fibrous materials · CPC title